公开(公告)号：SG120919A1

公开(公告)日：2006-04-26

申请号：SG200301500

申请日：2003-03-26

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS PIETER ,  JONKERS JEROEN ,  DIJSSELDONK VAN ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G21K1/04 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00

Abstract: Controlled aperture for providing an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the other. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

公开(公告)号：SG112973A1

公开(公告)日：2005-07-28

申请号：SG200407394

申请日：2004-12-15

Applicant: ASML NETHERLANDS BV

Inventor： VAN DIJSSELDONK ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO ,  VOORMA HARM-JAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus (1) including a radiation attenuator (25) or a variable aperture system, such as masking blades (31,32), arranged in or near an intermediate focus (23) of the projection system (PL). Besides a radiation attenuator or a variable aperture system, a measuring system (61) may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle (38) in the illumination system (IL), fewer design restrictions occur because of more space available, resulting in a lower design cost.

公开(公告)号：SG109610A1

公开(公告)日：2005-03-30

申请号：SG200405050

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  DIERICHS MARCEL MATHIJS THEODO ,  JASPER JOHANNES CHRISTIAAN MAR ,  MEIJER HENDRICUS JOHANNE MARIA ,  MICKAN UWE ,  MULKENS JOHANNES CATHARINUS HU ,  LIPSON MATTHEW ,  UITTERDIJK TAMMO ,  BASELMANS JOHANNES JACOBUS MAT

IPC: H01L21/027 ,  G02B1/10 ,  G03F7/20

公开(公告)号：SG106672A1

公开(公告)日：2004-10-29

申请号：SG200301188

申请日：2003-03-06

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS FRANCISCUS ANT ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G03F1/00 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027 ,  G03F1/04

Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.