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公开(公告)号：US20170133197A1
公开(公告)日：2017-05-11
申请号：US15233181
申请日：2016-08-10
Applicant: JEOL Ltd.
Inventor： Shuji Kawai
CPC classification number: H01J37/266 , G01L7/00 , H01J37/185 , H01J37/26 , H01J37/32 , H01J2237/022 , H01J2237/201 , H01J2237/2802
Abstract: There is provided a charged particle beam system capable of reducing contamination of at least one sample. The charged particle beam system (100) has a sample chamber (15) in which the sample (S) is irradiated with a charged particle beam. The system (100) has a receptacle chamber (21) which is connected into the sample chamber (15) via an isolation valve (25) and in which the sample (S) is accommodated. The system further includes a transport mechanism (22) for conveying the sample (S) from the receptacle chamber (21) into the sample chamber (15), an exhaust portion (24) for vacuum pumping the receptacle chamber (21), and a cleaning portion (30) for cleaning the sample (S) accommodated in the receptacle chamber (21).
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公开(公告)号：US09558910B2
公开(公告)日：2017-01-31
申请号：US14371032
申请日：2012-12-03
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Shohei Terada , Yoshifumi Taniguchi , Yasuhira Nagakubo
CPC classification number: H01J37/20 , H01J37/26 , H01J37/28 , H01J2237/2007 , H01J2237/201 , H01J2237/20214 , H01J2237/2802
Abstract: A sample holder for an electron microscope has multiple sample stands, can allow at least one sample stand to move, and enables multiple samples for a transmission electron microscope to be prepared by a focused ion beam apparatus. A holder tip opening is provided in a tip of the sample holder. A back end of the sample holder has a knob, a rolling mechanism, a coarse adjustment mechanism, and a connector. By pressing the knob, fixation of the rolling mechanism is canceled, and the back end from the rolling mechanism and the tip of the sample holder will rotate. This rolling mechanism enables arrangement of the samples to be rotated in both the observing of a sample and the preparing of a sample for a transmission electron microscope with the focused ion beam apparatus. Moreover, the sample stand is movable by the coarse adjustment mechanism and the fine adjustment mechanism.
Abstract translation: 用于电子显微镜的样品架具有多个样品台，可以允许至少一个样品台移动，并且可以通过聚焦离子束装置制备用于透射电子显微镜的多个样品。 保持器顶端开口设置在样品保持器的尖端中。 样品架的后端具有旋钮，滚动机构，粗调机构和连接器。 通过按压旋钮，取消滚动机构的固定，并且来自滚动机构的后端和样品架的尖端将旋转。 该滚动机构能够在样品的观察和用聚焦离子束装置的透射型电子显微镜准备样品的同时进行旋转的样品的配置。 此外，样品台可以通过粗调机构和微调机构移动。
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公开(公告)号：US09476810B2
公开(公告)日：2016-10-25
申请号：US14110576
申请日：2012-04-23
Applicant: Paul Gottlieb
Inventor： Paul Gottlieb
CPC classification number: G01N1/28 , G01N1/06 , G01N1/286 , G01N1/36 , H01J2237/2007 , H01J2237/201
Abstract: Mineral samples for use in analytical instruments are created by a system that greatly reduces the sample preparation time and facilitates automation. For example, in some implementations, rather than grinding to expose the interior of mineral particles in sample plug containing mineral particles in an epoxy compound, the sample plug is sliced with a saw, which more rapidly provides in many applications a sufficiently smooth surface on the exposed particle surfaces for observation. Rather than slowly mixing a slow curing epoxy to avoid introducing bubbles into the sample plug, some implementations use a fast settle fixative and a mechanical mixture that avoid bubbles.
Abstract translation: 用于分析仪器的矿物样品由大大降低样品准备时间并便于自动化的系统创建。 例如，在一些实施方案中，不是研磨以暴露含有环氧化合物中的矿物颗粒的样品塞中的矿物颗粒的内部，用锯切片样品塞，其在许多应用中更快地提供足够光滑的表面 暴露的颗粒表面进行观察。 不是缓慢地混合缓慢固化的环氧树脂，以避免将气泡引入到样品塞中，一些实施方案使用快速沉降固定剂和避免气泡的机械混合物。
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公开(公告)号：US09449785B2
公开(公告)日：2016-09-20
申请号：US14538391
申请日：2014-11-11
Applicant: Howard Hughes Medical Institute
Inventor： John H. Price , Dravida Bock
CPC classification number: H01J37/20 , G01N1/32 , G01N35/00732 , H01J37/023 , H01J37/185 , H01J37/261 , H01J2237/2007 , H01J2237/201 , H01J2237/20278 , H01J2237/20285 , H01J2237/20292 , H01J2237/204 , H01J2237/26 , H01J2237/2602
Abstract: An automated workpiece processing apparatus including a processing section including a processing module configured for processing a workpiece at a process location, a transport module including a first shuttle stage, a second shuttle stage independent of the first stage, and an end effector connected to at least one of the first and second stages, the end effector being configured to hold and transport the workpiece into and out of the processing module, and having a range of motion, defined by a combination of the first and second stage, extending from a workpiece holding station outside the processing module to the processing location inside the processing module so the end effector defines a processing stage of the processing module, and an automated loading and transport section including a load port module through which workpieces are loaded into the automated loading and transport section, and being communicably connected to the transport module.
Abstract translation: 一种自动化工件处理装置，包括处理部分，其包括处理模块，所述处理模块被配置为在处理位置处理工件;传输模块，包括第一穿梭台，独立于所述第一阶段的第二梭动台，以及至少连接至少 第一和第二阶段中的一个，末端执行器被构造成保持和输送工件进出处理模块，并且具有由第一和第二平台的组合限定的运动范围，该范围从工件夹持 处理模块外部的处理站内的处理位置，使得末端执行器限定处理模块的处理阶段，以及自动装载和传送部分，其包括装载端口模块，通过该装载端口模块将工件装载到自动装载和传送部分中 并且可传输地连接到传送模块。
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315.发明申请公开(公告)号：US20150318143A1
公开(公告)日：2015-11-05
申请号：US14646159
申请日：2013-11-26
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Yusuke OMINAMI , Takashi OHSHIMA , Sukehiro ITO
CPC classification number: H01J37/16 , H01J37/18 , H01J37/20 , H01J37/228 , H01J37/244 , H01J37/28 , H01J2237/2003 , H01J2237/2004 , H01J2237/2006 , H01J2237/2007 , H01J2237/201 , H01J2237/20235 , H01J2237/2445 , H01J2237/24455 , H01J2237/24475 , H01J2237/2608 , H01J2237/2801
Abstract: This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform.
Abstract translation: 该带电粒子束装置将由带电粒子显微镜产生的初级带电粒子束照射到构成至少一部分试样基底的发光部件上的试样上，除了通过以下方式获得带电粒子显微镜图像 检测通过或散射在样品内的带电粒子的发光部件在样品仍然配置在样品平台上的同时通过光学显微镜获得光学显微镜图像。
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Patent Agency Ranking
公开(公告)号：US20150243473A1
公开(公告)日：2015-08-27
申请号：US14538391
申请日：2014-11-11
Applicant: Howard Hughes Medical Institute
Inventor： John H. Price , Dravida Bock
CPC classification number: H01J37/20 , G01N1/32 , G01N35/00732 , H01J37/023 , H01J37/185 , H01J37/261 , H01J2237/2007 , H01J2237/201 , H01J2237/20278 , H01J2237/20285 , H01J2237/20292 , H01J2237/204 , H01J2237/26 , H01J2237/2602
Abstract: An automated workpiece processing apparatus including a processing section including a processing module configured for processing a workpiece at a process location, a transport module including a first shuttle stage, a second shuttle stage independent of the first stage, and an end effector connected to at least one of the first and second stages, the end effector being configured to hold and transport the workpiece into and out of the processing module, and having a range of motion, defined by a combination of the first and second stage, extending from a workpiece holding station outside the processing module to the processing location inside the processing module so the end effector defines a processing stage of the processing module, and an automated loading and transport section including a load port module through which workpieces are loaded into the automated loading and transport section, and being communicably connected to the transport module.
Abstract translation: 一种自动化工件处理装置，包括处理部分，其包括处理模块，所述处理模块被配置为在处理位置处理工件;传输模块，包括第一穿梭台，独立于所述第一阶段的第二梭动台，以及至少连接至少 第一和第二阶段中的一个，末端执行器被构造成保持和输送工件进出处理模块，并且具有由第一和第二平台的组合限定的运动范围，该范围从工件夹持 处理模块外部的处理站内的处理位置，使得末端执行器限定处理模块的处理阶段，以及自动装载和传送部分，其包括装载端口模块，通过该装载端口模块将工件装载到自动装载和传送部分中 并且可传输地连接到传送模块。
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公开(公告)号：US09064673B2
公开(公告)日：2015-06-23
申请号：US13915149
申请日：2013-06-11
Applicant: Axcelis Technologies, Inc.
Inventor： William Davis Lee , Kevin J. Hoyt , David Shanner , Jason Beringer
IPC: H01L21/673 , H01J37/20 , H01J37/317 , H01L21/687 , H01L21/683
CPC classification number: H01J37/20 , H01J37/3171 , H01J2237/08 , H01J2237/2007 , H01J2237/201 , H01L21/6831 , H01L21/68785 , Y10S901/31
Abstract: A workpiece carrier comprises a first plate having a first outer diameter, a first inner diameter, and a first recess extending a first distance from the first inner diameter toward the first outer diameter. The workpiece carrier further comprises a second plate having a second outer diameter, a second inner diameter, and a second recess extending a second distance from the second inner diameter toward the second outer diameter. A plurality of mating features associated with the first plate and second plate are configured to selectively fix a position of a first workpiece between the first plate and second plate within the first recess and second recess.
Abstract translation: 工件载体包括具有第一外径，第一内径和从第一内径向第一外径延伸第一距离的第一凹槽的第一板。 工件托架还包括具有第二外径，第二内径和从第二内径向第二外径延伸第二距离的第二凹槽的第二板。 与第一板和第二板相关联的多个配合特征被配置为在第一凹部和第二凹部内选择性地将第一工件的位置固定在第一板和第二板之间。
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公开(公告)号：US20150072461A1
公开(公告)日：2015-03-12
申请号：US14510109
申请日：2014-10-08
Applicant: Intevac, Inc.
Inventor： Babak Adibi , Moon Chun
IPC: H01L31/18 , H01J37/18 , H01J37/317
CPC classification number: H01L31/1876 , C23C14/042 , C23C14/48 , H01J37/185 , H01J37/3171 , H01J37/32412 , H01J37/32422 , H01J2237/0437 , H01J2237/184 , H01J2237/201 , H01J2237/327 , H01J2237/3365 , H01L21/2236 , H01L31/068 , H01L31/0682 , H01L31/1804 , H01L31/1864 , Y02E10/547 , Y02P70/521
Abstract: An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to allow the ions to pass therethrough subsequent to the ions passing through the first grid plate, wherein the second grid plate is configured to be biased by a power supply; and a substrate holder configured to support a substrate in a position where the substrate is implanted with the ions subsequent to the ions passing through the second grid plate.
Abstract translation: 具有栅格组件的离子注入系统。 该系统包括构造成在等离子体区域中提供等离子体的等离子体源; 第一格栅板，其具有多个孔，其被配置为允许来自等离子体区域的离子通过，其中所述第一格栅板被配置为被电源偏置; 第二格栅板，其具有多个孔，其构造成允许离子穿过第一栅格板之后的离子通过，其中第二栅格板被配置为被电源偏置; 以及衬底保持器，其被配置为在所述离子通过所述第二栅格板之后将所述衬底支撑在所述衬底被注入的位置处的所述离子。
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公开(公告)号：US20140370205A1
公开(公告)日：2014-12-18
申请号：US14475783
申请日：2014-09-03
Applicant: Tokyo Electron Limited
Inventor： Hitoshi KATO , Hiroyuki KIKUCHI , Takeshi KUMAGAI
IPC: C23C16/458 , H01J37/32 , C23C16/50
CPC classification number: C23C16/4581 , C23C16/4405 , C23C16/4554 , C23C16/45551 , C23C16/4584 , C23C16/50 , H01J37/32458 , H01J37/32715 , H01J37/32733 , H01J37/32825 , H01J2237/032 , H01J2237/201 , H01J2237/20214 , H01J2237/332 , H01L21/0206
Abstract: A film deposition method using a film deposition apparatus, includes: a film deposition process step in which at least a substrate is mounted on at least one of the circular concave portions and a film is deposited on the substrate; and a particle reducing process step performed before or after the film deposition process step, in which particles in the vacuum chamber are reduced without mounting substrates on the circular concave portions, the particle reducing process step including, a step of supplying a first gas to the vacuum chamber; a step of generating plasma from the first gas by supplying high frequency waves to a plasma generating device provided for the vacuum chamber; and a step of exposing the plurality of circular concave portions, on each of which a substrate is not mounted, to the plasma while rotating the susceptor.
Abstract translation: 使用成膜装置的成膜方法包括：成膜工序，在至少一个所述圆形凹部上至少安装有基板，在所述基板上淀积薄膜; 以及在成膜处理工序之前或之后进行的粒子还原工序，其中真空室中的颗粒在不将基板安装在圆形凹部上的情况下减少，所述颗粒还原工艺步骤包括：将第一气体供应到 真空室; 通过向设置在真空室中的等离子体产生装置提供高频波而从第一气体产生等离子体的步骤; 以及在旋转所述基座的同时，将其中未安装基板的所述多个圆形凹部暴露于所述等离子体的步骤。
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公开(公告)号：US08789826B2
公开(公告)日：2014-07-29
申请号：US14010780
申请日：2013-08-27
Applicant: EXpressLO LLC
Inventor： Lucille A. Giannuzzi
CPC classification number: H01J37/3002 , G01N1/00 , G01N1/32 , H01J37/20 , H01J2237/201 , H01J2237/31745
Abstract: A method for mounting a specimen on a specimen carrier for milling in an ex-situ lift-out (EXLO) milling process is described where “cross-section” specimens, plan view specimens, or bulk specimens may be lifted-out for analysis. The method comprising positioning the specimen on a recessed surface within a specimen carrier top surface so that a region to be milled is centered about a carrier opening formed through the specimen carrier. Peripheral edges of the specimen are then wedged against inwardly sloping side walls framing the recessed surface. Finally, the specimen is mounted to the specimen carrier so that a path of a milling beam intersects the region to be milled and carrier opening.
Abstract translation: 描述了一种将样品安装在样本载体上用于在非原位提取（EXLO）铣削过程中进行铣削的方法，其中可以将“横截面”样本，平面图样本或体积样本提起以进行分析。 该方法包括将样品定位在样品载体顶表面内的凹陷表面上，使得待研磨的区域围绕通过样品载体形成的载体开口居中。 然后将试样的外围边缘楔入抵靠凹陷表面的向内倾斜的侧壁。 最后，将样品安装到试样载体上，使得铣削梁的路径与要研磨的区域和载体开口相交。
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