公开(公告)号：FI772634A

公开(公告)日：1978-03-17

申请号：FI772634

申请日：1977-09-06

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  DISTEFANO THOMAS HERMAN ,  WOODALL JERRY MAC PHERSON

IPC: C02F1/14 ,  F24J2/48 ,  G02B

公开(公告)号：AU8575775A

公开(公告)日：1977-04-21

申请号：AU8575775

申请日：1975-10-15

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  WOODALL JERRY MACPHERSON ,  ZIEGLER JAMES FRANCIS

IPC: F24J2/48 ,  F24S10/75 ,  G02B5/00 ,  F24J3/02 ,  C23C11/02

Abstract: An efficient converter of photon energy to heat has been devised comprising a dense array of metal whiskers grown with spacings between the whiskers of a few wavelengths of visible light. The material selected, and tungsten is exemplary of such materials, has low emissivity, but achieves significant optical absorption by trapping the light impinging on the dense array by a geometric maze effect. The characteristics of the surface are excellent for the conversion of solar energy to heat.

公开(公告)号：AU5879673A

公开(公告)日：1975-02-06

申请号：AU5879673

申请日：1973-08-01

Applicant: IBM

Inventor： GAMBINO RICHARD JOSEPH ,  CUOMO JEROME JOHN ,  CHAUDHARI PRAVEEN

IPC: G02F1/09 ,  C22C19/00 ,  C22C45/04 ,  G02F1/00 ,  G11B11/10 ,  G11B11/105 ,  G11C11/14 ,  G11C13/06 ,  G11C19/08 ,  H01F10/00 ,  H01F10/12 ,  H01F10/13 ,  H01F10/14 ,  H01F10/16 ,  H01F7/02 ,  H03K23/32

公开(公告)号：DE19515347C2

公开(公告)日：1997-04-17

申请号：DE19515347

申请日：1995-04-26

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  GAMBINO RICHARD JOSEPH ,  GRILL ALFRED ,  KANE WILLIAM FRANCIS ,  MIKALSEN DONALD JOSEPH

IPC: H01L27/04 ,  H01L21/822 ,  H01L21/8242 ,  H01L21/8246 ,  H01L27/105 ,  H01L27/108 ,  H01L27/115 ,  H01G4/008 ,  H01G4/12

公开(公告)号：DE69302029D1

公开(公告)日：1996-05-09

申请号：DE69302029

申请日：1993-01-21

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  GUARNIERI CHARLES RICHARD ,  HOPWOOD JEFFREY ALAN ,  WHITEHAIR STANLEY JOSEPH

IPC: H01L21/205 ,  C23F4/00 ,  H01J37/32 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

公开(公告)号：DE19515347A1

公开(公告)日：1995-11-02

申请号：DE19515347

申请日：1995-04-26

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  GAMBINO RICHARD JOSEPH ,  GRILL ALFRED ,  KANE WILLIAM FRANCIS ,  MIKALSEN DONALD JOSEPH

IPC: H01L27/04 ,  H01L21/822 ,  H01L21/8242 ,  H01L21/8246 ,  H01L27/105 ,  H01L27/108 ,  H01L27/115 ,  H01G4/008 ,  H01G4/12

Abstract: The electrode structure (10) includes a substrate (26) with a free surface semiconductor layer (27), metal (31) and metal oxide (32) layers. The metal layer is formed from a chosen one of the group Ru, Ir, Re, Rh, Os, Pd. The metal oxide layer is chosen from the same metallic group as the initial metal. A further metallic layer (33) over the oxide layer is formed of metal from the same group. The semiconductor layer is of Silicon or Germanium. Included above the metal and metal oxide layers is a further layer having a high dielectric constant (16). The dielectric material is an oxide of ferroelectric or para-electric material such as BaxSr(1-x)TiO3 or PbZr3Ti(1-x)O3 and a fifth layer of conducting material.

公开(公告)号：DE3772845D1

公开(公告)日：1991-10-17

申请号：DE3772845

申请日：1987-05-08

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  DIBBLE ERIC PAUL ,  LEVINE SOLOMON LEON

IPC: H01B1/06 ,  C23C14/06 ,  C23C14/34 ,  H01H1/023 ,  H01H11/04 ,  H01H1/02

公开(公告)号：DE3674501D1

公开(公告)日：1990-10-31

申请号：DE3674501

申请日：1986-07-28

Applicant: IBM

Inventor： BUMBLE BRUCE ,  CUOMO JEROME JOHN ,  LOGAN JOSEPH SKINNER ,  ROSSNAGEL STEVEN MARK

IPC: H05K3/08 ,  C23C14/34 ,  C23F1/04 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065

公开(公告)号：DE3673749D1

公开(公告)日：1990-10-04

申请号：DE3673749

申请日：1986-09-19

Applicant: IBM

Inventor： CUOMO JEROME JOHN ,  GUARNIERI CHARLES RICHARD

IPC: B01J19/08 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/302 ,  H01L21/31 ,  H05H1/22

Abstract: Plasma enhancement is achieved in a plasma glow system (1) by increasing the number of photoelectric electrons (15) in the plasma glow (11) by producing photoelectrons from the surface of a target (3) in the system by the use of a radiation source (8). This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density.The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode (2), a target, a substrate platform (5) containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics (9) for focussing the UV radiation onto the target through a UV transmissive window (10) are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.

公开(公告)号：DE3380580D1

公开(公告)日：1989-10-19

申请号：DE3380580

申请日：1983-05-23

Applicant: IBM ,  KAUFMAN HAROLD RICHARD

Inventor： KAUFMAN HAROLD RICHARD ,  CUOMO JEROME JOHN ,  HARPER JAMES KCKELL EDWIN

IPC: H01J37/22 ,  C23C14/46 ,  C23F1/00 ,  C23F4/00 ,  H01J27/02 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/265

Abstract: A compact ion source plug (43) connected to a socket (40) is provided. The source uses a magnetic pole piece which includes a center pole piece (50) and a surrounding circumferential pole piece (45) to form an arcuate fringe field. Cathode elements (47) and anode elements (48,49) are located within the fringe field for producing a plasma. A source body (52) terminates at one end with at least one grid (56, 57) and forms a plasma chamber with a base member (43). All of the electrical connections to the plasma generator and the gas connection are through a plug formed on the opposite side of the base member (43).