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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2013113634A2

    公开(公告)日：2013-08-08

    申请号：PCT/EP2013051480

    申请日：2013-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  VAN SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70266 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70858

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。

    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS
    3.
    发明申请
    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS 审中-公开
    装载柔性基板和光刻装置的方法

    公开(公告)号：WO2013107684A3

    公开(公告)日：2013-12-12

    申请号：PCT/EP2013050402

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  DONDERS SJOERD ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

    Abstract: A method of loading a flexible substrate (38), a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support (42) for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier (40) to the support in a way that a boundary line (45) separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

    Abstract translation: 装载柔性基板（38）的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据一个实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件（42）上的方法，包括将基板从基板载体（40）逐渐地以基板载体（40）的方式转移到支撑件 （45），分离装载到载体上的基板的区域和尚未加载到载体上的基板的区域在加载过程中保持基本上直线。

    LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS COOLING METHOD.
    6.
    发明专利
    LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS COOLING METHOD. 未知

    公开(公告)号：NL2006809A

    公开(公告)日：2011-12-27

    申请号：NL2006809

    申请日：2011-05-19

    Applicant: ASML NETHERLANDS BV

    Inventor： DONDERS SJOERD

    IPC: G03F7/20

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a cooling system to cool a part of the lithographic apparatus with increased cooling capabilities to reduce the heat transfer from the part to other parts of the apparatus.

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