公开(公告)号：JP2003043682A

公开(公告)日：2003-02-13

申请号：JP2001233520

申请日：2001-08-01

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO KOJI ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/312 ,  H01L23/12 ,  H05K1/00 ,  H05K1/16

CPC classification number: H05K1/162 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/26 ,  G03F7/38 ,  H01L21/02126 ,  H01L21/02186 ,  H01L21/02282 ,  H01L21/02343 ,  H01L21/02348 ,  H01L21/312 ,  H05K1/0286 ,  H05K2201/0116 ,  H05K2201/0187 ,  H05K2203/107 ,  H05K2203/1163 ,  Y10S430/106

Abstract: PROBLEM TO BE SOLVED: To provide such a radiation sensitive composition with a variable dielectric constant that the dielectric constant of the material can be varied by an easy method, the difference in the varied dielectric constant is sufficiently large, and a stable dielectric pattern or an optical material can be obtained without depending on the use conditions in the succeeding process. SOLUTION: The radiation sensitive composition with a variable dielectric constant contains (A) a decomposable polymer, (B) a non-decomposable polymer, (C) a radiation sensitive decomposing agent and (D) a stabilizer.

Abstract translation: 要解决的问题：为了提供具有可变介电常数的这种辐射敏感性组合物，材料的介电常数可以通过简单的方法来改变，介电常数的差异足够大，并且稳定的电介质图案或 可以在不依赖于后续工艺中的使用条件的情况下获得光学材料。 解决方案：具有可变介电常数的辐射敏感组合物包含（A）可分解聚合物，（B）不可分解聚合物，（C）辐射敏感分解剂和（D）稳定剂。

公开(公告)号：JP2001264771A

公开(公告)日：2001-09-26

申请号：JP2001017846

申请日：2001-01-26

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  MIYAMOTO TAKESHI ,  TSUDA YUSUKE ,  BESSHO NOBUO

IPC: G02F1/1337 ,  C08L79/08 ,  C09D179/08

Abstract: PROBLEM TO BE SOLVED: To provide an aligning agent for a liquid crystal which has little irregularity in the film thickness during printing and to provide a liquid crystal alignment film having no irregular thickness. SOLUTION: The aligning agent for a liquid crystal for printing and coating contains γ-butyrolactone and N-methyl-2-pyrrolidone as the solvent for a polyamic acid and/or soluble polymide as the reaction product of a tetracarboxylic acid dianhydride and a diamine. The liquid crystal alignment film is manufactured by using the aforementioned agent.

公开(公告)号：JP2000131846A

公开(公告)日：2000-05-12

申请号：JP30404398

申请日：1998-10-26

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F8/14 ,  C08F212/14 ,  C08F220/28 ,  C08F220/30 ,  G02B5/20 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive material superior in sensitivity, developability, etching endurance, heat resistance, and adhesion to a substrate and developable with an aqueous alkaline developing solution and usable for a positive resist for manufacturing the semiconductor integrated circuit and the like by using a copolymer composed essentially of repeating units derived from specified monomers. SOLUTION: The radiation sensitive material is composed essentially of repeating units derived from the monomers each represented by formulae I and II in which each of (a) and (b) is an integer of 0-10; each of (b) and (c) is an integer of 1-10; (d) is an integer 0-10; (e) is an integer of 0-5; R1 is an H atom or a 1-5C alkyl or phenyl group; R2 is a halogen atom or a 1-5C alkyl or such alkoxy or phenyl or 2-10 dialkylamino group, and when R2 exists by >=2, each of them may be same or different.

公开(公告)号：JP2000053444A

公开(公告)日：2000-02-22

申请号：JP22389498

申请日：1998-08-07

Applicant: JSR CORP

Inventor： TAKAHASHI SHIRO ,  MASUKO HIDEAKI ,  WATANABE TAKESHI ,  BESSHO NOBUO

IPC: C03C3/064 ,  C03C4/16 ,  C03C8/10 ,  C03C8/16 ,  C03C17/04 ,  H01J9/02 ,  H01J11/14 ,  H01J11/22 ,  H01J11/34 ,  H01J11/38 ,  H01J11/00 ,  H01J11/02

Abstract: PROBLEM TO BE SOLVED: To obtain a paste composition capable of forming a dielectric layer having colorless transparency without stripping an electrode and coloring a bath electrode at the time of firing by dispersing glass powder having a specific softening point in a binder resin and a solvent to suppress the erosion of a low m.p. glass to the space between the electrodes. SOLUTION: The glass powder having 500-550 deg.C softening point is used. The glass powder consists desirably of a mixture of 50-80 wt.% lead oxide, 5-20 wt.% boron oxide, 10-50 wt.% silicon oxide and 0-10 wt.% calcium oxide. The particle diameter of the glass powder is desirably 0.1-5 μm, the ratio of the glass powder occupied in the composition is desirably >=50 wt.% and the binder resin is desirably acrylic resin. The content of the binder resin is 5-40 pts.wt. and the content of the solvent is 5-50 pts.wt per 100 pts.wt. glass powder. The viscosity of the paste composition is desirably 10,000-200,000 cP at 25 deg.C.

公开(公告)号：JPH11283495A

公开(公告)日：1999-10-15

申请号：JP9844498

申请日：1998-03-26

Applicant: JSR CORP

Inventor： MASUKO HIDEAKI ,  OKAMOTO KENJI ,  YAMASHITA TAKANORI ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01J9/02 ,  B05D1/32 ,  B05D5/06 ,  H01J17/49

Abstract: PROBLEM TO BE SOLVED: To form a high definition pattern to improve workability when an electrode constituting each display cell of a plasma display panel is fixed. SOLUTION: An antireflective film forming paste layer 31 formed on a support film 32 is transferred to a board 11, a conductive paste layer 41 formed on another support film 42 is transferred to the antireflective film forming paste layer 31 and a resist layer 51 is formed on the conductive paste layer 41. The resist layer 51 is exposed to form a latent image of a resist pattern and developed to make the resist pattern obvious. The conductive paste layer 41 and the antireflective film forming paste layer 31 are etched to form a pattern thereof corresponding to the resist pattern and the pattern is fired. An electrode is formed by the above-described processes.

公开(公告)号：JPH11144628A

公开(公告)日：1999-05-28

申请号：JP31083797

申请日：1997-11-12

Applicant: JSR CORP

Inventor： MASUKO HIDEAKI ,  UDAGAWA TADAHIKO ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: C03C17/04 ,  C03C17/34 ,  H01J9/02 ,  H01J9/24 ,  H01J17/49

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method excellent in production efficiency by transferring a barrier rib forming material layer containing the glass powder applied to a flexible support film and a binding resin to the surface of a glass substrate fixed with electrodes. SOLUTION: A barrier rib forming material layer having a large film thickness and excellent in the homogeneity of the film thickness can be formed on a support film by applying a paste-like barrier rib forming material with a roll coater. The barrier rib forming material layer thus formed is transferred to the surface of a glass substrate. A resist film is formed on the transferred barrier rib forming material, ultraviolet rays are radiated via an exposure mask, the resist film is developed, portions other than a resist pattern are removed, and the barrier rib forming material layer of a resist removal section is selectively etched and baked to complete barrier ribs. The barrier rib forming material is applied to the resist film formed on the support film in advance to form a laminated film, thus the processes can be shortened by one process. The size accuracy of the completed bulkheads is high, and work efficiency is also high.

公开(公告)号：JP2004242725A

公开(公告)日：2004-09-02

申请号：JP2003033152

申请日：2003-02-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YASUDA YOSHITOMO ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: A61J1/10 ,  A61B1/00 ,  A61L29/00 ,  A61L31/00 ,  A61M5/14 ,  A61M25/00

Abstract: PROBLEM TO BE SOLVED: To provide a production method to produce easily and with high accuracy a polyimide thin film which is used for a medical instrument and the medical instrument equipped with the above polyimide thin film. SOLUTION: This invention is the medical instrument which includes a coating layer made of a photo-curing polyimide resin composition having (a) a polyimide resin, (b) a carbon cluster and/or its derivative and (c) a compound which includes a heterocycle excluding the above (a), or (a-1) a polyimide resin which includes a heterocycle and (b) the carbon cluster and/or its derivative as essential ingredients, and a production method of the medical instrument wherein a base material is coated with the photo-curing polyimide resin composition and irradiated with light to form the coating layer with a thickness of 1-1,000 μm. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004079663A

公开(公告)日：2004-03-11

申请号：JP2002235607

申请日：2002-08-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: B24B37/20 ,  B24B37/24 ,  H01L21/304 ,  B24B37/00

Abstract: PROBLEM TO BE SOLVED: To provide fixing agent of a pad for CMP wherein a pad for CMP can be fixed on a polishing plate, easily, strictly and surely, and isolation (exfoliation) of the pad is easy when the pad is exchanged, to provide a fixing method and an isolation method of the pad for CMP wherein the fixing agent is used, and to provide a working method of a wafer which uses the pad which is fixed on the polishing plate by using the above method.
SOLUTION: The fixing agent of the pad for CMP contains liquid crystal compound. The fixing method of the pad for CMP contains fixing wherein (1) the pad fixing agent is positioned between a surface of the pad and a surface of the polishing plate, and (2) the pad is fixed to the polishing plate by heating and fusing the fixing agent. The isolation method of the pad for CMP is characterized by performing isolation at a temperature exceeding a melting point of the fixing agent. The working method of a wafer is characterized by that a wafer is subjected to working treatment at a temperature lower than the melting point of the fixing agent, on the pad which is fixed to the polishing plate by using the fixing method.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2002338829A

公开(公告)日：2002-11-27

申请号：JP2002060169

申请日：2002-03-06

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO KOJI ,  YAMADA KENJI

IPC: G02B5/18 ,  C08K5/00 ,  C08L101/00 ,  G02B1/04 ,  G02B3/00

Abstract: PROBLEM TO BE SOLVED: To provide a composition permitting easy change in its refractive index of a material resulting in a sufficiently large difference in refractive indices thereby to give a stable refractive index pattern and an optical material which are not affected by service conditions thereafter, and a method for forming the refractive index pattern and the optical material. SOLUTION: The radiation-sensitive composition comprises (A) a decomposable compound, (B) a hydrolyzable of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium, tetramethoxysilane and the like or of a halogen compound such as tetrachlorosilane and the like, and (C) a radiation-sensitive decomposing agent.

公开(公告)号：JP2000319510A

公开(公告)日：2000-11-21

申请号：JP13365399

申请日：1999-05-14

Applicant: JSR CORP

Inventor： NATSUI TORU ,  NAKADA SHOICHI ,  MAKITA MINORU ,  KIMURA MASAYUKI ,  BESSHO NOBUO ,  KIMURA SHINICHI ,  TAKEUCHI YASUMASA

IPC: G02F1/1337 ,  C08L79/08

Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal alignment agent capable of giving a liquid crystal alignment layer having an angle of pre-tilt produced by irradiation of radioactive rays without any rubbing treatment, by compounding plural kinds of compounds selected from a group comprising a specific polyimide, a polymer having a specified structure and a compound having a specified structure. SOLUTION: This liquid crystal alignment agent contains at least two kinds of compounds selected from the group consisting of (A) a polyimide having a structure of the formula: P1-CH=CH-CO-Q1 (P1 and Q1 are each a divalent organic radical having one or more aromatic rings) in the main chain, (B) a polymer having at least one structure selected from a group of structures of the formulae: P2-CH=CH-CO-Q2 (P2 is a divalent organic radical having one or more aromatic rings; Q2 is a monovalent organic radical having one or more aromatic rings) and P3-CH=CH-CO-Q3 (P3 is a trivalent organic radical having one or more aromatic rings; Q3 is a monovalent organic radical having one or more aromatic rings), and (C) a compound having a structure of the formula: P4-CH=CH-CO-Q4 (P4 and Q4 are each a monovalent organic radical having one or more aromatic rings).