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    42.
    发明专利
    未知

    公开(公告)号：DE3817009A1

    公开(公告)日：1989-11-30

    申请号：DE3817009

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST DIPL ING ,  BOETTCHER ANDREAS DR

    IPC: G03F7/004 ,  G03F7/039

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. The radiation-sensitive mixture contains (a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, the polymeric binder (a) containing 5 to 35 mol% of copolymerised or co-condensed monomer units having acid-sensitive groupings, or the acid-sensitive groupings having been introduced by a polymer-analogous reaction. It is suitable for the formation of relief patterns.

    44.
    发明专利
    未知

    公开(公告)号：DE3889977D1

    公开(公告)日：1994-07-14

    申请号：DE3889977

    申请日：1988-06-24

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

    45.
    发明专利
    未知

    公开(公告)号：DE58906521D1

    公开(公告)日：1994-02-10

    申请号：DE58906521

    申请日：1989-05-10

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

    46.
    发明专利
    未知

    公开(公告)号：DE58904789D1

    公开(公告)日：1993-07-29

    申请号：DE58904789

    申请日：1989-10-21

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  BOETTCHER ANDREAS DR ,  PFOEHLER PETER DR ,  AYDIN ORAL DR ,  NESTLER GERHARD DR

    IPC: C08J5/18 ,  C08F220/18 ,  C08L23/00 ,  C08L33/04 ,  C08L33/06 ,  C09J133/06

    Abstract: Compositions which can be crosslinked under an atmospheric oxygen atmosphere by means of ultraviolet irradiation and are based on (meth)acrylate copolymers having a K value of from 10 to 100, obtained by free-radical polymerisation in solid phase or solution of a) 5 to 97.4% by weight of i-amyl acrylate and/or i-amyl methacrylate and b) 0 to 89.9% by weight of (meth)acrylates whose hompolymers have a glass transition temperature of below -30 DEG C, c) 2.5 to 30% by weight of alpha , beta -monoolefinically unsaturated compounds whose homopolymers have a glass transition temperature of above - 30 DEG C, d) 0 to 10% by weight of monoolefinically unsaturated acids and/or anhydrides thereof, e) 0 to 20% by weight of further olefinically unsaturated monomers containing at least one of the following functional groups: hydroxyl, amide, epoxide, ether, ester, urethane, urea, primary, secondary or tertiary amine and ether, and f) 0.1 to 5% by weight of a copolymerisable benzophenone or acetophenone derivative, the sum of the percentages by weight x = a + b + c + d + f in each case being 100.

    47.
    发明专利
    未知

    公开(公告)号：DE3876855D1

    公开(公告)日：1993-02-04

    申请号：DE3876855

    申请日：1988-05-13

    Applicant: BASF AG

    Inventor： BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  ALDAG REINHARD DR ,  BLUEMEL THOMAS DR

    IPC: G03C1/00 ,  G03F7/031

    Abstract: Photopolymerisable recording material with at least one photopolymerisable, olefinically unsaturated organic cpd. (I), opt. a polymeric binder (II), at least one photopolymerisation initiator (III), a colour forming system (IV) which on irradiation with actinic radiation causes an increase in the colour intensity of the recording material, a sensitizer (V) and opt. further additives and/or assistants, the (IV) comprising (a) least one colourless or practically colourless organic cpd. which is oxidisable to a coloured cpd., and (b) a photooxidation agent for (a) comprising an organic salt with an opt. substd. heteroaromatic system including at least one grouping of formula (A) in which R = opt. substd. alkenyl, alkynyl, hetaryl, alkenylcarbonyl, alkynylcarbonyl, alkoxycarbonyl, carbamoyl, alkylsulphonyl, arylsulphonylaminosulphinyl, substd. cycloalkyl or opt. substd. hetaryl cation, with the proviso that the long wave absorption max. of the salt is below 400 nm.

    48.
    发明专利
    未知

    公开(公告)号：DE4105355A1

    公开(公告)日：1992-08-27

    申请号：DE4105355

    申请日：1991-02-21

    Applicant: BASF AG

    Inventor： BOETTCHER ANDREAS DR ,  SCHWARTZ MANFRED DR

    IPC: C07C69/96 ,  C08F2/50 ,  C08G65/329 ,  C08G65/332 ,  C09K23/00 ,  C09K23/42 ,  G03F7/031

    Abstract: The invention relates to compounds containing carbonate groups and carbonyl groups and having the general formula (* CHEMICAL STRUCTURE *) in which R stands for a C1-C4-alkyl radical, an aryl radical, or a radical R1, where R1 has the following formula (* CHEMICAL STRUCTURE *) in which R2 to R6 stand for H, alkyl, OH, O-alkyl, SH, S-alkyl, halogen, N(alkyl)2, or N(alkyl)(aryl) and at least one but not more than three of the radicals R2 to R6 stand for a radical of the formula (* CHEMICAL STRUCTURE *) in which A, B and C stand for alkylene, cycloalkylene, oxaalkylene, polyoxaalkylene or arylene, k and l both stand for an integer from 1 to 80, and the end group Z stands for alkyl, aryl, alkoxycarbonyl, alkoxycarbonyloxy, or aryl. These compounds are suitable for use as emulsifiers for dispersions.

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