公开(公告)号：US1187166A

公开(公告)日：1916-06-13

申请号：US1911667822

申请日：1911-12-26

Applicant: NAT CARBON CO

Inventor： MOTT WILLIAM ROY

CPC classification number: H01J3/026

公开(公告)号：US1032514A

公开(公告)日：1912-07-16

申请号：US1911630032

申请日：1911-05-29

Applicant: INTERNAT ACHESON GRAPHITE COMPANY

Inventor： SMITH WILLIAM ACHESON

CPC classification number: H01J3/026

公开(公告)号：EP2772930B1

公开(公告)日：2018-07-04

申请号：EP14156445.0

申请日：2014-02-25

Applicant: FEI Company

Inventor： Maazouz, Mostafa

IPC: H01J37/04 ,  H01J37/305

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：EP2772930A3

公开(公告)日：2017-04-19

申请号：EP14156445.0

申请日：2014-02-25

Applicant: FEI Company

Inventor： Maazouz, Mostafa

IPC: H01J37/04 ,  H01J37/305

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：EP2077574B1

公开(公告)日：2015-06-17

申请号：EP07830086.0

申请日：2007-10-18

Applicant: ULVAC, INC.

Inventor： IIJIMA, Eiichi ,  SHEN, Guo Hua ,  SATAKE, Tohru

IPC: H01J37/06 ,  H01J37/04 ,  H01J3/02 ,  H01J37/07 ,  H01J37/304

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

公开(公告)号：EP1455380B1

公开(公告)日：2007-04-18

申请号：EP03004665.0

申请日：2003-03-03

Applicant: ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh

Inventor： Jasinski, Thomas

IPC: H01J37/06 ,  H01J37/30

CPC classification number: H01J3/026 ,  H01J37/065 ,  H01J2237/022

公开(公告)号：EP0520445B1

公开(公告)日：1996-11-27

申请号：EP92110731.4

申请日：1992-06-25

Applicant: NEC CORPORATION

Inventor： Imura, Hironori, c/o NEC Corporation

IPC: H01J1/22 ,  H01J3/02

CPC classification number: H01J1/22 ,  H01J3/026

公开(公告)号：US09443692B2

公开(公告)日：2016-09-13

申请号：US14803964

申请日：2015-07-20

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J3/14 ,  H01J37/07 ,  H01J37/21 ,  H01J37/10 ,  H01J37/04 ,  H01J37/305 ,  H01J3/02 ,  H01J37/06 ,  H01J37/147 ,  H01J37/248

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：US20150083929A1

公开(公告)日：2015-03-26

申请号：US14565051

申请日：2014-12-09

Applicant: FEI Company

Inventor： Mostafa Maazouz

IPC: H01J37/147 ,  H01J37/248 ,  H01J37/06

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

公开(公告)号：US08198797B2

公开(公告)日：2012-06-12

申请号：US12446584

申请日：2007-10-18

Applicant: Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

Inventor： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC: H01J29/46

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

Abstract: [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

Abstract translation: 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。