公开(公告)号：DE60125105D1

公开(公告)日：2007-01-25

申请号：DE60125105

申请日：2001-07-06

Applicant: ASML NETHERLANDS BV

Inventor： BENSCHOP JOZEF PETRUS HENRICUS ,  NOORDMAN OSCAR FRANSISCUS JOZE ,  RENKENS MICHAEL JOZEFA MATHIJS ,  LOOPSTRA ERIK ROELOF ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  VAN DIJSSELDONK ANTONIUS JOHAN

IPC: G01B21/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.

公开(公告)号：SG126096A1

公开(公告)日：2006-10-30

申请号：SG200601841

申请日：2006-03-21

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SJMAENOK LEONID AIZIKOVITCH ,  SALASHCHENKO NIKOLAY NIKOLAEVI

Abstract: A multi-layered spectral purity filters improves the spectral purity of an Extreme UltraViolet (EUV) radiation beam and also collect debris emitted from a radiation source.

公开(公告)号：DE60118669D1

公开(公告)日：2006-05-24

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.