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    32.
    发明专利
    未知

    公开(公告)号：DE59503094D1

    公开(公告)日：1998-09-10

    申请号：DE59503094

    申请日：1995-12-07

    Applicant: BASF AG

    Inventor： KNOLL KONRAD ,  LOTH WOLFGANG ,  FISCHER WOLFGANG ,  GAUSEPOHL HERMANN

    IPC: C08F2/42 ,  C08F6/00 ,  C08F297/04 ,  C08J3/00 ,  C08L25/06 ,  C08L53/02

    Abstract: PCT No. PCT/EP95/04809 Sec. 371 Date Jun. 16, 1997 Sec. 102(e) Date Jun. 16, 1997 PCT Filed Dec. 7, 1995 PCT Pub. No. WO96/18682 PCT Pub. Date Jun. 20, 1996Toughened vinyl aromatic compounds, in particular high impact polystyrene, are prepared by a continuous process in which the vinyl aromatic compound and the impact modifier, an elastomeric block copolymer, are each prepared separately in a reaction zone by anionic polymerization, with or without heat exchange with the environment and, if required, with the addition of a solvent, and are polymerized until complete conversion is achieved, and the living chain ends are terminated in a manner known per se, and a thermoplastic, toughened molding material is based on a vinyl aromatic compound having a residual content of less than 50 ppm of monomers and less than 100 ppm of oligomers.

    THERMOPLASTIC MOLDING COMPOUND
    33.
    发明专利
    THERMOPLASTIC MOLDING COMPOUND 未知

    公开(公告)号：CA2193131A1

    公开(公告)日：1995-12-21

    申请号：CA2193131

    申请日：1995-05-31

    Applicant: BASF AG

    Inventor： KNOLL KONRAD ,  GAUSEPOHL HERMANN

    IPC: C08L25/04 ,  C08F2/00 ,  C08F212/06 ,  C08F212/08 ,  C08F212/32 ,  C08F212/34 ,  C08F297/00 ,  C08F297/02 ,  C08L25/16 ,  C08L101/00 ,  C08L53/00 ,  C08L25/02

    Abstract: Thermoplastic moulding materials contain as essential components: (A) 10 to 100 % by weight copolymers from monomers having the general formulas (I) and (II), in which R1 stands for H or an alkyl residue with 1-22 C atoms; R2 stands for H or an alkyl residue with 1-22 C atoms; R3 stands for H or an alkyl residue with 1-4 C atoms; a = 0, 1, 2, 3, 4 or 5; b = 0, 1, 2, 3, 4 or 5; (B) 0 to 3,000 ppm, in relation to the weight of component A, of compounds having the general formula (I); (C) 0 to 500 ppm, in relation to the weight of component A, of compounds having the general formula (II); (D) 0 to 90 % by weight, in relation to the total weight of the moulding material, of other polymers different from (A); and (E) 0 to 50 % by weight, in relation to the total weight of the moulding material, of other additives and auxiliary products.

    Method for producing block copolymer, involves converting butadienyl terminated polymer Pm1 with cationic polymer, where polymer P1 has general formula
    34.
    发明专利
    Method for producing block copolymer, involves converting butadienyl terminated polymer Pm1 with cationic polymer, where polymer P1 has general formula 未知

    公开(公告)号：DE102007043874A1

    公开(公告)日：2008-05-08

    申请号：DE102007043874

    申请日：2007-09-14

    Applicant: BASF AG

    Inventor： CSIHONY SZILARD ,  WALTER HANS-MICHAEL ,  PFISTNER HEIKE ,  KNOLL KONRAD

    IPC: C08F293/00 ,  C08F290/12 ,  C08L53/00

    Abstract: Block copolymer production involves converting a 1,3-butadien-1-yl terminated polymer P1 with a cationic polymer P2. The polymer P1 has general formula (I), which is produced by splitting of hydrogen halide of a compound having the general formula (II). The compound having general formula (II), is produced from a polymer having general formula (III) with a 1,3-butadiene having general formula (IV). The polymer P2 has general formula (V). The compounds having general formulae (I-V), are new. In formula (I), Pm1 : polymer residue; n : 1-6; Q : H or alkyl; R : alkyl or aryl; and R1>,R2>, R3>,R4>,R5>H or alkyl. In formula (II), Pm1,n, Q, R, R1>, R2>, R3>, R4>, R5>same as variable groups in formula (I); and X : halogen, alkoxy, acyloxy. In formula (III),Pm1,R,Q,X=same as variable groups in formula (I). In formula (IV),R1>,R2>,R3>,R4>,R5>=same as variable groups in formula (I). Provided that: (1) Pm1 is polyisobutenyl residue, and Q and R are methyl. In formula (V), Pm2 : polymeric residue, preferably polystyrene residue and polyisobutenyl residue; Q' : H or alkyl; R' : alkyl or aryl; and Y : halogen, alkoxy or acyloxy. [Image] [Image] [Image] [Image] [Image].

    40.
    发明专利
    未知

    公开(公告)号：DE59909649D1

    公开(公告)日：2004-07-08

    申请号：DE59909649

    申请日：1999-03-03

    Applicant: BASF AG

    Inventor： KNOLL KONRAD ,  NIESSNER NORBERT ,  WUENSCH JOSEF ,  GAUSEPOHL HERMANN

    IPC: C08J5/00 ,  C08J5/18 ,  C08L25/06 ,  C08L53/02

    Abstract: Polymer mixtures compriseP1) from 1 to 85% by weight of an elastomeric block copolymer which has been built up from hard blocks S made from vinylaromatic monomers and from random soft blocks B/S made up from dienes and from vinylaromatic monomers, and which contains at least the block structure S-B/S-S, where the diene content is less than 50 percent by weight and the proportion of the soft phase formed from the blocks B/S is at least 60 percent by weight, based in each case on the entire block copolymer,P2) from 5 to 89% by weight of a block copolymer differing from P1) and made from vinylaromatic monomers and from dienes,P3) from 10 to 94% by weight of glass-clear or impact-modified polystyrene or mixtures thereof, andP4) from 0 to 84% by weight of other additives,where the total of components P1) to P4) is 100%.

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