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公开(公告)号：JPH03152116A
公开(公告)日：1991-06-28
申请号：JP22851890
申请日：1990-08-31
Applicant: BASF AG
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公开(公告)号：JPH027227A
公开(公告)日：1990-01-11
申请号：JP32956688
申请日：1988-12-28
Applicant: BASF AG
Inventor： NORUBERUTO SHIYUNAIDAA , NORUBERUTO KURAIMESU , GIYUNTAA BETEINGAA , UDO BEEMU , RUUTOBUIHI KURAITONAA , AUGUSUTO REENAA , BUERUNAA RENTSU , GEERUHARUTO NERUSHIYUBATSUHA , BUERUNAA NIIDERUBERUGAA , RAINHARUTO SHIYUTORANSUKII , BUERUNAA GURAU
Abstract: PURPOSE: To improve the surface treatment by moving a polishing means in the feeding direction or the reverse direction of a continuously forwarded recording medium at a specific relative speed to the speed of this recording medium. CONSTITUTION: The recording medium 1 is moved from the feeding position 2 to the take-up position 3 at a speed of 40-60m/min, and a polishing tape 4 is moved from a storage reel 5 to a take-up reel 6 for treating the surface of layer. A supporting element 7 is arranged between two reels, and on this supporting element 7, the recording medium 1 is brought into contact with the polishing tape 4 having the particle dimension of 1-20μm by the jet stream of gas from a slot nozzle 8. At this time, the satisfied effect is obtained when the polishing tape 4 is moved relatively against the recording medium 1 at a speed faster than twice the speed of this medium 1, preferrably 10-200 times.
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公开(公告)号：JPS6199928A
公开(公告)日：1986-05-19
申请号：JP22202085
申请日：1985-10-07
Applicant: Basf Ag
Inventor： ARUBERUTO KOORU , MIRENA MERUTSUAA , AUGUSUTO REENAA , NORUBERUTO SHIYUNAIDAA , EEBAAHARUTO KESUTAA , BUERUNAA BARUTSU , FURIIDORIHI ZOMAAMAN , ERUNSUTO RIKAA
IPC: G11B5/702 , C09D5/23 , C09D127/04 , C09D127/06 , C09D163/00 , C09D167/00 , C09D171/00 , C09D171/12 , C09D175/00 , C09D175/04 , C10M105/58 , C10N40/18 , G11B5/708 , G11B5/71
CPC classification number: G11B5/71 , Y10S428/90 , Y10T428/31504 , Y10T428/31935
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公开(公告)号：JPS6182332A
公开(公告)日：1986-04-25
申请号：JP16218985
申请日：1985-07-24
Applicant: Basf Ag
Inventor： AUGUSUTO REENAA , BUERUNAA BARUTSU , BUERUNAA RENTSU , ARUBERUTO KOORU , GIYUNTAA HAIRU
IPC: C09D5/23 , C09D175/04 , C09D175/06 , C09D175/08 , C09D175/14 , G11B5/702 , G11B5/842
CPC classification number: G11B5/702
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公开(公告)号：JPS60160024A
公开(公告)日：1985-08-21
申请号：JP27354884
申请日：1984-12-26
Applicant: BASF AG
Inventor： AUGUSUTO REENAA , ARUBERUTO KOORU , BUERUNAA BARUTSU , FURIIDORIHI ZOMAAMAN , MIRAN FUERIKU , BUERUNAA GURAU , RAINHORUTO BAURU
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Patent Agency Ranking
公开(公告)号：JPS60127522A
公开(公告)日：1985-07-08
申请号：JP24092184
申请日：1984-11-16
Applicant: BASF AG
Inventor： AUGUSUTO REENAA , HERUMUUTO KOPUKE , HERUMAN RORAA , BUERUNAA BARUTSU , BUERUNAA GURAU , EEBAAHARUTO KESUTAA , FURIIDORIHI ZOMAAMAN
IPC: C09D5/23 , C09D127/04 , C09D127/06 , C09D175/00 , C09D175/02 , C09D175/04 , G11B5/702 , H01F10/10
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公开(公告)号：JPS60124022A
公开(公告)日：1985-07-02
申请号：JP24092084
申请日：1984-11-16
Applicant: BASF AG
Inventor： AUGUSUTO REENAA , BUERUNAA BARUTSU , MIRAN FUERIKU , HERUMUUTO KOPUKE , BUERUNAA GURAU , RAINHORUTO BAURU
IPC: C09D5/23 , C09D127/04 , C09D127/06 , C09D175/00 , C09D175/04 , C09D175/06 , G11B5/702 , H01F10/10
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公开(公告)号：JPS6066329A
公开(公告)日：1985-04-16
申请号：JP13923284
申请日：1984-07-06
Applicant: BASF AG
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公开(公告)号：JPS57170921A
公开(公告)日：1982-10-21
申请号：JP4479682
申请日：1982-03-23
Applicant: BASF AG
Inventor： RAINAA BURUUMU , AUGUSUTO REENAA , HANSUUUUBUE SHIENKU
IPC: C09K3/10 , C08G18/00 , C08G18/08 , C08G18/70 , C08G18/79 , C08G18/80 , C09D5/00 , C09D175/00 , C09J175/00
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公开(公告)号：JPS56127618A
公开(公告)日：1981-10-06
申请号：JP1705181
申请日：1981-02-09
Applicant: BASF AG
Inventor： AUGUSUTO REENAA , AREKUSANDAA KUUTO , HAINRIHI HARUTOMAN
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