SEALED PLASMA COATINGS
    31.
    发明专利

    公开(公告)号:SG176824A1

    公开(公告)日:2012-01-30

    申请号:SG2011092160

    申请日:2010-06-11

    Abstract: A processing device includes a plurality of walls defining an interior space configured to be exposed to plasma and a surface coating on the interior surface of at least one of the plurality of walls. The surface coating includes pores forming interconnected porosity. The processing device further includes a sealant residing in at least a portion of the pores of the surface coating. In an embodiment, the sealant can be a thermally cured sealant having a cure temperature not greater than about 100C. In another embodiment, the sealant can be an epoxy sealant having a viscosity of not greater than 500 cP in liquid precursor form. In yet another embodiment, the sealant can be a low shrinkage sealant characterized by a solidification shrinkage of not greater than 8%.

    ESD DISSIPATIVE CERAMICS
    32.
    发明专利

    公开(公告)号:MY138830A

    公开(公告)日:2009-07-31

    申请号:MYPI20015296

    申请日:2001-11-20

    Abstract: THIS INVENTION RELATES TO A DENSE CERAMICS HAVING ESD DISSIPATIVE CHARACTERISTICS, TUNABLE VOLUME AND SURFACE RESISTIVITIES IN SEMI-INSULATIVE RANGE (10 3-10 11 OHM-CM), SUBSTANTIALLY PORE FREE, HIGH FLEXURAL STRENGTH, LIGHT COLORS, FOR DESIRED ESD DISSIPATION CHARACTERISTICS, STRUCTURAL RELIABILITY, HIGH VISION RECOGNITION, LOWER WEAR AND PARTICULATE CONTAMINATION TO BE USED AS ESD DISSIPATING TOOLS, FIXTURES, LOAD BEARING ELEMENTS, WORK SURFACES, CONTAINERS IN MANUFACTURING AND ASSEMBLING ELECTROSTATICALLY SENSITIVE MICROELECTRONIC, ELECTROMAGNETIC, ELECTRO-OPTIC COMPONENTS, DEVICES AND SYSTEMS.

    34.
    发明专利
    未知

    公开(公告)号:DE60128384D1

    公开(公告)日:2007-06-21

    申请号:DE60128384

    申请日:2001-11-20

    Abstract: This invention relates to a dense ceramics having ESD dissipative characteristics, tunable volume and surface resistivities in semi-insulative range (103-1011 Ohm-cm), substantially pore free, high flexural strength, light colors, for desired ESD dissipation characteristics, structural reliability, high vision recognition, low wear and particulate contamination to be used as ESD dissipating tools, fixtures, load bearing elements, work surfaces, containers in manufacturing and assembling electrostatically sensitive microelectronic, electromagnetic, electro-optic components, devices and systems.

    36.
    发明专利
    未知

    公开(公告)号:AT513311T

    公开(公告)日:2011-07-15

    申请号:AT07868710

    申请日:2007-11-09

    Abstract: A susceptor for holding a single crystal wafer for LED production is provided which includes a susceptor body having a recess for receiving a single crystal wafer, wherein the recess has a surface having a surface roughness (R max ) of not greater than about 10 microns. The susceptor body also includes silicon impregnated silicon carbide and a nitride layer overlying the susceptor body.

    39.
    发明专利
    未知

    公开(公告)号:DE69629980D1

    公开(公告)日:2003-10-23

    申请号:DE69629980

    申请日:1996-05-29

    Abstract: A method and corresponding apparatus for depositing a substance with temperature control on a surface of a substrate are disclosed. The method comprises the steps of : providing a cooling block having a surface that is cooled by heat exchange ; supporting said substrate from said cooling block so that the bottom surface of said substrate is spaced from said cooling block surface by a gap ; providing a gas in said gap ; and depositing said substance on the top surface of said substrate. With such a method, the temperature conditions are uniform and repeatable when depositing a substance on a substrate. The invention is especially applicable to deposition of diamond by plasma jet.

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