公开(公告)号：WO1996019722A1

公开(公告)日：1996-06-27

申请号：PCT/US1995004614

申请日：1995-04-13

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  NIKOONAHAD, Mehrdad

IPC: G01N21/00

CPC classification number: G03F7/70641 ,  G01N21/95623 ,  G02F1/113

Abstract: An apparatus for both deflecting a beam of light illuminating a spot on a surface and varying the size of the spot, electronically, without changing any system components. The apparatus includes an acousto-optic deflector (10) driven with a linear FM signal produced by a chirp signal generator (16). The linear FM signal is characterized with a dispersion rate, and the chirp signal generator includes a chirp dispersion selector to vary the dispension rate. A beam of collimated light (13) passes through the acousto-optic deflector (10) and appropriate focusing optics (14, 15) image the beam onto a spot in a nominal focal plane (17). The chirp dispension selector (17) sets the dispension rate in accord to a nominal rate, resulting in the beam illuminating a spot (18) in the focal plane (17). Generally, the focal plane coincides with a wafer surface (24), of the type having periodic (27b) and non-periodic (27c) features on it.

Abstract translation: 一种用于在不改变任何系统部件的情况下电子地偏转照射光斑的光束并且改变光斑的大小的装置。 该装置包括由啁啾信号发生器（16）产生的线性FM信号驱动的声光偏转器（10）。 线性FM信号的特征在于色散速率，并且啁啾信号发生器包括啁啾分散选择器以改变调节速率。 准直光束（13）通过声光偏转器（10）并且适当的聚焦光学器件（14,15）将光束成像到标称焦平面（17）上的光斑上。 啁啾调节选择器（17）根据标称速率设定调节速率，导致光束照射焦平面（17）中的光点（18）。 通常，焦平面与其上具有周期性（27b）和非周期（27c）特征的晶片表面（24）重合。

公开(公告)号：WO1996019711A1

公开(公告)日：1996-06-27

申请号：PCT/US1995004556

申请日：1995-04-13

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  NIKOONAHAD, Mehrdad ,  RIGG, Philip, R. ,  WELLS, Keith, B. ,  CALHOUN, David, S.

IPC: G01B11/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/956

Abstract: A surface height detection and positioning device for use in a surface inspection system. A light beam (25) impinges obliquely upon the surface (22), and a position detector (38) with a mechanical window (45) defining an aperture (46) receives specularly reflected light (33) producing a plurality of electrical signals. The aperture's width (46), along a scan direction, is of sufficient size to create a train of signals from each of the plurality of signals, having a frequency equal to the scan frequency. These signals carry information responsive to the position of the reflected beam (33) impinging on the detector and the beam's intensity. To abrogate information responsive to intensity variations at the detector, an electronic circuit (100) determines the sum and the difference of the plurality of signals, producing a summed signal and a difference signal, respectively. The difference signal is divided by the summed signal, thereby producing a normalized signal which represents the height of the surface.

Abstract translation: 一种用于表面检测系统的表面高度检测和定位装置。 光束（25）倾斜地撞击在表面（22）上，并且具有限定孔径（46）的机械窗口（45）的位置检测器（38）接收产生多个电信号的镜面反射光（33）。 沿着扫描方向的孔径宽度（46）具有足够的尺寸以产生具有等于扫描频率的频率的来自多个信号中的每一个的信号序列。 这些信号响应于入射在检测器上的反射光束（33）的位置和光束的强度而携带信息。 为了消除响应于检测器处的​​强度变化的信息，电子电路（100）分别确定多个信号的和和差，产生加和信号和差分信号。 差分信号除以相加信号，从而产生表示表面高度的归一化信号。

公开(公告)号：WO1996018094A1

公开(公告)日：1996-06-13

申请号：PCT/US1995016278

申请日：1995-12-08

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  JORDON, John, R., III ,  NIKOONAHAD, Mehrdad ,  WELLS, Keith, B.

IPC: G01N21/00

CPC classification number: G01N21/95623 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8825 ,  G01R31/2831 ,  G01R31/308 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A high throughput surface inspection system with enhanced detection sensitivity is described. The acquired data is processed in real time at a high rate of below 50 MHZ thereby reducing the cost for data processing. Anomalies are detected and verified by comparing adjacent repeating patterns and the height of the surface (40) is monitored and corrected dynamically to reduce misregistration errors between adjacent repeating patterns. Local thresholds employing neighborhood information are used for detecting and verifying the presence of anomalies. The sampled point spread function of the combined illumination (22) and collection system (90, 92, 111b) is exploited for anomaly detection and verification.

Abstract translation: 描述了具有增强检测灵敏度的高通量表面检测系统。 所获取的数据以低于50MHZ的高速率实时处理，从而降低了数据处理的成本。 通过比较相邻的重复图案来检测和验证异常，并且动态地监视和校正表面的高度（40）以减少相邻重复图案之间的对准错误。 使用邻域信息的本地阈值用于检测和验证异常的存在。 组合照明（22）和采集系统（90,92,111b）的采样点扩散函数被用于异常检测和验证。

公开(公告)号：WO1993023784A1

公开(公告)日：1993-11-25

申请号：PCT/US1993004111

申请日：1993-05-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  FEIN, Michael, E.

IPC: G02B27/14

CPC classification number: G01J3/02 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0216 ,  G01J3/0229 ,  G01J3/0243 ,  G01J3/0248 ,  G01J3/0262 ,  G02B5/04 ,  G02B27/1086 ,  G02B27/126 ,  G02B27/143 ,  G02B27/147

Abstract: A broadband area-division beamsplitter that includes a pair of abutting triangular prisms (51 and 53) providing two surfaces that are in optical contact in certain areas and are out of optical contact in other areas. One prism surface (57) is substantially planar while adjoining surface (55) of the other prism has alternating protrusions and depressions. The two surfaces are oriented on a diagonal so that light incident through one of the other prism faces is incident on the adjoining surfaces at an angle larger than the critical angle, providing total internal reflection at the out-of-contact gap regions. The protrusions and depressions on the one prism surface may be in the form of a corrugation (Fig. 4) or a checkerboard (Fig. 5) or some other patterns.

公开(公告)号：WO1993016373A1

公开(公告)日：1993-08-19

申请号：PCT/US1993000935

申请日：1993-02-02

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  VAUGHT, John, L. ,  FEIN, Michael, E. ,  NEUKERMANS, Armand, P.

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G02B27/46

Abstract: An apparatus used to inspect patterned wafers (10) and other substrates with periodic features for the presence of particles, defects and other aperiodic features in which a spatial filter (26) placed in the Fourier plane is used in combination with either broadband illumination, angularly diverse illumination or both. Embodiments are described that illuminate a patterned substrate using (1) a single monochromatic source (210) with a slit-shaped aperture stop (207) for angularly diverse illumination, (2) a single broadband source (512) with a pinhole aperture stop (510) for broadband illumination, (3) a single broadband source (14) with a slit-shaped aperture stop (20) for both broadband and angularly diverse illumination, or (4) multiple sources (205, 210) with an aperture stop (20, 207) for each source for at least angularly diverse illumination. The spatial filters are characterized by opaque tracks (56; 656) in an otherwise transmissive filter for blocking the elongated bands produced by diffraction from the periodic features on the illuminated substrate.

公开(公告)号：WO1992001923A1

公开(公告)日：1992-02-06

申请号：PCT/US1991001445

申请日：1991-03-01

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  PECEN, Jiri ,  DRINKWATER, Jim

IPC: G01N21/47

CPC classification number: G01N21/94 ,  G01N2021/4742 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01N2201/1085

Abstract: A particle imager and method for imaging particles on surfaces of substrates (19). A reflective suface (17) is scanned by a collimated light beam (57) and particles on the surface are detected by the scattered light caused by the particles. During a scan path (81) the intensity of the scattered light is measured forming intensity traces (91) and location addresses for the detected particles. Data from each scan path is stored in memory. A three-dimensional surface map (95) is formed from the data stored in memory. The intensity traces for a particle (71) when combined together in the surface map form an intensity profile (97, 99, 101) or signature of the particle. These signatures may then be compared to known particle signatures to determine characteristics of the detected particle.

Abstract translation: 一种用于在基板（19）的表面上成像颗粒的颗粒成像器和方法。 通过准直光束（57）扫描反射面（17），并且通过由颗粒引起的散射光来检测表面上的颗粒。 在扫描路径（81）期间，测量散射光的强度，形成强度迹线（91）和检测到的粒子的位置地址。 来自每个扫描路径的数据被存储在存储器中。 从存储在存储器中的数据形成三维表面图（95）。 当在表面图中组合在一起时，颗粒（71）的强度迹线形成强度分布（97,99,101）或颗粒的特征。 然后将这些签名与已知的粒子特征进行比较，以确定检测到的粒子的特征。

公开(公告)号：WO1997033158A1

公开(公告)日：1997-09-12

申请号：PCT/US1997004134

申请日：1997-03-05

Applicant: TENCOR INSTRUMENTS ,  VAEZ-IRAVANI, Mehdi

Inventor： TENCOR INSTRUMENTS

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/8825

Abstract: A single laser (30) is used to provide light for both dark (80) and bright field (60) detection. The laser beam is split into two beams by a Wollaston prism (40) and both beams are directed towards a sample (12) to be inspected to illuminate two areas (16, 18) of the sample. The light reflected by or transmitted through the sample at the two spots is then combined by the same or a different Wollaston prism and the phase shift caused by any anomaly of a sample is detected as a phase shift between the two beams by a bright field detector. Light scattered by the sample at the two spots is detected by a dark field detector. A halfwave plate (36) is used to orient the polarization plane of light from the laser incident on the Wollaston prism so that one of the two beams (52, 54) incident on the sample has a much higher intensity than the other and so that the sensitivity and the detection operation of dark field is not altered by the presence of two illuminated spots on the sample. A transparent dielectric at a suitable angle to the incident beam and the reflected or transmitted beam may be used to enhance bright field detection.

Abstract translation: 单个激光（30）用于为暗（80）和明场（60）检测提供光。 激光束被Wollaston棱镜（40）分成两个光束，并且两个光束被引向样品（12）以进行检查以照射样品的两个区域（16,18）。 然后通过相同或不同的Wollaston棱镜将由两个点反射或透过样品的光组合起来，并且由样品的任何异常引起的相移通过亮场检测器被检测为两个光束之间的相移 。 在两个点处由样品散射的光由暗场检测器检测。 使用半波片（36）来定向来自入射在渥拉斯顿棱镜上的激光的光的偏振平面，使得入射到样品上的两个光束（52,54）中的一个具有比另一个更强的强度，因此 暗场的灵敏度和检测操作不会因样品上存在两个发光斑点而改变。 可以使用与入射光束和反射或透射光束成适当角度的透明电介质来增强亮场检测。

公开(公告)号：WO1997012226A1

公开(公告)日：1997-04-03

申请号：PCT/US1996015354

申请日：1996-09-25

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GROSS, Kenneth, P. ,  ALTENDORFER, Hubert ,  KREN, George

IPC: G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: A light beam is directed towards a surface (12) along a direction normal to the surface (12). There is a scanning means (114, 116, 118) which causes the surface (12) to move so that the beam scans the surface (12) along a spiral path. Light scattered by the surface (12) within a first range of angles is collected by a first collection means (32, 34) and directed to a first detector (42), and light scattered within a second range is collected by a second collection means (38) and is directed to a second detector (44). The two ranges of collection angles are different, so that the first detector (42) is optimized to detect scattering from large particles, and the second detector (44) is optimized to detect light from small particles and defects.

Abstract translation: 光束沿着垂直于表面（12）的方向指向表面（12）。 存在使得表面（12）移动的扫描装置（114,116,118），使得光束沿着螺旋路径扫描表面（12）。 由第一收集装置（32,34）收集由表面（12）在第一角度范围内散射的光并被引导到第一检测器（42），并且在第二范围内散射的光由第二收集装置 （38）并且被引导到第二检测器（44）。 收集角度的两个范围是不同的，使得第一检测器（42）被优化以检测来自大颗粒的散射，并且第二检测器（44）被优化以检测来自小颗粒和缺陷的光。

公开(公告)号：WO1996014566A1

公开(公告)日：1996-05-17

申请号：PCT/US1995014223

申请日：1995-11-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GROSS, Kenneth, P.

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: An apparatus and method for inspecting a substrate (14), such as a semiconductor wafer, includes crossed cylindrical optical elements (44) that form an elliptical beam (40) that is caused to scan in parallel fashion at an oblique angle to the substrate (14). Preferably, the smaller dimension of the elliptical beam (40) is perpendicular to the direction of the scan of the beam across the wafer. A reflector (38) converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan.

Abstract translation: 用于检查诸如半导体晶片的基板（14）的装置和方法包括形成椭圆光束（40）的交叉圆柱形光学元件（44），所述椭圆光束（40）以与倾斜角度平行的方式扫描到基板 14）。 优选地，椭圆形光束（40）的较小尺寸垂直于横跨晶片的光束的扫描方向。 反射器（38）将角度变化的光束转换成远心扫描光束，并且仅在与远心扫描平行的方向上提供聚焦。

公开(公告)号：WO1993023734A1

公开(公告)日：1993-11-25

申请号：PCT/US1993004153

申请日：1993-05-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GALBRAITH, Lee, K. ,  VAUGHT, John, L. ,  WOLF, Ralph, C. ,  LESLIE, Brian ,  NEUKERMANS, Armand, P.

IPC: G01N21/00

CPC classification number: G02F1/134309 ,  G01N21/95623 ,  G01N2201/067 ,  G02B27/46

Abstract: An inspection apparatus for a light diffracting surface (w) employs a planar array of individually addressable light valves (69; 82; 84) for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having stripe geometry (91; 93; 95) corresponding to positions of members (81; 83; 85) of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light (13; 31) directed onto the surface (w), such as a semiconductor wafer, forms elongated curved diffraction orders (65) from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens (35a; 35b). The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects, is allowed to pass through the light valves to a detector (47).