High purity aqueous hydrogen peroxide solution useful for electronic component substrate cleaning

    公开(公告)号:DE19817794A1

    公开(公告)日:1999-10-28

    申请号:DE19817794

    申请日:1998-04-21

    Applicant: BASF AG

    Abstract: High purity aqueous hydrogen peroxide solutions, used for electronic substrate treatment and having an extremely low total organic carbon content, are new. High purity aqueous hydrogen peroxide solutions, used for treating substrates of electronic components, have a total organic carbon content of \}100 ppb. Independent claims are also included for the following: (i) production of high purity aqueous hydrogen peroxide solutions by one of the following methods performed in water and in the absence of organic compounds and their source materials: catalytic reaction of hydrogen and oxygen, electrochemical reduction of oxygen or electrolysis of acidic ammonium sulfate solutions; and (ii) high purity aqueous hydrogen peroxide solutions produced by the above process.

    PROCESS FOR THE SEPARATION OF OLIGOMERIC BY-PRODUCTS FROM AN ISOMERIZATION CATALYST

    公开(公告)号:CA2232338A1

    公开(公告)日:1997-05-01

    申请号:CA2232338

    申请日:1996-10-17

    Applicant: BASF AG

    Inventor: FISCHER MARTIN

    Abstract: Described is a method of separating a catalyst from a mixture of the catalyst with oligomers of vinyl oxirane such as is produced in the isomerization of vinyl oxirane to 2,5-dihydrofuran and from which practically all the lowboiling constituents have been distilled off. The mixture of oligomers and catalyst, consisting essentially of: a) an onium iodide, b) a Lewis acid selected from the group consisting of the chloride, bromide and iodide of cobalt, bismuth, tin and zinc and optionally and c) a donor ligand is intensively mixed (1) with a hydrocarbon or chlorohydrocarbon having 5 to 14 carbon atoms; (2) of the two phases formed, the phase containing the catalyst is separated off; and (3) the catalyst is recovered by distilling off the solvent.

    49.
    发明专利
    未知

    公开(公告)号:ES2098120T3

    公开(公告)日:1997-04-16

    申请号:ES94901917

    申请日:1993-11-30

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03352 Sec. 371 Date Mar. 17, 1995 Sec. 102(e) Date Mar. 17, 1995 PCT Filed Nov. 30, 1993 PCT Pub. No. WO94/13653 PCT Pub. Date Jun. 23, 19943,4-Epoxy-1-butene is prepared by the gas phase epoxidation of 1,3-butadiene by means of oxygen or oxygen-containing gases over silver-containing catalysts and isolation of the 3,4-epoxy-1-butene from the reaction exit mixture by performing the gas phase epoxidation in the presence of from 6 to 80 mol % of water vapor, based on the gas mixture supplied to the reactor.

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