62.
    发明专利
    未知

    公开(公告)号:DE60219100D1

    公开(公告)日:2007-05-10

    申请号:DE60219100

    申请日:2002-05-06

    Abstract: A non-volatile memory architecture with a word-based organization includes one selection transistor per word. This selection transistor is used for the selection of the word by the source of the memory cells. In this way, the selection may be done directly by the ouput signals from the address decoders using low voltage. The switching of a high voltage to the gates and the drains of the memory cells is done independently of this selection. This enables the required number of high voltage switches to be reduced.

    63.
    发明专利
    未知

    公开(公告)号:DE60301119D1

    公开(公告)日:2005-09-01

    申请号:DE60301119

    申请日:2003-12-08

    Abstract: The memory cell (10) comprises two inverter circuits (14,16) interconnected between the data nodes (N1,N2) so to form a memory circuit (12), two programming transistors (28,30) for implementing an irreversible degradation of the gate oxide layers of transistors (18,18'), and two transistors (32,34) for implementing the functioning of the memory cell after programming. Each inverter circuit (14,16) comprises supplementary MOS transistors (18,20;18',20') connected in series between a supply voltage source (VDD) and the ground circuit (22). Each inverter circuit comprises a p-MOS transistor (18,18') and an n-MOS transistor (20,20'), and the data nodes (N1,N2) are formed between the two transistors, n-MOS and p-MOS. The degraded MOS transistor is a transistor with thin gate oxide layer (GO1). The oxide layer is degraded at least locally so to obtain a variation of current through the transistor at the time of reading the cell. The programming transistors (28,30), or the diodes, are connected between the programming control line (PROG) and the transistors of the inverter circuits. The n-MOS programming transistors (28,30) ensure a selective connection of the gates of the transistors (18,18') to a programming voltage (VREF) at a level sufficient to cause the degradation of the gate oxide layers of the transistors. The inverter circuits are interconnected by the intermediary of a n-MOS transistor (32,34) connected to the control line (SRAM) of functioning the cell as the SRAM cell. The drain and the source electrodes of the transistors (32,34) are connected to the gates of the transistors of the inverter circuits.

    Memory element with a definite number of write cycles, comprises memory units of programmable read-only memory (PROM) type controlled by a chain of selection units

    公开(公告)号:FR2840443A1

    公开(公告)日:2003-12-05

    申请号:FR0206863

    申请日:2002-06-04

    Abstract: The memory element comprises a set of n memory units (10-1,....,10-n), each with an address bus, a data bus, and a control bus connected respectively to the main address bus, the main data bus and the main control bus. The memory units comprise the elements of fuse/antifuse type allowing an irreversible registering of information. The control chain comprises the selection units (12-1,....,12-n) each generating a selection signal, that is a Chip-Select (CSi), where i is from 1 to n, for one of the memory units (10i) in a manner to allow an exclusive access to the selected memory unit. The selection units switch automatically the selection of memory units following the detection of a predetermined condition. The memory element allows to implement an equivalent of a programmable memory of the type few times programmable (FTP), and in particular of type FLASH. A memory circuit (claimed) comprises the memory units of programmable type. The memory element comprises the programmable memory units (10-1,...,10-n) each receiving a Status Bit (SBi) which allows to store an information on the end of selection, and the predetermined condition corresponds to writing the Status Bit in the respective memory unit. The selection units are connected in a chain which allows to compute the selection signal for the memory unit of rank i, and two selection signals, direct and inverse, S(i) and SN(i), are transmitted and received by the selection unit of rank i+1. The selection unit is in two embodiments. In the first embodiment, teh selection unit comprises a bistable of type D, an inverter, and three AND gates. In the second embodiment, the selection unit comprises an inverter and a NOR gate. Each memory unit is implemented by a technology of type CMOS, and the fusible elements are constituted by capacitors with thin oxide layers.

    65.
    发明专利
    未知

    公开(公告)号:FR2823900B1

    公开(公告)日:2003-08-15

    申请号:FR0105343

    申请日:2001-04-20

    Abstract: An FAMOS memory includes memory cells, with each memory cell including an insulated gate transistor, and a first access transistor having a drain connected to a source of the insulated gate transistor. The FAMOS memory also includes an insulation transistor having a drain and a source respectively connected to the source of the insulated gate transistors of two adjacent cells of a same row. Each insulated gate transistor has a ring structure, and a ladder-shaped separation region insulates the cells of the same row.

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