中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.023 seconds)

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2013113634A2

    公开(公告)日：2013-08-08

    申请号：PCT/EP2013051480

    申请日：2013-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  VAN SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70266 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70858

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。

    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
    2.
    发明申请
    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS 审中-公开
    基板支持用于平面设备和平面设备

    公开(公告)号：WO2014095266A3

    公开(公告)日：2014-09-18

    申请号：PCT/EP2013074742

    申请日：2013-11-26

    Applicant: ASML NETHERLANDS BV

    Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70908

    Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450') disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

    Abstract translation: 公开了一种用于将EUV辐射束投射到基板（400）的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块（420）和设置在衬底台周围的盖板（450'）。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元（430）位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。

    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS.
    5.
    发明专利
    SUBSTRATE SUPPORT FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2011909A

    公开(公告)日：2014-06-19

    申请号：NL2011909

    申请日：2013-12-06

    Applicant: ASML NETHERLANDS BV

    Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

    IPC: G03F7/20 ,  H01L21/683

    Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450′) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

    POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    7.
    发明专利
    POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2009196A

    公开(公告)日：2013-02-27

    申请号：NL2009196

    申请日：2012-07-17

    Applicant: ASML NETHERLANDS BV

    Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS ,  LEEUWEN ROBBERT ,  KOEVOETS ADRIANUS

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

Patent Agency Ranking