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    Electron beam apparatus comprising a point cathode
    31.
    发明授权
    Electron beam apparatus comprising a point cathode 失效
    包含点状阴极的电子束装置

    公开(公告)号：US3864572A

    公开(公告)日：1975-02-04

    申请号：US40284473

    申请日：1973-10-02

    Applicant: PHILIPS CORP

    Inventor： VAN DER MAST KAREL DIEDERICK ,  BARTH JAMES EDMOND

    IPC: H01J37/06 ,  H01J3/02 ,  H01J37/075 ,  H05H7/08 ,  H01J37/26

    CPC classification number: H01J37/075 ,  H01J3/02 ,  H01J3/024 ,  H01J2237/06316

    Abstract: The electron source of an electron beam apparatus comprises a cathode wire which is to be heated by a laser beam and which is to be displaced in the wire direction. This cathode wire has a thickness of from 10 to 30 microns. By applying a field strength of 105 to 106 KV/m to the heated wire tip and by controlling the laser intensity and the wire feed during operation by a signal derived from the emission of the wire tip, a tip is produced on the wire end having a curvature radius of approximately 1 micron. At a temperature just below the melting temperature of the wire a stable temperature field emission having a current density of up to better than 104 A/cm2 is thus realized.

    Abstract translation: 电子束装置的电子源包括由激光束加热并在线方向移位的阴极线。 该阴极线的厚度为10至30微米。 通过向加热的线尖施加105至106KV / m的场强，并且通过由电极尖端的发射导出的信号控制操作期间的激光强度和送丝，在具有 大约1微米的曲率半径。 在刚好低于电线熔化温度的温度下，实现了电流密度高达104A / cm2的稳定的温度场发射。

    Nikola tesla
    32.
    发明授权
    Nikola tesla 失效

    公开(公告)号：US455069A

    公开(公告)日：1891-06-30

    申请号：US455069D

    CPC classification number: H01J3/024

    Electron beam generator, image apparatus including the same and optical apparatus
    33.
    发明授权
    Electron beam generator, image apparatus including the same and optical apparatus 有权
    电子束发生器，包括其的图像装置和光学装置

    公开(公告)号：US09460888B2

    公开(公告)日：2016-10-04

    申请号：US15059199

    申请日：2016-03-02

    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

    Inventor： Moon Youn Jung ,  Dong Hoon Song ,  Jin Sun Kim

    IPC: H01J37/06 ,  H01J37/244

    CPC classification number: H01J37/06 ,  H01J3/024 ,  H01J2237/049 ,  H01J2237/061 ,  H01J2237/06325 ,  H01J2237/06366 ,  H01J2237/0656 ,  H01J2237/2482

    Abstract: Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

    Abstract translation: 可以提供电子束发生器，包括该电子束发生器的图像装置和光学装置。 光学装置包括在基板上提供第一和第二激光束的第一和第二激光装置，以及设置在第一和第二激光装置与基板之间的第一和第二激光束聚焦的第一光学系统。 第一和第二激光束彼此重叠，产生干涉光束，从而将干涉光束的光点尺寸减小为小于焦点处的第一和第二激光束的每一个的波长。

    INSPECTION APPARATUS
    34.
    发明申请
    INSPECTION APPARATUS 审中-公开
    检查装置

    公开(公告)号：US20150097116A1

    公开(公告)日：2015-04-09

    申请号：US14571594

    申请日：2014-12-16

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    Electron source for ionization with leakage current suppression
    36.
    发明授权
    Electron source for ionization with leakage current suppression 失效
    具有泄漏电流抑制的电离源

    公开(公告)号：US07701123B2

    公开(公告)日：2010-04-20

    申请号：US11301588

    申请日：2005-12-13

    Applicant: Gregory J. Wells ,  Edward G. Marquette

    Inventor： Gregory J. Wells ,  Edward G. Marquette

    IPC: H01J9/02

    CPC classification number: H01J49/14 ,  H01J3/024 ,  H01J49/08

    Abstract: An electron source includes a first electrode, a second electrode, a thermionic element interposed between and electrically isolated from the first electrode and the second electrode, and a guard electrode interposed between and electrically isolated from the first electrode and the second electrode. The thermionic element and the guard electrode may be at substantially the same voltage. Another electron source includes a first electrode, a second electrode, a thermionic element interposed between and electrically isolated from the first electrode and the second electrode, and a thermal expansion component interposed between and electrically isolated from the first electrode and the second electrode. The thermal expansion component may be heated to cause expansion. The heating may be cycled to cause alternating expansion and contraction.

    Abstract translation: 电子源包括插入在第一电极和第二电极之间并且与第一电极和第二电极电绝缘的第一电极，第二电极和热电离元件，以及插入在第一电极和第二电极之间并与之电隔离的保护电极。 热电离元件和保护电极可以处于基本上相同的电压。 另一电子源包括介于第一电极和第二电极之间并与之电隔离的第一电极，第二电极和热电离元件，以及介于第一电极和第二电极之间并与之电隔离的热膨胀组件。 热膨胀部件可能被加热以引起膨胀。 可以循环加热以引起交替的膨胀和收缩。

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