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公开(公告)号：US09939738B2
公开(公告)日：2018-04-10
申请号：US15329536
申请日：2015-07-16
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Christianus Wilhelmus Johannes Berendsen , Rogier Hendrikus Magdalena Cortie , Jim Vincent Overkamp , Patricius Jacobus Neefs , Putra Saputra , Ruud Hendrikus Martinus Johannes Bloks , Michael Johannes Hendrika Wilhelmina Renders , Johan Gertrudis Cornelis Kunnen , Thibault Simon Mathieu Laurent
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70341 , G03F7/70783 , G03F7/70875
Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.
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22.发明授权公开(公告)号：US09740110B2
公开(公告)日：2017-08-22
申请号：US15435094
申请日：2017-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: B23B5/34 , G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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23.发明授权公开(公告)号：US09575419B2
公开(公告)日：2017-02-21
申请号：US14634272
申请日：2015-02-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
Abstract translation: 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。
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Patent Agency Ranking
公开(公告)号：US12204252B2
公开(公告)日：2025-01-21
申请号：US18212334
申请日：2023-06-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Arnaud Hubaux , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F1/70 , G03F7/00 , G06F30/392
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号：US20230333482A1
公开(公告)日：2023-10-19
申请号：US18212334
申请日：2023-06-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Arnaud HUBAUX , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F7/20 , G06F30/392 , G03F1/70
CPC classification number: G03F7/70508 , G06F30/392 , G03F1/70 , G03F7/70616 , G05B2219/45028 , G05B2219/45031
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号：USRE49142E1
公开(公告)日：2022-07-19
申请号：US16590895
申请日：2019-10-02
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Christianus Wilhelmus Johannes Berendsen , Rogier Hendrikus Magdalena Cortie , Jim Vincent Overkamp , Patricius Jacobus Neefs , Putra Saputra , Ruud Hendrikus Martinus Johannes Bloks , Michael Johannes Hendrika Wilhelmina Renders , Johan Gertrudis Cornelis Kunnen , Thibault Simon Mathieu Laurent
IPC: G03F7/20
Abstract: A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to provide a pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.
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公开(公告)号：US10990025B2
公开(公告)日：2021-04-27
申请号：US16289875
申请日：2019-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Laurentius Johannes Adrianus Van Bokhoven , Ruud Hendrikus Martinus Johannes Bloks , Günes Nakiboglu , Marinus Jan Remie , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.
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公开(公告)号：US20180074411A1
公开(公告)日：2018-03-15
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Henrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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