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    PERMANENT MAGNET BASED HIGH PERFORMANCE MULTIAXIS IMMERSION ELECTRON LENS ARRAY WITH LOW AXIAL LEAKAGE FIELD
    63.
    发明申请
    PERMANENT MAGNET BASED HIGH PERFORMANCE MULTIAXIS IMMERSION ELECTRON LENS ARRAY WITH LOW AXIAL LEAKAGE FIELD 审中-公开
    基于永磁体的高性能多轴电流透镜阵列，具有低轴向漏电场

    公开(公告)号：WO2014142745A1

    公开(公告)日：2014-09-18

    申请号：PCT/SG2014/000102

    申请日：2014-03-04

    Applicant: LUO, Tao

    Inventor： LUO, Tao

    IPC: H01J37/14 ,  H01J37/143 ,  H01J37/145

    CPC classification number: H01J37/14 ,  H01J3/20 ,  H01J37/143 ,  H01J37/145 ,  H01J2237/1405

    Abstract: An apparatus includes a magnetic adjustment lens (116) positioned at the electron beam path between the electron source (102) and sample (124), the magnetic adjustment lens excited by an electric coil, and a permanent magnet lens (118) positioned below the magnetic adjustment lens to focus the electron beam onto the sample surface, the permanent magnet lens excited by one or more permanent ring magnets enclosed except on a bottom surface by a magnetic field conductor. The magnetic adjustment lens may be excited to eliminate magnetic field leakage of the permanent magnet lens.

    Abstract translation: 一种设备包括位于电子源（102）和样品（124）之间的电子束路径处的磁调节透镜（116），由电线圈激励的磁调节透镜和位于电子源 磁调节透镜将电子束聚焦到样品表面上，永磁体透镜由一个或多个永久环形磁体激发，除了通过磁场导体在底表面外。 可以激励磁调节透镜以消除永磁体透镜的磁场泄漏。

    電子レンズおよび電子ビーム装置
    64.
    发明申请
    電子レンズおよび電子ビーム装置 审中-公开
    电子镜头和电子束装置

    公开(公告)号：WO2012057166A1

    公开(公告)日：2012-05-03

    申请号：PCT/JP2011/074588

    申请日：2011-10-25

    Applicant: 株式会社PARAM ,  安田 洋

    Inventor： 安田　洋

    IPC: H01J37/143 ,  H01J37/141 ,  H01J37/305 ,  H01L21/027

    CPC classification number: H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/143 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/1405

    Abstract: 永久磁石を用い、微細なパターンを効率的に描画する。Ｚ軸を中心軸とした円筒型強磁性体からなる外側円筒（２０１）と、前記外側円筒の内側に配置された、Ｚ軸方向に着磁された円筒型永久磁石（２０２）と、前記円筒型永久磁石の内側に、前記円筒型永久磁石と間隙をおいて配置され、前記円筒型永久磁石によるＺ軸方向の磁界強度を調整する補正用コイル（２０４）と、前記円筒型永久磁石と、前記補正用コイルとの間隙に配置され、内部に冷媒が流通されて、前記円筒型永久磁石の温度変化を抑制する冷媒流路（２０３）と、を有する。

    Abstract translation: 使用永久磁铁有效地画出精细图案。 提供有：以从Z轴为中心的圆柱形磁体形成的外筒（201） 设置在所述外筒内并在Z轴方向上被磁化的圆柱形永磁体（202） 校正线圈（204），其设置在所述圆筒形永磁体的内侧的所述圆筒形永久磁铁内的空间内，并调整所述圆筒形永久磁铁的Z轴方向的磁场强度; 并且设置在圆筒形永磁体和校正线圈之间的空间中的制冷剂流路203具有制冷剂流入内部，并且抑制圆筒形永磁体的温度变化。

    ELECTRON MICROSCOPE ARRAY FOR INSPCETION AND LITHOGRAPHY
    65.
    发明申请
    ELECTRON MICROSCOPE ARRAY FOR INSPCETION AND LITHOGRAPHY 审中-公开
    电子显微镜阵列用于插值和平移

    公开(公告)号：WO2006018840A2

    公开(公告)日：2006-02-23

    申请号：PCT/IL2005000885

    申请日：2005-08-14

    Applicant: ELLUMINA VISION LTD ,  IZKOIVITCH MORDECHAI ,  KOLARIK VLADIMIR ,  GOLAN GILAD ,  KARIN JACOB

    Inventor： IZKOIVITCH MORDECHAI ,  KOLARIK VLADIMIR ,  GOLAN GILAD ,  KARIN JACOB

    IPC: H01J1/50

    CPC classification number: H01J37/143 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/244 ,  H01J2237/2444 ,  H01J2237/28 ,  H01J2237/2817

    Abstract: A system and method for rapidly processing a specimen. The method includes generating a plurality of charged-particle beams travelling substantially along respective axes of an array of charged-particle beam columns by providing each beam column with two permanent magnets having at least one magnetic dipole disposed in a plane perpendicular to the axis. The trajectory of the beams is independently controlled and the beam is focussed onto the specimen using additional correctional coils. The beams are deflected while maintaining incidence of the beam on the specimen parallel to the axis. Preferably, the charged particle beams include non-crossover charged particle beams. Preferably, the method further includes detecting charged particles scattered from the specimen using a detector at least partially immersed in a magnetic field, by utilizing at least in part the magnetic field.

    Abstract translation: 一种用于快速处理样品的系统和方法。 该方法包括通过为每个光束柱提供两个具有设置在垂直于该轴的平面中的至少一个磁偶极子的永磁体，生成基本沿着带电粒子束列的阵列的各个轴线行进的多个带电粒子束。 光束的轨迹被独立地控制，并且使用附加的校正线圈将光束聚焦在样本上。 梁保持偏转，同时保持试样平行于轴线的梁的入射。 优选地，带电粒子束包括非交叉带电粒子束。 优选地，该方法还包括通过至少部分地利用磁场来检测使用至少部分浸没在磁场中的检测器从样品散射的带电粒子。

    MULTICOLUMN ELECTRON BEAM EXPOSURE APPARATUS AND MAGNETIC FIELD GENERATING APPARATUS
    68.
    发明公开
    MULTICOLUMN ELECTRON BEAM EXPOSURE APPARATUS AND MAGNETIC FIELD GENERATING APPARATUS 有权
    富士通Er ur Er ines es es es es es es es es es es es es es es es es es es

    公开(公告)号：EP2302664A1

    公开(公告)日：2011-03-30

    申请号：EP08790570.9

    申请日：2008-06-24

    Applicant: Advantest Corporation

    Inventor： YASUDA, Hiroshi ,  OOAE, Yoshihisa ,  HARAGUCHI, Takeshi

    IPC: H01L21/027 ,  H01J37/143

    CPC classification number: H01J37/143 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3174 ,  H01J2237/0635 ,  H01J2237/14

    Abstract: A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.

    Abstract translation: 多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体中的每一个在光轴方向上被磁化并且围绕光轴对称，设置在环形 永磁体，用于调整环形永磁体的磁场; 以及设置有圆孔的基板，通过该圆形孔使用的电子束分别通过设置在每个圆形孔的侧部中的具有电子束会聚单元的基板。 两个环形永久磁铁可以沿着光轴方向彼此相对设置，具有相同的极性彼此面对，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

    ELECTRON BEAM SOURCE FOR USE IN ELECTRON GUN
    70.
    发明公开
    ELECTRON BEAM SOURCE FOR USE IN ELECTRON GUN 审中-公开
    电子源用在电子枪

    公开(公告)号：EP1941527A2

    公开(公告)日：2008-07-09

    申请号：EP06803335.6

    申请日：2006-09-11

    Applicant: Applied Materials, Inc.

    Inventor： COYLE, Steven T. ,  SCHEINFEIN, Michael R. ,  DEVORE, William J.

    IPC: H01J29/46 ,  H01J29/50

    CPC classification number: H01J37/065 ,  H01J37/143 ,  H01J2237/06316 ,  H01J2237/06341

    Abstract: An electron beam source (Fig 1) for use in an electron gun The electron beam source (10) includes an emitter (14) terminating in a ti The emitter is configured to generate an electron beam The electron beam source (10) further includes a suppressor electrode (16) laterally surrounding the emitter (14) such that the tip of the emitter protrudes through the suppressor electrode (16) and an extractor electrode (24) disposed adjacent the tip of the emitter (14) The extractor electrode (24) compπses a magnetic disk (100) whose magnetic field is aligned with an axis of the electron beam

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