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    MICRO-ELECTRO-MECHANICAL DEVICE WITH A SHOCK-PROTECTED TILTABLE STRUCTURE
    21.
    发明公开
    MICRO-ELECTRO-MECHANICAL DEVICE WITH A SHOCK-PROTECTED TILTABLE STRUCTURE 审中-公开

    公开(公告)号：EP3839605A1

    公开(公告)日：2021-06-23

    申请号：EP20215797.0

    申请日：2020-12-18

    Applicant: STMicroelectronics S.r.l.

    Inventor： BONI, Nicolò ,  CARMINATI, Roberto ,  MERLI, Massimiliano

    IPC: G02B26/10 ,  G02B26/08

    Abstract: The micro-electro-mechanical device is formed by a fixed structure (64) having a cavity (63); a tiltable structure (62) elastically suspended over the cavity (63), having a main extension in a tiltable plane (AB), and rotatable about a rotation axis (B) parallel to the tiltable plane (AB); and a piezoelectric actuation structure (70) including at least a first and a second driving arm (72A, 72B), the first and the second driving arms carrying respective piezoelectric material regions (73) and extending on opposite sides of the rotation axis (B). The first and the second driving arms (72A, 72B) are rigidly coupled to the fixed structure (64) and are elastically coupled to the tiltable structure (62). A stop structure (83A-83D) limits movements of the tiltable structure (62) with respect to the actuation structure (70) along a planar direction (A) perpendicular to the rotation axis (B). The stop structure has a first planar stop element (83A) formed between the first driving arm (72A) and the tiltable structure (62) and a second planar stop element (83B) formed between the second driving arm (72B) and the tiltable structure.

    PROCESS FOR MANUFACTURING AN OPTICAL MICROELECTROMECHANICAL DEVICE HAVING A TILTABLE STRUCTURE AND AN ANTIREFLECTIVE SURFACE
    22.
    发明公开
    PROCESS FOR MANUFACTURING AN OPTICAL MICROELECTROMECHANICAL DEVICE HAVING A TILTABLE STRUCTURE AND AN ANTIREFLECTIVE SURFACE 审中-公开

    公开(公告)号：EP3839603A1

    公开(公告)日：2021-06-23

    申请号：EP20215784.8

    申请日：2020-12-18

    Applicant: STMicroelectronics S.r.l.

    Inventor： SEGHIZZI, Luca ,  BONI, Nicolò ,  OGGIONI, Laura ,  CARMINATI, Roberto ,  CARMINATI, Marta

    IPC: G02B26/08 ,  B81B3/00 ,  B81C1/00

    Abstract: For manufacturing an optical microelectromechanical device (70), a first wafer (90) of semiconductor material having a first surface (100A) and a second surface (100B) is machined to form a suspended mirror structure (86), a fixed structure (74) surrounding the suspended mirror structure (86), elastic supporting elements (84A-84D) which extend between the fixed structure and the suspended mirror structure, and an actuation structure (83), coupled to the suspended mirror structure. A work wafer (10') is machined separately to form a second wafer (15) having a chamber (104) delimited by a bottom wall having a through opening (103). The second wafer is bonded to the first surface (100A) of the first wafer (90) in such a way that the chamber (104) overlies the actuation structure (83) and the through opening (103) is aligned to the suspended mirror structure (86). Furthermore, a third wafer (98) is bonded to the second surface (100B) of the first wafer to form a composite wafer device (112). The composite wafer device (112) is then diced to form an optical microelectromechanical device (70).

    MEMS DEVICE OSCILLATING ABOUT TWO AXES AND HAVING A POSITION DETECTING SYSTEM, IN PARTICULAR OF A PIEZORESISTIVE TYPE
    25.
    发明公开
    MEMS DEVICE OSCILLATING ABOUT TWO AXES AND HAVING A POSITION DETECTING SYSTEM, IN PARTICULAR OF A PIEZORESISTIVE TYPE 审中-公开
    MEMS器件振荡关于两轴并具有位置检测系统，特别是压电类型

    公开(公告)号：EP3226059A1

    公开(公告)日：2017-10-04

    申请号：EP16194688.4

    申请日：2016-10-19

    Applicant: STMicroelectronics S.r.l.

    Inventor： MERLI, Massimiliano ,  CARMINATI, Roberto ,  ROSSI, Marco

    IPC: G02B26/08 ,  G02B26/10

    CPC classification number: G02B26/0858 ,  G01L1/16 ,  G01L1/18 ,  G01L5/00 ,  G02B26/085 ,  G02B26/101 ,  G02B26/105 ,  G06F3/0423 ,  H01L41/09 ,  H03H9/02275 ,  H04N5/225

    Abstract: A MEMS device (40) has a platform (45) carried by a frame (48) via elastic connection elements (46) configured to enable rotation of the platform about a first axis (A). A bearing structure (41) supports the frame (48) through first and second elastic suspension arms configured to enable rotation of the frame (48) about a second axis (B), transverse to the first axis (A). The elastic suspension arms (49) are anchored to the bearing structure (41) through respective anchorage portions (50) arranged offset with respect to the second axis (B). A stress sensor (51, 52) is formed by a first and a second sensor element (51, 52), respectively arranged on the first and second suspension arms (49), in proximity of the anchorage portions, on a same side of the second axis (B), in a symmetrical position with respect to the first axis (A).

    Abstract translation: MEMS装置（40）具有经由弹性连接元件（46）由框架（48）承载的平台（45），所述弹性连接元件构造成使平台能够围绕第一轴线（A）旋转。 轴承结构（41）通过第一弹性悬臂和第二弹性悬臂来支撑框架（48），所述第一弹性悬臂和第二弹性悬臂被配置为使得框架（48）能够围绕横向于第一轴线（A）的第二轴线（B）旋转。 弹性悬臂（49）通过相对于第二轴线（B）偏移布置的相应锚固部分（50）锚固到支承结构（41）。 应力传感器（51,52）由第一和第二传感器元件（51,52）形成，所述第一和第二传感器元件（51,52）分别布置在所述第一和第二悬臂（49）上，靠近所述锚固部分， 第二轴线（B）处于相对于第一轴线（A）对称的位置。

    MICROMECHANICAL STRUCTURE WITH BIAXIAL ACTUATION AND CORRESPONDING MEMS DEVICE
    26.
    发明公开
    MICROMECHANICAL STRUCTURE WITH BIAXIAL ACTUATION AND CORRESPONDING MEMS DEVICE 审中-公开
    微机械结构的双轴驱动和相应的MEMS器件

    公开(公告)号：EP3173842A1

    公开(公告)日：2017-05-31

    申请号：EP16175286.0

    申请日：2016-06-20

    Applicant: STMicroelectronics S.r.l.

    Inventor： CARMINATI, Roberto

    IPC: G02B26/08 ,  G02B26/10

    CPC classification number: G02B26/0833 ,  B81B3/0083 ,  B81B2201/042 ,  G02B26/101 ,  G02B26/105 ,  G03B21/008

    Abstract: A reflector micromechanical structure (20) has: a frame (2), which defines, inside it, a window (5) and is elastically connected to an anchorage structure (7), fixed with respect to a substrate (8), by first elastic elements (6); an actuation structure (10) operatively coupled to the frame (2) for generating a first actuation movement; a mobile mass (4) arranged within the window (5) and elastically coupled to the frame (2) by second elastic elements (9), of a torsional type, such that the mobile mass (4) is rigidly coupled to the frame (2) in the first actuation movement and further defining a second actuation axis (y), of a torsional type, for the same mobile mass (4). A mass distribution is associated to the mobile mass (4) such as to generate, by the inertial effect, as a function of the first actuation movement, a second actuation movement, of rotation of the mobile mass (4) about the second actuation axis (y).

    Abstract translation: 一种反射器微机械结构（20）具有：框架（2），其在其内部限定窗口（5）并且弹性地连接到相对于基底（8）固定的锚固结构（7），第一 弹性元件（6）; 致动结构（10），所述致动结构（10）可操作地联接至所述框架（2）以用于产生第一致动运动; 布置在窗口（5）内并且通过第二弹性元件（9）弹性地联接到框架（2）的扭转类型的移动质量块（4），使得移动质量块（4）刚性地联接到框架 2）在第一致动运动中并且进一步为相同的可移动质量块（4）限定扭转类型的第二致动轴线（y）。 质量分布与移动质量块（4）相关联，以便通过惯性效应产生移动质量块（4）围绕第二致动轴线（4）旋转的第一致动运动，第二致动运动的函数 （Y）。

    MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND OPTIMIZED SIZE
    27.
    发明公开
    MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND OPTIMIZED SIZE 审中-公开

    公开(公告)号：EP4293409A1

    公开(公告)日：2023-12-20

    申请号：EP23177206.2

    申请日：2023-06-05

    Applicant: STMicroelectronics S.r.l.

    Inventor： BONI, Nicolò ,  CARMINATI, Roberto ,  MERLI, Massimiliano

    IPC: G02B26/08 ,  B81B1/00 ,  H10N30/00

    Abstract: A microelectromechanical mirror device (3) has a first mirror tiltable structure (3a, 10) provided in a first die (11) of semiconductor material having a main extension in a horizontal plane (xy) defined by a first (x) and by a second (y) horizontal axes. The first mirror tiltable structure (3a, 10) has: a fixed structure (14) defining a frame (14') which delimits a cavity (13); a tiltable element (12) carrying a reflecting region (12'), elastically suspended above the cavity (13) and having a first (A) and a second (B) median axes of symmetry, elastically coupled to the frame (14') by a first (15a) and a second (15b) coupling structures, on opposite sides of the second axis (B); and a driving structure (20), coupled to the tiltable element (12) to cause it to rotate around the first axis (A) with a resonance movement. The first mirror tiltable structure (3a, 10) is asymmetrical with respect to the second axis (B) and has, along the first horizontal axis (x): a first extension dimension (d1), on a first side of the second axis (B); and a second extension dimension (d2), greater than the first extension dimension (d1), on a second side of the second axis (B), opposite to the first side.

    BIAXIAL MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION
    28.
    发明公开
    BIAXIAL MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION 审中-公开

    公开(公告)号：EP4242724A1

    公开(公告)日：2023-09-13

    申请号：EP23158195.0

    申请日：2023-02-23

    Applicant: STMicroelectronics S.r.l.

    Inventor： BONI, Nicolo' ,  CARMINATI, Roberto ,  MERLI, Massimiliano

    IPC: G02B26/10 ,  G02B26/08

    Abstract: A microelectromechanical mirror device (1) has a fixed structure (4) defining an external frame (4') which delimits a cavity (3); an internal frame (7), arranged above the cavity and defining a window (8); a tiltable structure (2) with a reflective surface (2'), arranged in the window and elastically coupled to the internal frame by a first and a second coupling elastic elements (9a, 9b); an actuation structure (10), coupled to the internal frame to cause the rotation, in a decoupled manner, of the tiltable structure around a first and a second rotation axis (SA, FA). The actuation structure has a first pair of driving arms (12a, 12b), elastically coupled to the internal frame and carrying piezoelectric material regions to cause a rotation of the tiltable structure around the first rotation axis; and a further pair of driving arms (12e, 12f), carrying piezoelectric material regions to cause a rotation of the tiltable structure around the second rotation axis and interposed between the fixed structure and the internal frame, to which they are elastically coupled by a first and a second suspension elastic elements (14e, 14f), yielding to torsion around the first rotation axis.

    MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND PIEZORESISTIVE SENSING HAVING SELF-CALIBRATION PROPERTIES
    29.
    发明公开
    MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND PIEZORESISTIVE SENSING HAVING SELF-CALIBRATION PROPERTIES 审中-公开

    公开(公告)号：EP4092475A1

    公开(公告)日：2022-11-23

    申请号：EP22171657.4

    申请日：2022-05-04

    Applicant: STMicroelectronics S.r.l.

    Inventor： BONI, Nicolò ,  MENDICINO, Gianluca ,  DUQI, Enri ,  CARMINATI, Roberto ,  MERLI, Massimiliano

    IPC: G02B26/08

    Abstract: A microelectromechanical mirror device (1; 100) has, in a die (1') of semiconductor material: a fixed structure (4) defining a cavity (3); a tiltable structure (2) carrying a reflecting region (2'), elastically suspended above the cavity; at least a first pair of driving arms (12a, 12b), coupled to the tiltable structure and carrying respective piezoelectric material regions (13) which may be biased to cause a rotation thereof around at least one rotation axis; elastic suspension elements (6a, 6b), which couple the tiltable structure elastically to the fixed structure, being stiff with respect to movements out of the horizontal plane and yielding with respect to torsion; and a piezoresistive sensor (20), configured to provide a detection signal (S r ) indicative of the rotation of the tiltable structure. At least one test structure (30, 30') is integrated in the die to provide a calibration signal (S c ) indicative of a sensitivity variation of the piezoresistive sensor (20), in order to calibrate the detection signal (S r ).

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