Abstract:
One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The electron further includes a non-planar extractor with an extractor opening and a built-in beam-limiting aperture. The extractor opening is larger than the beam-limiting aperture, and central axes of both the extractor opening and the beam-limiting aperture are aligned with the tip along a beam axis. Another embodiment relates to a method of generating an electron beam using an electron source having a non-planar extractor. Another embodiment relates to an array of electron sources for generating an array of electron beams. The array of electron sources includes an array of electron emitters and an array of non-planar extractor structures. Other embodiments, aspects and features are also disclosed.
Abstract:
A gun with a cold cathode is disclosed in the present invention. A cold cathode made of a material for a cold cathode is held on a base, a mesh gate is right over the cold cathode, a focusing electrode in a circular hole-shape is right over the mesh gate, and the above-described electrodes are insulated with each other and held on the base. A mesh shielding electrode may be also provided right over the focusing electrode and is fixed on the base by a support for the shielding electrode. Depending on circumstances, the shielding electrode is required in a smaller device such as a pixel tube, but is not required in the applicattion of a cold lamp. The gun with a cold cathode according to the present invention is simple in structure, excellent in performance, and mainly used for a electron source, a electrical lamp with a cold cathode, and a pixel tube, it may be also used for other circumstances having the require similar to that.
Abstract:
A cold-cathode electron source having an improved utilization efficiency of an electron beam and a simple structure. The cold-cathode electron source comprises a gate electrode (4) provided on a substrate (2) through an insulating layer (3) and an emitter (6) extending through the insulating layer (3) and the gate electrode (4) and disposed in an opening of the gate. During the emission of electrons from the emitter (6), the following relationships are satisfied: 10 [V/µm] ≥ (Va-Vg)/(Ha-Hg) ≥ Vg/Hg; and Vg/Hg [V/µm] ≥ Va × 10 -4 × (9.7-1.3 × 1n (Hg)) x (1000/Ha) 0.5 , where Ha [µm] is an anode-emitter distance, Va [V] is an anode-emitter voltage, Hg [µm] is a gate-emitter distance, and Vg [V] is a gate-emitter voltage.
Abstract translation:具有提高电子束的利用效率和简单结构的冷阴极电子源。 冷阴极电子源包括通过绝缘层(3)设置在基板(2)上的栅极(4)和延伸穿过绝缘层(3)和栅电极(4)的发射极(6) 在门口的开口。 在从发射体(6)发射电子时,满足以下关系:10ÄV/μmÜ≥(Va-Vg)/(Ha-Hg)≥Vg/ Hg; 和Vg / HgÄV/ mu m≥Va x 10 -4(x)(9.7-1.3 x 1n(Hg))x(1000 / Ha)<0.5>,其中HaÄmumÜ是阳极 - 发射极距离,Va ÄVÜ是一个阳极 - 发射极电压,HgÜ是一个栅 - 发射极距离,VgÄVÜ是一个栅 - 发射极电压。
Abstract:
A virtual remote cathode has the position of a space charge cloud associated with it fixed by the geometry of a fixed insulating plate (902). The plate (902) can be made to accurate dimensions and hence the virtual remote cathode to control grid (502) distance can be accurately controlled and will not change as a result of any mechanical, electrical or physical changes in the construction. The fixed insulating plate (902) is located on a surface of the control grid (502) facing the cathode (510).
Abstract:
A virtual remote cathode has the position of a space charge cloud associated with it fixed by the geometry of a fixed insulating plate (902). The plate (902) can be made to accurate dimensions and hence the virtual remote cathode to control grid (502) distance can be accurately controlled and will not change as a result of any mechanical, electrical or physical changes in the construction. The fixed insulating plate (902) is located on a surface of the control grid (502) facing the cathode (510).
Abstract:
The invention relates to a gun lens (1) for generating a particle beam with a cathode (2), an extraction electrode (3), an anode (4) and a condenser lens (5), wherein a deceleration field is generated between the extraction electrode and the anode and the condenser lens produces a magnetic field which is superimposed on both the cathode, the extraction electrode and the anode.
Abstract:
Système permettant de maîtriser la forme d'un faisceau de particules chargées. Le faisceau de particules est issu d'une source (58) de ces particules. Cette source est associée à une électrode collectrice qui collecte les particules. Le système comprend au moins une zone résistive (56) et au moins deux électrodes de commande (52, 54), cette zone résistive et ces électrodes de commande étant disposées sensiblement au même niveau que la source, ces électrodes de commande étant en outre placées de part et d'autre de la zone résistive et prévues pour polarier celle-ci, le profil de résistance électrique de la zone résistive étant choisi de façon à avoir la répartition de potentiel permettant d'obtenir la forme voulue du faisceau issu de la source lorsque les électrodes de commande sont convenablement polarisées. Application à la focalisation d'un faisceau de particules chargées.
Abstract:
PURPOSE: Electron gun, cathode ray tube and image display device are provided to improve the focus characteristics of a cathode ray tube by reducing the working area of the cathode. CONSTITUTION: An electron gun is comprised of a cathode(K) that has an electron emission surface(21) and a first grid(11) that has a beam hole(11A). The electron emission surface(21) and the beam hole(11A) are arranged opposite to each other and the area opposite the beam hole(11A) within the electron emission surface(21) is in closest proximity to the first grid(11).
Abstract:
PURPOSE: A tetrode electron gun for electronic beam column is provided to adjust both variable high brightness and illumination uniformity in the profile of the electron beam by adding the fourth electrostatic focusing electrode located between the cathode and the anode within the electron gun. CONSTITUTION: An electron beam column comprises an electron source including a cathode(2), an electrode disposed coaxially to electrons emitted from the cathode, an anode(8) disposed coaxially to the electrons influenced by the electrode, an electrostatic focusing electrode(18) disposed between the electrode and the anode; an aperture located so that an electron beam from the source is incident thereon; and a plurality of electron beam lenses(20), each co-axial to the electron beam and located to focus the beam after passing through the aperture.
Abstract:
전자빔의 이용효율을 향상시킬 수 있고, 간단한 구조에 의해 실현할 수 있는 냉음극 전자원을 제공한다. 본 발명의 냉음극 전자원은, 기판(2)상에 절연층(3)을 통해 형성된 게이트전극(4)과, 이 절연층(3) 및 게이트전극(4)을 관통하여 제공된 게이트 개구부에 제공된 에미터(6)를 구비하고, 상기 에미터(6)로부터의 전자방출시에는, 애노드-에미터간 거리를 Ha [μm], 애노드-에미터간 전압을 Va [V], 게이트-에미터간 거리를 Hg [μm], 게이트-에미터간 전압을 Vg [V]로 한 경우, 10 [V/μm] ≥ (Va - Vg) / (Ha - Hg) ≥ Vg/Hg를 만족하고, 또한, Vg/Hg [V/μm] ≥ Va × 10 -4 × (9.7 - 1.3 × ln(Hg)) × (1000/Ha) 0.5 를 만족한다.
Abstract translation:具有提高的电子束利用效率和简单结构的冷阴极电子源。 冷阴极电子源包括通过绝缘层(3)和延伸穿过绝缘层(3)和栅电极(4)的发射极(6)设置在基板(2)上的栅电极(4) 在大门的开口处。 在从发射器(6)发射电子的过程中,满足以下关系:10&amp; Auml; V / mu m&Uuml; &安培; GE; (Va-Vg)/(Ha-Hg)&amp; Ge; VG /汞柱; 和Vg / Hg&Auml; V / mu&Uuml; &安培; GE; Va×10 -4。 x(9.7-1.3×1n(Hg))×(1000 / Ha)0.5,其中Ha&Auml; mu m&Uuml; 是阳极 - 发射器距离,Va&Auml; V&Uuml; 是阳极 - 发射极电压,Hg&Auml; mu m&Uuml; 是门极 - 发射极间距,Vg&Auml; V&Uuml; 是门极 - 发射极电压。 &lt;图像&GT;