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    Process and system for fabrication of patterns on a surface
    51.
    发明公开
    Process and system for fabrication of patterns on a surface 审中-公开
    Verfahren und System zur Herstellung von Strukturen auf einerOberfläche

    公开(公告)号：EP2144117A1

    公开(公告)日：2010-01-13

    申请号：EP08104722.7

    申请日：2008-07-11

    Applicant: The Provost, Fellows and Scholars of the College of the Holy and Undivided Trinity of Queen Elizabeth near Dublin

    Inventor： Cross, Graham L. W. ,  Pethica, John B. ,  McKenzie, Warren

    IPC: G03F7/11 ,  G03F7/00 ,  B81C1/00 ,  H01L21/033

    CPC classification number: G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

    Abstract: The invention provides a system and process of patterning structures on a surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to an oxygen plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

    Abstract translation: 本发明提供了一种在表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料性质被修改以在表面上提供掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 本发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面去除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，使得暴露的区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于氧等离子体蚀刻之后产生这种图案。 本发明特别适合于直到纳米级尺寸的清晰明确定义的结构的图案化。

    METHOD OF FORMING GRAFT PATTERN, GRAFT PATTERN MATERIAL, METHOD OF LITHOGRAPHY, METHOD OF FORMING CONDUCTIVE PATTERN, CONDUCTIVE PATTERN, PROCESS FOR PRODUCING COLOR FILTER, COLOR FILTER AND PROCESS FOR PRODUCING MICROLENS
    52.
    发明公开
    METHOD OF FORMING GRAFT PATTERN, GRAFT PATTERN MATERIAL, METHOD OF LITHOGRAPHY, METHOD OF FORMING CONDUCTIVE PATTERN, CONDUCTIVE PATTERN, PROCESS FOR PRODUCING COLOR FILTER, COLOR FILTER AND PROCESS FOR PRODUCING MICROLENS 审中-公开
    法形成的一个PFROPFMUSTERS，PFROPFMUSTERMATERIAL，平版印刷法，一种用于生产导电结构，导电结构，用于生产彩色滤光片，彩色滤光片与用于生产微透镜

    公开(公告)号：EP1767989A1

    公开(公告)日：2007-03-28

    申请号：EP05745970.3

    申请日：2005-05-31

    Applicant: FUJIFILM CORPORATION

    Inventor： KAWAMURA, Koichi, c/o FUJIFILM corporation

    IPC: G03F7/004 ,  B82B3/00 ,  G02B3/00 ,  G02B5/20 ,  G03F7/26 ,  H01L21/027 ,  H05K3/10

    CPC classification number: B81C1/00031 ,  B81C2201/0159 ,  B81C2201/0198 ,  B82Y30/00 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/029 ,  H05K3/064

    Abstract: An object of the present invention is to provide a graft pattern-forming method giving a graft pattern allowing formation of a high-resolution pattern that has an oil- and water-repellent region in a commonly-used exposure machine, a lithography method of using the oil- and water-repellent graft pattern formed by the method as an etching stopper, and a conductive pattern-forming method, a color filter forming method, and a microlens production process by using the graft pattern formed by the graft pattern-forming method.
    The graft pattern-forming method comprises forming a graft polymer-generated region and a non-generated region thereon by bonding a compound having a photopolymerization-initiating site that initiates radical polymerization by photocleavage radical polymerization and a base material-bonding site onto a base material surface in a patterned form, and additionally, by bringing the radically polymerizable compound having an oil- and water-repellent functional group into contact therewith and exposing the entire surface to light, or alternatively, bonding the compound having a polymerization-initiating site that initiates radical polymerization by photocleavage and a base material-bonding site to the base material, bringing a radically polymerizable compound having an oil- and water-repellent functional group into contact therewith, and exposing the region in a patterned form.

    Abstract translation: 本发明的一个目的是提供一种接枝图案形成方法得到高分辨率图案确实具有在通常使用的曝光机对油和斥水区域，使用光刻法的图案接枝允许形成 通过该方法形成在蚀刻阻挡的防油和防水性接枝图案和导电图案形成方法，滤色器的形成方法，以及通过使用由接枝图案形成方法形成的接枝图案的微透镜的生产过程 ， 接枝图案形成方法包括：形成的接枝聚合物生成区域和非产生区在其上通过在基材上结合具有光聚合引发部位并通过光切割自由基聚合和基材料结合位点引发自由基聚合的化合物 表面在图案化的形状，另外，通过与使具有在防油和防水性的官能团的自由基聚合性化合物接触有与整个表面曝光，或者可替换地，粘结化合物具有聚合引发部位并创始 通过光切割自由基聚合和基体材料键合位到基体材料，使具有自由基聚合性化合物在油和防水性官能团接触到那里，并且在图案化的形状露出的区域。

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