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    21.
    发明专利
    未知

    公开(公告)号：DE4229244A1

    公开(公告)日：1994-03-03

    申请号：DE4229244

    申请日：1992-09-02

    Applicant: BASF AG

    Inventor： HOESSEL PETER DR ,  STEPHAN OSKAR ,  HOFFMANN GERHARD DR ,  LANGEN JUERGEN DR

    IPC: B29C35/08 ,  B29C43/18 ,  B29C59/16 ,  B29C70/78 ,  B81B1/00 ,  B81C1/00 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027 ,  G03F7/004

    Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up into the mm region by imagewise irradiation of polymers with X-rays and removal of the imagewise irradiated regions of the polymers. Before the imagewise irradiation, the polymers, which have layer thicknesses ranging from several mu m up into the mm region are applied under pressure to an electrically conductive base and firmly anchored by melting in a frame and using a pressure ram. The process according to the invention is suitable, in particular, for making microstructures having structure depths of between 3 mu m and 2000 mu m and very fine lateral dimensions of less than 10 mu m.

    22.
    发明专利
    未知

    公开(公告)号：DE4223886A1

    公开(公告)日：1994-01-27

    申请号：DE4223886

    申请日：1992-07-21

    Applicant: BASF AG

    Inventor： HOESSEL PETER DR ,  HARTH KLAUS DR ,  HOFFMANN GERHARD DR ,  HIBST HARTMUT DR

    IPC: C23F1/00 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  H01L21/302

    Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up to the mm range by imagewise irradiation of polymers which have been applied to electrically conductive substrates using an adhesive layer, with synchrotron radiation and removal of the imagewise irradiated regions. The adhesive layer is composed of at least two different chemical elements which are applied by simultaneous vapour deposition or cathode sputtering onto the conductive substrate and are selectively or partly removed before the application of the polymer. The process is suitable for making metal or plastic microstructures.

    24.
    发明专利
    未知

    公开(公告)号：DE59808518D1

    公开(公告)日：2003-07-03

    申请号：DE59808518

    申请日：1998-10-06

    Applicant: BASF AG

    Inventor： DIEING REINHOLD DR ,  HOESSEL PETER DR ,  SANNER AXEL DR

    IPC: A61K8/81 ,  A61Q5/02 ,  A61Q5/12 ,  C07D233/58 ,  C07D521/00 ,  C08F226/06 ,  A61K7/06 ,  A61K7/50

    Abstract: Cationic polymers (I) are used in hair cosmetic formulations. (I) are obtained by: (1) free radical-initiated copolymerization of (a) 60-99 wt.% optionally substituted, optionally quaternized 1-vinylimidazole, (b) 1-40 wt.% acid or salt containing a polymerizable double bond and (c) 0-30 wt.% other comonomer and (2) quaternization if an unquaternized 1-vinylimidazole is used. An Independent claim is also included for shampoo formulations containing 0.01-5 wt.% (I).

    25.
    发明专利
    未知

    公开(公告)号：DE19745637A1

    公开(公告)日：1999-04-22

    申请号：DE19745637

    申请日：1997-10-16

    Applicant: BASF AG

    Inventor： DIEING REINHOLD DR ,  HOESSEL PETER DR ,  SANNER AXEL DR

    IPC: A61K8/81 ,  A61Q5/02 ,  A61Q5/12 ,  C07D233/58 ,  C07D521/00 ,  C08F226/06 ,  C08L39/04 ,  C08L33/02 ,  A61K7/075

    Abstract: Cationic polymers (I) are used in hair cosmetic formulations. (I) are obtained by: (1) free radical-initiated copolymerization of (a) 60-99 wt.% optionally substituted, optionally quaternized 1-vinylimidazole, (b) 1-40 wt.% acid or salt containing a polymerizable double bond and (c) 0-30 wt.% other comonomer and (2) quaternization if an unquaternized 1-vinylimidazole is used. An Independent claim is also included for shampoo formulations containing 0.01-5 wt.% (I).

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