公开(公告)号：WO2012099635A2

公开(公告)日：2012-07-26

申请号：PCT/US2011/057805

申请日：2011-10-26

Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  BRANTON, Daniel ,  HAN, Anpan ,  GOLOVCHENKO, Jene, A.

Inventor： BRANTON, Daniel ,  HAN, Anpan ,  GOLOVCHENKO, Jene, A.

IPC: H01L21/027

CPC classification number: G03F7/2059 ,  B81C1/00531 ,  B81C2201/0143 ,  B81C2201/0159 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/2251 ,  H01J37/3174 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/2002 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31796 ,  H01L21/0331 ,  H01L22/12 ,  H01L51/0014 ,  H01L51/0048

Abstract: In a method for imaging a solid state substrate, a vapor is condensed to an amorphous solid water condensate layer on a surface of a solid state substrate. Then an image of at least a portion of the substrate surface is produced by scanning an electron beam along the substrate surface through the water condensate layer. The water condensate layer integrity is maintained during electron beam scanning to prevent electron-beam contamination from reaching the substrate during electron beam scanning. Then one or more regions of the layer can be locally removed by directing an electron beam at the regions. A material layer can be deposited on top of the water condensate layer and any substrate surface exposed at the one or more regions, and the water condensate layer and regions of the material layer on top of the layer can be removed, leaving a patterned material layer on the substrate.

Abstract translation: 在固态基板成像方法中，将蒸气冷凝成固态基板表面的无定形固体水凝结物层。 然后通过沿着衬底表面扫描电子束通过水凝结层产生衬底表面的至少一部分的图像。 在电子束扫描期间维持水凝结层的完整性，以防止电子束扫描期间电子束污染到达衬底。 然后可以通过在该区域处引导电子束来局部地去除该层的一个或多个区域。 材料层可以沉积在水冷凝物层的顶部和在一个或多个区域暴露的任何基底表面，并且水凝结物层和该层顶部上的材料层的区域可以被去除，留下图案化的材料层 在基板上。

公开(公告)号：WO2005098895A9

公开(公告)日：2006-03-16

申请号：PCT/US2005011018

申请日：2005-04-01

Applicant: CALIFORNIA INST OF TECHN ,  ZEWAIL AHMED ,  LOBASTOV VLADIMIR

Inventor： ZEWAIL AHMED ,  LOBASTOV VLADIMIR

IPC: H01J37/073 ,  H01J37/26

CPC classification number: H01J37/26 ,  H01J37/065 ,  H01J37/073 ,  H01J37/24 ,  H01J37/243 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/06341 ,  H01J2237/206 ,  H01J2237/2065 ,  H01J2237/24585 ,  H01J2237/2482 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/2813 ,  H01J2237/2855

Abstract: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

Abstract translation: 用于表征一个或多个样品的超快速系统（和方法）。 该系统包括具有要表征的样品的载物台组件。 该系统具有能够发射持续时间小于1ps的光脉冲的激光源。 该系统具有耦合到激光源的阴极。 在具体实施例中，阴极能够发射持续时间小于1ps的电子脉冲。 该系统具有适于将电子脉冲聚焦到设置在载物台上的样品上的电子透镜组件。 该系统具有适于捕获穿过样品的一个或多个电子的检测器。 通过样品的一个或多个电子代表样品的结构。 检测器提供与通过样品的一个或多个电子相关联的信号（例如，数据信号），其表示样品的结构。 该系统具有耦合到检测器的处理器。 处理器适于处理与通过样本的一个或多个电子相关联的数据信号，以输出与样本的结构相关联的信息。 该系统具有耦合到处理器的输出设备。 输出设备适于输出与样本结构相关联的信息。

公开(公告)号：US20240297015A1

公开(公告)日：2024-09-05

申请号：US18178156

申请日：2023-03-03

Applicant: FEI Company

Inventor： Ludek Cervinka ,  Jaroslav Starek ,  Tomas Onderlicka ,  Lukas Hubner

IPC: H01J37/30 ,  G01N33/483 ,  H01J37/305

CPC classification number: H01J37/3005 ,  G01N33/4833 ,  H01J37/305 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: A method of preparing a sample for transmission electron microscopy (TEM) analysis is provided. The method comprises cleaning the sample to remove a redeposition layer, imaging the cleaned sample and identifying a location of a region of interest within the sample, and removing material from the sample, based on the identified location of the region of interest within the sample. Advantageously, the sample thinning step is performed based on a detected location of a region of interest. This thinning step involves removal of uneven surfaces (the “lamella roof”) and thinning the remaining bulk substrate to remove redundant material, so that the silicon substrate volume between the surface of the sample and the region of interest has a defined thickness.

公开(公告)号：US20230162945A1

公开(公告)日：2023-05-25

申请号：US17989550

申请日：2022-11-17

Applicant: FEI Company

Inventor： Jaroslav Velcovský ,  Jirí Kutálek ,  Radek Smolka ,  Jirí Vítecek ,  Bronislav Pribyl ,  Dávid Pacura

IPC: H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147 ,  H01J37/30 ,  B23K26/38

CPC classification number: H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/1471 ,  H01J37/3005 ,  B23K26/38 ,  H01J2237/31749 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/1506 ,  H01J2237/2803

Abstract: The invention relates to method of milling and imaging a sample. The method comprises the step of providing an imaging system, as well as a milling beam source. The method comprises the steps of milling, using a milling beam from said milling beam source, a sample to remove a layer of the sample; and imaging, using said imaging system, an exposed surface of the sample. As defined herein, the method further comprises the step of determining a relative position of said sample, and using said determined relative position of said sample in said milling step for positioning said sample relative to said milling beam. The relative position of said sample can be a working distance with respect to the imaging system, which can be determined by means of an autofocus procedure.

公开(公告)号：US20180337019A1

公开(公告)日：2018-11-22

申请号：US15824047

申请日：2017-11-28

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/28 ,  G01N23/20058 ,  G01N2223/0565 ,  G01N2223/102 ,  G01N2223/3302 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: There is provided a scanning transmission electron microscope capable of producing plural types of STEM (scanning transmission electron microscopy) images using a single detector. The electron microscope (100) has an electron source (10) emitting an electron beam, a scanning deflector (13) for scanning the beam over a sample (S), an objective lens (14) for focusing the beam, an imager (22) placed at a back focal plane of the objective lens (14) or at a plane conjugate with the back focal plane, and a scanned image generator (40) for generating scanned images on the basis of images captured by the imager. The scanned image generator (40) operates to form electron diffraction patterns from the electron beam passing through positions on the sample by the scanning of the electron beam, to capture the electron diffraction patterns by the imager so that plural images are produced, to integrate the intensity of each pixel over an integration region that is set based on the size of an image of a transmitted wave in a respective one of the produced images for each of the produced images such that the signal intensity at each position on the sample is found, and to generate the scanned images on the basis of the signal intensities at the positions on the sample.

公开(公告)号：US09978558B2

公开(公告)日：2018-05-22

申请号：US14377127

申请日：2013-02-20

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kumiko Shimizu ,  Hajime Kawano

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/26 ,  G01B7/02

CPC classification number: H01J37/222 ,  G01B7/02 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2803

Abstract: The image processing device has: a scanning direction decision unit which divides an captured image into a plurality of scanning regions and deciding a scanning direction of each scanning region based on a pattern edge captured in each scanning region in the captured image, a scanning order decision unit which performs a raster scan per pixel constituting each scanning region such that the scanning direction of each of the decided scanning region is directed to a horizontal direction of the raster scan, and a scanning image acquisition unit which acquires a scanning image by capturing each scanning region by the scanning-electron-microscope based on the decided scanning order.

公开(公告)号：US20170047197A1

公开(公告)日：2017-02-16

申请号：US15305740

申请日：2015-04-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shoji HOTTA ,  Hiroki KAWADA ,  Osamu INOUE

IPC: H01J37/28 ,  G03F9/00

CPC classification number: H01J37/28 ,  G01B15/04 ,  G03F7/70633 ,  G03F9/7061 ,  H01J37/22 ,  H01J2237/2803

Abstract: For scanning electron beams and measuring overlay misalignment between an upper layer pattern and a lower layer pattern with high precision, electron beams are scanned over a region including a first pattern and a second pattern of a sample, the sample having the lower layer pattern (the first pattern) and the upper layer pattern (the second pattern) formed in a step after a step of forming the first pattern. The electron beams are scanned such that scan directions and scan sequences of the electron beams become axial symmetrical or point-symmetrical in a plurality of pattern position measurement regions defined within the scan region for the electron beams, thereby reducing measurement errors resulting from the asymmetry of electric charge.

Abstract translation: 对于扫描电子束和以高精度测量上层图案和下层图案之间的重叠不对准，在包括样品的第一图案和第二图案的区域上扫描电子束，具有较低层图案的样品（ 第一图案）和在形成第一图案的步骤之后的步骤中形成的上层图案（第二图案）。 扫描电子束，使得电子束的扫描方向和扫描顺序在限定在电子束的扫描区域内的多个图形位置测量区域中成为轴对称或点对称，从而减少由于不对称而导致的测量误差 电荷。

公开(公告)号：US09519006B2

公开(公告)日：2016-12-13

申请号：US14007824

申请日：2011-03-29

Applicant: Taek Dong Chung ,  Beom Jin Kim

Inventor： Taek Dong Chung ,  Beom Jin Kim

IPC: G01Q70/16 ,  G01Q60/60 ,  G01N21/65 ,  G01Q30/02 ,  B82Y15/00 ,  B82Y35/00

CPC classification number: G01Q70/16 ,  B82Y15/00 ,  B82Y35/00 ,  G01N21/658 ,  G01Q30/02 ,  G01Q60/60 ,  H01J2237/2803

Abstract: The present disclosure relates to a probe capable of electrochemical and Raman spectroscopic monitoring wherein a Raman-active gold microshell having conductivity is attached to the tip of a glass microcapillary tube in which a conductive material is coated on an inner wall thereof by electroless plating. By coupling the probe with a system capable of moving the probe, the activities of various catalyst materials can be detected quickly and information of intermediate products moving from and adsorbed on the surface can be provided.

Abstract translation: 本公开内容涉及能够进行电化学和拉曼光谱监测的探针，其中具有导电性的拉曼活性金微壳附着到玻璃微毛细管的末端，其中导电材料通过无电镀覆盖在其内壁上。 通过将探针与能够移动探针的系统结合，可以快速检测各种催化剂材料的活性，并且可以提供从表面移动并吸附在表面上的中间产物的信息。

公开(公告)号：US09245712B2

公开(公告)日：2016-01-26

申请号：US14221514

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/08

CPC classification number: H01J37/28 ,  H01J37/08 ,  H01J37/222 ,  H01J2237/0807 ,  H01J2237/221 ,  H01J2237/2803 ,  H01J2237/31749

Abstract: A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image.

Abstract translation: 聚焦离子束系统包括产生气体离子的气体离子源，加速气体离子并将气体离子作为离子束辐射的离子枪单元，包括至少聚焦透镜电极的射束光学系统， 离子束到样品，以及图像获取机构，其基于离子束获取发射器的尖端的FIM图像。 图像获取机构包括配置在离子枪单元和聚焦透镜电极之间并调整离子束的辐射方向的取向电极，向对准电极施加取向电压的取向控制单元和图像处理单元 其组合当应用不同对准电压时获得的多个FIM图像以生成一个复合FIM图像。

公开(公告)号：US20150060665A1

公开(公告)日：2015-03-05

申请号：US14512672

申请日：2014-10-13

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J37/02 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。