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公开(公告)号:JP2009076474A
公开(公告)日:2009-04-09
申请号:JP2008331587
申请日:2008-12-25
Applicant: Toudai Tlo Ltd , 株式会社東京大学Tlo
Inventor: OKUMURA KATSUYA , MIYOSHI MOTOSUKE
IPC: H01J37/12 , G21K1/08 , H01J3/14 , H01J3/26 , H01J37/147 , H01J37/153 , H01J37/16
CPC classification number: H01J37/12 , H01J37/147 , H01J37/153 , H01J2237/1215
Abstract: PROBLEM TO BE SOLVED: To provide an electron-optical lens barrel suitable for miniaturization, and its manufacturing method.
SOLUTION: The electron-optical lens barrel is provided with a barrel body 1 and an electrostatic lens 2 arranged on an inner surface of the barrel body 1. The inner face of the barrel body 1 is to be of high-resistance conductivity, and that 1 includes an inner tube 11 and an outer tube 12, the inner tube 11 arranged inside the outer tube 12.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题:提供适合于小型化的电子 - 光学透镜镜筒及其制造方法。 解决方案:电子 - 光学透镜镜筒设置有设置在筒体1的内表面上的筒体1和静电透镜2.筒体1的内表面具有高电阻导电性 1,内管11和外管12,内管11配置在外管12的内侧。(C)2009,JPO&INPIT
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公开(公告)号:JP2008300358A
公开(公告)日:2008-12-11
申请号:JP2008181754
申请日:2008-07-11
Applicant: Applied Materials Israel Ltd , アプライド マテリアルズ イスラエル リミテッド
Inventor: SHEMESH DROR , DUBI SHACHAL
IPC: H01J37/21 , A61N5/00 , G01N21/00 , G21G5/00 , H01J3/26 , H01J37/08 , H01J37/153 , H01J37/22 , H01J37/26
CPC classification number: H01J37/1471 , H01J37/153 , H01J37/22 , H01J37/263 , H01J37/265 , H01J37/304 , H01J2237/045 , H01J2237/1501 , H01J2237/1532 , H01J2237/216 , H01J2237/221
Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for rapid adjustment of a focal distance of a charged particle beam. SOLUTION: The system and the method for rapidly changing a focal distance of a charged particle beam are provided. The method is provided with a step for changing a control signal in accordance with a relation with the focal distance of the charged particle beam and a control signal voltage value. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题:提供一种用于快速调节带电粒子束的焦距的系统和方法。 解决方案:提供用于快速改变带电粒子束的焦距的系统和方法。 该方法具有根据与带电粒子束的焦距和控制信号电压值的关系来改变控制信号的步骤。 版权所有(C)2009,JPO&INPIT
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公开(公告)号:JP2005505896A
公开(公告)日:2005-02-24
申请号:JP2003534949
申请日:2002-10-09
Applicant: アプライド マテリアルズ イスラエル リミテッド
Inventor: ドロール シェメシュ, , ドゥビ シャチャル,
CPC classification number: H01J37/21 , H01J37/153 , H01J37/22 , H01J37/241 , H01J37/265 , H01J37/28 , H01J2237/1501
Abstract: 荷電粒子ビームの焦点距離を急速に変更する装置および方法であって、上記方法は、荷電粒子ビームの焦点距離と制御信号電圧値との関係に応答して、制御信号を変更するステップを備える。
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公开(公告)号:JPH02718U
公开(公告)日:1990-01-05
申请号:JP5017389
申请日:1989-04-27
IPC: G01R31/302 , H01J3/26 , H01J37/04 , H01J37/09 , H01J37/153 , H01L21/027 , H01L21/30 , H01L21/66
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公开(公告)号:JPS6245663B2
公开(公告)日:1987-09-28
申请号:JP5675881
申请日:1981-04-15
Applicant: RIKAGAKU KENKYUSHO
Inventor: GOTO HIDEKAZU , SOMA TAKASHI , IDESAWA MASANORI
IPC: H01J3/26 , H01J29/74 , H01J37/147
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公开(公告)号:JPS57172642A
公开(公告)日:1982-10-23
申请号:JP5675881
申请日:1981-04-15
Applicant: RIKAGAKU KENKYUSHO
Inventor: GOTOU HIDEKAZU , SOUMA TAKASHI , IDESAWA MASANORI
IPC: H01J3/26 , H01J29/74 , H01J37/147
Abstract: PURPOSE:To remove the Fourier components of high orders, and enable beams of a wider range to be deflected by designating, from among the electrode elements placed on a circumference, 10 elements located at specified center angles and 10 elements located in the reverse positions to the said 10 elements as X-direction deflecting electrodes, and designating elements each located at a position having a given relative phase to each of the said 20 elements as Y-direction deflecting electrodes. CONSTITUTION:Among 60 electrode elements D1-D60 placed on a circumference at equal distance intervals, 10 electrode elements D2, D60-D10,D52 located at center angles of 12 deg., 24 deg., 60 deg., 96 deg. and 108 deg., and 10 electrode elements D32, D30- D40 D22 located in the reverse positions to the above 10 elements D2, D60-D10, D52 are designated as deflecting electrodes of X-direction. 20 Electrode elements each located at a position having 90 deg. differed phase from each of the above 20 electrode elements are designated as deflecting electrodes of Y-direction, and the remaining 20 electrode elements are designated as earthing electrodes. Then, +Vx-Vx and +Vy-Vy are applied to the X and Y electrodes, respectively. As a result, the Fourier components of third order and fifth order aberrations can be removed, and beams of a wider range can be deflected.
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公开(公告)号:DE60237952D1
公开(公告)日:2010-11-25
申请号:DE60237952
申请日:2002-07-29
Applicant: APPLIED MATERIALS ISRAEL LTD
Inventor: SHEMESH DROR
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公开(公告)号:GB2429834A
公开(公告)日:2007-03-07
申请号:GB0517859
申请日:2005-09-02
Applicant: NANOBEAM LTD
Inventor: ZHANG TAO
IPC: H01J37/141 , H01F5/02 , H01F7/20 , H01J3/22 , H01J3/26 , H01J37/147
Abstract: A coil former (1) comprising a plurality of ceramic plates (2) arranged to form a laminate (3) between first and second ends (4, 5), each plate having an opening therein such that when the plates are arranged in the laminate, a passage (7) is defined between the first and second ends. The coil former can be used in apparatus such as electron microscopes, electron lithography devices and ion implantation devices.
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