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    Lithographic apparatus and device manufacturing method
    21.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012134485A

    公开(公告)日：2012-07-12

    申请号：JP2011272974

    申请日：2011-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  ANTONIUS FRANCISCUS JOHANNES DE GROOT ,  CADEE THEODORUS PETRUS MARIA ,  DE VOLEI JEROEN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G03F7/70691

    Abstract: PROBLEM TO BE SOLVED: To provide a more efficient method for driving movement of a substrate table.SOLUTION: A lithographic apparatus comprises a carrier, and a drive system for moving the carrier relative to a projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle configured and arranged so as to move parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier and allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis, and only one shuttle is connected to the carrier. The shuttle driver and the shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.

    Abstract translation: 要解决的问题：提供用于驱动衬底台的移动的更有效的方法。 解决方案：光刻设备包括载体和驱动系统，用于在参考正交轴线X和Y限定的平面中相对于投影系统移动载体。驱动系统包括梭子，其构造和布置为 平行于Y轴移动的穿梭连接器，将梭子连接到载体并允许载体相对于梭子平行于X轴的方向运动的穿梭连接器，以及用于驱动梭子平行于 Y轴。 梭子在平行于X轴的方向上位于载体的一侧，只有一个梭子连接到载体上。 梭式驾驶员和穿梭连接器被配置为提供由驱动系统施加到承载件的力的Y分量的至少10％。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus, device manufacturing method, and substrate exchanging method
    23.
    发明专利
    Lithographic apparatus, device manufacturing method, and substrate exchanging method 有权
    光刻设备，器件制造方法和基板交换方法

    公开(公告)号：JP2011216883A

    公开(公告)日：2011-10-27

    申请号：JP2011062035

    申请日：2011-03-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CADEE THEODORUS PETRUS MARIA ,  JAN JAAP KUIT ,  HUBERTUS MULKENS JOHANNES C ,  ZAAL KOEN JACOBUS J M

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03B21/58 ,  G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with an increased throughput.SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

    Abstract translation: 要解决的问题：为光刻设备提供增加的生产量。解决方案：光刻设备包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

    Actuator
    24.
    发明专利
    Actuator 有权
    执行器

    公开(公告)号：JP2010272854A

    公开(公告)日：2010-12-02

    申请号：JP2010096552

    申请日：2010-04-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To achieve a high throughput in the patterning of a medium imprintable on a substrate. SOLUTION: An actuator is disclosed that is equipped with: a body 40 having faces; and a plurality of parallel conduits 44 located in the body 40. Each of the conduits 44 is deformable in response to a proper pressure change in the conduit 44, by increasing the flow of a fluid in the conduit 44 or increasing a static pressure applied to the fluid in the conduit 44. A deformation of the conduit 44 causes a deformation of a face 42. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了在可压印在基板上的介质的图案化中实现高生产率。 解决方案：公开了一种致动器，其配备有：具有面的主体40; 以及位于主体40中的多个平行导管44.每个导管44响应于导管44中适当的压力变化而变形，通过增加导管44中的流体的流动或增加施加到 导管44中的流体。导管44的变形导致面42的变形。版权所有（C）2011，JPO＆INPIT

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    26.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2013113634A2

    公开(公告)日：2013-08-08

    申请号：PCT/EP2013051480

    申请日：2013-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  VAN SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70266 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70858

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。

    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS
    29.
    发明申请
    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS 审中-公开
    装载柔性基板和光刻装置的方法

    公开(公告)号：WO2013107684A3

    公开(公告)日：2013-12-12

    申请号：PCT/EP2013050402

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  DONDERS SJOERD ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

    Abstract: A method of loading a flexible substrate (38), a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support (42) for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier (40) to the support in a way that a boundary line (45) separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

    Abstract translation: 装载柔性基板（38）的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据一个实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件（42）上的方法，包括将基板从基板载体（40）逐渐地以基板载体（40）的方式转移到支撑件 （45），分离装载到载体上的基板的区域和尚未加载到载体上的基板的区域在加载过程中保持基本上直线。

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