公开(公告)号：JP2002229192A

公开(公告)日：2002-08-14

申请号：JP2001027408

申请日：2001-02-02

Applicant: JSR CORP

Inventor： EHATA SATOSHI ,  USUI NOBUSHI ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  KAJITA TORU

IPC: G03F7/004 ,  C07D333/16 ,  C08K5/45 ,  C08L101/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive acid generating agent capable of giving positive and negative radiation sensitive resin compositions having high transparency particularly to far UV typified by ArF excimer laser light (193 nm wavelength) and excellent in sensitivity, resolution, pattern shape, etc., and to provide positive and negative radiation sensitive resin compositions containing the radiation sensitive acid generating agent. SOLUTION: The radiation sensitive acid generating agent is typified, e.g. by a compound having a sulfonium cation of formula (1), (2) or (3) and C4F9SO3- as a counter anion. The positive radiation sensitive resin composition contains the radiation sensitive acid generating agent and an acid dissociable group- containing resin. The negative radiation sensitive resin composition contains the radiation sensitive acid generating agent, an alkali-soluble resin and a crosslinker.

公开(公告)号：JP2002182393A

公开(公告)日：2002-06-26

申请号：JP2001303791

申请日：2001-09-28

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, having excellent sensitivity, resolution, dry etching resistance, pattern shape, etc., and having small temperature dependence in heating after exposure. SOLUTION: The radiation sensitive resin composition contains (A) a resin comprising a copolymer of (meth)acrylic esters having an acid dissociable group- containing alicyclic structure represented by 5-t-butoxycarbonylnorbornyl (meth) acrylate and 8-t-butoxycarbonyltetracyclododecane (meth)acrylate and (meth) acrylic esters having a lactone-containing heterocyclic structure typified by compounds of formula (1) and (B) a radiation sensitive acid generating agent represented by 1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium perfluoro-n- octanesulfonate, 1-(4-n-butoxy-1-naphthyl)tetrahydrothiophenium nonafluoro-n- butanesulfonate or the like.

公开(公告)号：JP2002072484A

公开(公告)日：2002-03-12

申请号：JP2001108824

申请日：2001-04-06

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: C08K5/00 ,  C08L33/06 ,  C08L35/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation, having excellent basic properties as a resist, e.g. sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a structure of formula (1) (where R1 is H, a monovalent acid dissociable group, an alkyl having no acid dissociable group or an alkylcarbonyl having no acid dissociable group; X1 is a 1-4C linear or branched fluoroalkyl; and R2 is H, a linear or branched alkyl or a linear or branched fluoroalkyl) and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2002023371A

公开(公告)日：2002-01-23

申请号：JP2000204223

申请日：2000-07-05

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  DOUKI KATSUJI ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F20/60 ,  C08F32/08 ,  C08K5/00 ,  C08L101/06 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) a resin having at least one heterocyclic structure of formula (1) (where R1 is H, a 1-6C linear, branched or cyclic alkyl, a 1-6C linear, branched or cyclic alkoxy or a 2-7C linear, branched or cyclic alkoxycarbonyl) in a side chain and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001330959A

公开(公告)日：2001-11-30

申请号：JP2000151175

申请日：2000-05-23

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F8/12 ,  C08F20/30 ,  C08F32/00 ,  C08K5/00 ,  C08L33/14 ,  C08L45/00 ,  C08L101/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive type radiation sensitive resin composition having high transparency to radiation, excellent in resolution, sensitivity, pattern shape, etc., causing no development defect in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The positive type radiation sensitive resin composition contains (A) an alkali-insoluble or slightly alkali-soluble acid dissociable group-containing resin having a structure of formula (1) [where R1 is H, a 1-5C linear or branched alkyl or a 1-5C linear or branched alkoxyl] and/or a structure of formula (2) [where Z is a 4-20C trivalent alicyclic hydrocarbon group or its substituted derivative and X is a single bond or a 1-5C divalent organic group] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001228612A

公开(公告)日：2001-08-24

申请号：JP2000037272

申请日：2000-02-15

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  IWAZAWA HARUO ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F2/50 ,  C08F220/02 ,  C08F232/00 ,  C08K5/00 ,  C08K5/12 ,  C08L33/00 ,  C08L45/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in sensitivity, resolution, etc. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive and generating agent and (C) an adamantine derivative of formula 1 [where each R1 is H, an optionally substituted 1-20C alkyl or -CH2 COOR2 (R2 is a 1-18C alkyl)].

公开(公告)号：JP2001188347A

公开(公告)日：2001-07-10

申请号：JP2000137757

申请日：2000-05-10

Applicant: JSR CORP

Inventor： ISHII HIROYUKI ,  DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L33/14 ,  C08L45/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in shelf stability, having high transparency to radiation and excellent also in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape. SOLUTION: The radiation sensitive resin composition contains (A) an acid- dissociable group-containing resin having repeating units derived from a (meth) acrylic acid derivative having an alicyclic skeleton containing an oxygen- or nitrogen-containing polar group typified by 3-hydroxy-1-adamantyl (meth)acrylate or 3-(8'-cyanotetracyclo[4.4.0.12,5.17,10]dodecyl (meth)acrulate and repeating units derived from another (meth)acrylic acid derivative having an alicyclic skeleton typified by 2-methyl-2-adamantyl (meth)acrylate and convertible to an alkali- soluble resin when the acid-dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001147535A

公开(公告)日：2001-05-29

申请号：JP32973999

申请日：1999-11-19

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in dry etching resistance, sensitivity, resolution, etc., as a chemical amplification type resist, capable of avoiding a change of the line width of a resist pattern due to a change of the time elapsed from exposure to post-exposure heating and having superior process stability. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent. The component A is typified by a copolymer of a norbornene derivative typified by 8- hydroxytetracyclo[4.4.0.12,5.17,10]dodec-3-ene, itaconic anhydride and a (meth) acrylic acid derivative typified by a compound of formula 1.

公开(公告)号：JP2001109157A

公开(公告)日：2001-04-20

申请号：JP29129199

申请日：1999-10-13

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition having high transparency to radiation as a chemical amplification type resist, excellent in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape, causing no development defects in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or hardly alkali-soluble acid-dissociable group-containing resin typified by a resin having repeating units of the below formula 1 and (B) a radiation sensitive acid generating agent. The resin A is made alkali-soluble when the acid-dissociable group is dissociated.

公开(公告)号：JPH11228637A

公开(公告)日：1999-08-24

申请号：JP5269398

申请日：1998-02-19

Applicant: JSR CORP

Inventor： KAJITA TORU ,  SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI

IPC: C08F222/06 ,  C08F232/08

Abstract: PROBLEM TO BE SOLVED: To obtain the subject copolymer having alicyclic groups and acid- cleavable polar organic groups, having high radiation penetrability, excellent dry etching resistance, excellent adhesivity, etc., and useful for optical materials, electronic materials, etc. SOLUTION: This polar norbornene derivative/maleic anhydride copolymer comprises repeating units of formula I (X and Y are each H or a 4-20C acid- cleavable organic group; A and B are each H or a 1-4C alkyl) preferably in an amount of 60-40 mol.% and repeating units of formula II preferably in an amount of 40-60 mol.%, and has a polystyrene-converted weight-average mol.wt. of 1,000-1,000,000. The copolymer is obtained by radically copolymerizing at least one kind of norbornene derivative of formula III [for example, 8-t- butoxycarbonyltetracyclo(4.4.0.1 , .1 , )dodeca-3-ene] with maleic anhydride and, if necessary, one or more other copolymerizable unsaturated compound [for example, bicyclo(2.2.1)hept-2-enel.