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公开(公告)号：WO2013117518A3
公开(公告)日：2013-12-27
申请号：PCT/EP2013052154
申请日：2013-02-04
Applicant: ASML NETHERLANDS BV
Inventor： CADEE THEODORUS PETRUS MARIA , BANINE VADIM YEVGENYEVICH , ZAAL KOEN JACOBUS JOHANNES MARIA , BADIE RAMIN , SINGH HARMEET
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support (S) that is provided with burls (BR) for holding an object (W). The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS- technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有支撑件（S），其具有用于保持物体（W）的孔（BR）。 已经使用光刻制造方法（例如MEMS技术）来制造支撑件，以便产生其取向或位置可单独电可控制的孔。
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2.发明申请METHOD OF CALIBRATING A RELUCTANCE ACTUATOR ASSEMBLY, RELUCTANCE ACTUATOR AND LITHOGRAPHIC APPARATUS COMPRISING SUCH RELUCTANCE ACTUATOR 审中-公开校准执行机构组件的方法，包括这种致动器的传动装置和传动装置
公开(公告)号：WO2014044496A2
公开(公告)日：2014-03-27
申请号：PCT/EP2013067623
申请日：2013-08-26
Applicant: ASML NETHERLANDS BV
Inventor： AKKERMANS JOHANNES ANTONIUS GERARDUS , LEMMEN BAS PIETER , HUIBERTS SJOERD MARTIJN , LOF JOERI , RUTGERS PETRUS THEODORUS , HOL SVEN ANTOIN JOHAN , SINGH HARMEET , HEIJMANS PETER MICHEL SILVESTER MARIA
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70758 , H01F7/081 , H01F7/1646 , H02K41/025 , H02P6/16 , H02P25/034 , H02P25/06 , H02P25/08
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
Abstract translation: 一种磁阻致动器组件，包括磁阻致动器，用于测量磁阻致动器的间隙中的磁通量的磁通传感器，以及基于磁通量设定点和磁通量测量的磁通量来驱动磁阻致动器的致动器线圈的磁通放大器 通量传感器 一种方法，包括向所述通量放大器提供磁通设定点，所述通量设定点包括时间常数分量和激励频率处的正弦变化分量，以响应于所述通量设定点测量由所述磁阻致动器产生的力，以及校准所述磁阻致动器 从测量力组装。
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3.发明申请OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCORPORATING SUCH AN ELEMENT, METHOD OF MANUFACTURING AN OPTICAL ELEMENT 审中-公开光学元件，包含这种元件的光刻设备，制造光学元件的方法
公开(公告)号：WO2013113537A3
公开(公告)日：2013-09-26
申请号：PCT/EP2013050395
申请日：2013-01-10
Applicant: ASML NETHERLANDS BV
Inventor： SINGH HARMEET
CPC classification number: G03F7/70575 , B82Y10/00 , G02B5/1838 , G02B5/203 , G02B5/208 , G03F7/70191 , G03F7/702 , G21K1/062 , G21K1/067 , G21K2201/064
Abstract: A spectral purity filter is integrated with a collector optic (CO) in an EUV lithography apparatus. The element is coated on at least one surface (410) with a multilayer stack comprising a plurality of alternating material layers (for example Mo, Si) suitable for reflecting radiation of EUV wavelength. To manufacture the element, a substrate (402) is provided with a three-dimensional profile (410a, 412, 410b) on a scale much larger than the wavelength of EUV radiation. The multilayer stack is then applied as a series conformal coatings formed by atomic layer deposition on the substrate after formation of said profile. The profile, as reproduced in the MLM coating (310a, 312, 310b), forms a spectral purity filter. Unwanted radiation such as infrared radiation will be scattered or diffracted so that a reduced portion is reflected in the same direction as the reflected EUV radiation. The profile may be designed to form a phase grating, or a scattering texture.
Abstract translation: 光谱纯度滤光片与EUV光刻设备中的收集器光学器件（CO）集成。 该元件用至少一个表面（410）涂覆有多层叠层，该叠层包括适于反射EUV波长的辐射的多个交替材料层（例如Mo，Si）。 为了制造元件，衬底（402）设置有比EUV辐射的波长远大得多的三维轮廓（410a，412,410b）。 然后在形成所述轮廓之后，将多层叠层施加为通过原子层沉积形成在衬底上的串联保形涂层。 如在MLM涂层（310a，312,310b）中再现的轮廓形成光谱纯度滤光片。 诸如红外辐射之类的不需要的辐射将被散射或衍射，使得减少的部分以与反射的EUV辐射相同的方向被反射。 该轮廓可以被设计成形成相位光栅或散射纹理。
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公开(公告)号：NL2011336A
公开(公告)日：2014-03-20
申请号：NL2011336
申请日：2013-08-26
Applicant: ASML NETHERLANDS BV
Inventor： AKKERMANS JOHANNES ANTONIUS GERARDUS , LEMMEN BAS PIETER , HUIBERTS SJOERD MARTIJN , LOF JOERI , RUTGERS PETRUS THEODORUS , HOL SVEN ANTOIN JOHAN , SINGH HARMEET , HEIJMANS PETER MICHEL SILVESTER MARIA
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
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公开(公告)号：NL2010626A
公开(公告)日：2013-06-24
申请号：NL2010626
申请日：2013-04-11
Applicant: ASML NETHERLANDS BV
Inventor： HENDRIKS JIMI , BRUEBACH JOERG , HUIJBREGTSE JEROEN , BOOGAARD ARJEN , KEMPEN ANTONIUS , SINGH HARMEET , HUIJSER SASKIA
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Patent Agency Ranking
公开(公告)号：NL2009846A
公开(公告)日：2013-06-26
申请号：NL2009846
申请日：2012-11-20
Applicant: ASML NETHERLANDS BV
Inventor： SINGH HARMEET
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公开(公告)号：NL2010472A
公开(公告)日：2013-10-23
申请号：NL2010472
申请日：2013-03-19
Applicant: ASML NETHERLANDS BV
Inventor： LAFARRE RAYMOND , DZIOMKINA NINA , KARADE YOGESH , RODENBURG ELISABETH , SINGH HARMEET
IPC: H01L21/683 , G03F7/20
Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.
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公开(公告)号：NL2009874A
公开(公告)日：2013-06-26
申请号：NL2009874
申请日：2012-11-23
Applicant: ASML NETHERLANDS BV
Inventor： CADEE THEODORUS PETRUS MARIA , ZAAL KOEN , SINGH HARMEET
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公开(公告)号：NL2008391A
公开(公告)日：2012-10-08
申请号：NL2008391
申请日：2012-03-01
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , WAGNER CHRISTIAN , SINGH HARMEET
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公开(公告)号：NL2010747A
公开(公告)日：2013-11-12
申请号：NL2010747
申请日：2013-05-02
Applicant: ASML NETHERLANDS BV
Inventor： KOEVOETS ADRIANUS , CADEE THEODORUS PETRUS MARIA , SINGH HARMEET
IPC: G03F7/20
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