SOLAR CELL SURFACE PASSIVATION USING PHOTO-ANNEAL
    29.
    发明申请
    SOLAR CELL SURFACE PASSIVATION USING PHOTO-ANNEAL 审中-公开
    使用照片的太阳能电池表面钝化

    公开(公告)号:WO2016019396A3

    公开(公告)日:2016-04-14

    申请号:PCT/US2015043507

    申请日:2015-08-03

    Applicant: SOLEXEL INC

    CPC classification number: H01L31/1868 H01L31/02167 Y02E10/50 Y02P70/521

    Abstract: A surface of a silicon substrate is passivated. A silicon oxide layer is formed on a first surface of a silicon substrate. An aluminum oxide layer is formed on the silicon oxide layer. A hydrogenated amorphous silicon nitride layer is formed on the aluminum oxide layer. A high intensity light source illuminates the silicon surface, the silicon oxide layer, the aluminum oxide layer, and the hydrogenated amorphous silicon nitride layer.

    Abstract translation: 硅衬底的表面被钝化。 在硅衬底的第一表面上形成氧化硅层。 在氧化硅层上形成氧化铝层。 在氧化铝层上形成氢化非晶氮化硅层。 高强度光源照射硅表面,氧化硅层,氧化铝层和氢化非晶氮化硅层。

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