公开(公告)号：WO2005010918A1

公开(公告)日：2005-02-03

申请号：PCT/KR2004/001841

申请日：2004-07-24

Applicant: CEBT CO., LTD. ,  KIM, Ho Seob

Inventor： KIM, Ho Seob

IPC: H01J37/26

CPC classification number: H01J37/12 ,  H01J9/18 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the microlenses. The method includes forming at least one first microlens assembly set (set_1) by anodic-bonding an insulating layer (101) and a microlens (102) together; layering a second microlens assembly set (set_2) on the first microlens assembly set (set_1); and scanning a laser beam, thus welding the first microlens assembly set (set_1) to the microlens of the second microlens assembly set (set_2). The method of the present invention further includes anodic-bonding the microlens assembly sets together.

Abstract translation: 本发明提供了一种用于制造具有交替置于微透镜之间的多个微透镜和多个绝缘层的微柱的透镜组件的方法。 该方法包括通过将绝缘层（101）和微透镜（102）阳极结合在一起来形成至少一个第一微透镜组件组（set_1） 在第一微透镜组件组（set_1）上分层第二微透镜组件组（set_2）; 并扫描激光束，从而将第一微透镜组件组（set_1）焊接到第二微透镜组件组（set_2）的微透镜。 本发明的方法还包括将微透镜组件组件阳极接合在一起。

公开(公告)号：WO2004059690A1

公开(公告)日：2004-07-15

申请号：PCT/KR2003/002900

申请日：2003-12-30

Applicant: CEBT CO., LTD. ,  KIM, Ho Seob ,  AHN, Seung Joon ,  KIM, Dae Wook

Inventor： KIM, Ho Seob ,  AHN, Seung Joon ,  KIM, Dae Wook

IPC: H01J37/06

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of said extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of said alignment.

Abstract translation: 本发明提供了用于微柱的新提取器和所述提取器的孔径和用于微柱的电子发射器的对准方法。 此外，本发明提供了一种使用所述对准原理的测量系统，测量方法和对准方法。

公开(公告)号：EP2002473A1

公开(公告)日：2008-12-17

申请号：EP07745797.6

申请日：2007-04-03

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob

IPC: H01L21/66

CPC classification number: H01J37/28 ,  G01R31/307 ,  H01J37/244 ,  H01J2237/0635 ,  H01J2237/22 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/281 ,  H01J2237/2817 ,  H01J2237/317 ,  H01L22/12 ,  H01L22/14

Abstract: Disclosed herein is an apparatus and method for inspecting the via holes of a semiconductor device using electron beams. The apparatus includes electron beam irradiation means, a current measuring means, and a current measuring means and data processing means. The electron beam irradiation means radiate respective electron beams to inspect a plurality of inspection target holes. The current measuring means measures current, which is generated by irradiating the electron beams, radiated from the electron beam irradiation means, through a conductive layer located under the holes, or through the conductive layer and a separate detector. The data processing means processes data acquired through the measurement of the current measuring means.

Abstract translation: 本文公开了一种使用电子束检查半导体器件的通孔的装置和方法。 该装置包括电子束照射装置，电流测量装置，以及电流测量装置和数据处理装置。 电子束照射装置辐射相应的电子束以检查多个检查目标孔。 电流测量装置测量通过照射电子束而从电子束照射装置辐射的电流，通过位于孔下方的导电层，或者通过导电层和单独的检测器。 数据处理装置处理通过电流测量装置的测量获得的数据。

公开(公告)号：EP1910891A1

公开(公告)日：2008-04-16

申请号：EP06783468.9

申请日：2006-07-31

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob

IPC: G02F1/13

CPC classification number: G09G3/006 ,  G02F1/1303 ,  G02F1/1309 ,  G02F2001/136254 ,  G02F2203/69 ,  G09G3/3648 ,  H01J37/28 ,  H01J2237/2817

Abstract: Inspection equipment using a microcolumn is disclosed. The inspection equipment of the present invention can conduct inspection of a fine circuit, which could not be conducted using conventional optical inspection equipment. Furthermore, the present invention can rapidly inspect a display, having a relatively large area, and can have a precise inspection function and a repair function. The inspection equipment of the present invention includes a plurality of microcolumns, a shaft, to which the microcolumns are coupled, and which is disposed in a direction perpendicular to a direction in which an object is moved, and a detector for detecting electron beams radiated from the microcolumns onto the object to determine whether errors exist in a circuit of the object.

公开(公告)号：EP1891467A1

公开(公告)日：2008-02-27

申请号：EP06768670.9

申请日：2006-05-29

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: G02B3/00

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

公开(公告)号：EP1982346A1

公开(公告)日：2008-10-22

申请号：EP07708735.1

申请日：2007-02-02

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob

IPC: H01J37/147

CPC classification number: H01J37/18 ,  H01J2237/1205 ,  H01J2237/188

Abstract: Disclosed is a device for sustaining different vacuum degrees for an electron column, including an electron emitter, a lens part, and a housing for securing them, to maintain the electron column and a sample under different vacuum degrees. The device comprises a column housing coupling part coupled to the housing to isolate a vacuum; a hollow part defined through the center portion of the device to allow an electron beam emitted from the electron column to pass therethrough; and a vacuum isolation part having a structure of a gasket for vacuum coupling, wherein a difference of no less than 10 torr in a vacuum degree is maintained between both sides of the device by selecting an appropriate diameter of a lens electrode layer which is finally positioned in a path along which the electron beam is emitted or by using the hollow part.

公开(公告)号：EP1789985A1

公开(公告)日：2007-05-30

申请号：EP05774204.1

申请日：2005-08-11

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: H01J1/30

CPC classification number: H01J31/127

Abstract: Provided is a scanning field emission display (SFED). The SFED includes an electron emitter and a module for inducing electron emission of the electron emitter and deflecting an electron beam. A multi-SFED may be realized as a large-sized thin and flat display by arranging in an n x m array.

公开(公告)号：EP1891467B1

公开(公告)日：2013-01-09

申请号：EP06768670.9

申请日：2006-05-29

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: H01J3/18 ,  H01J3/26 ,  H01J37/12

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

公开(公告)号：EP2149145A2

公开(公告)日：2010-02-03

申请号：EP08753509.2

申请日：2008-05-15

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Young Chul

IPC: H01J37/147

CPC classification number: H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/152 ,  H01J2237/1532

Abstract: The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).

公开(公告)号：EP1794771A1

公开(公告)日：2007-06-13

申请号：EP05781159.8

申请日：2005-09-01

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  KIM, Byeng Jin

IPC: H01J37/04

CPC classification number: H01J37/04 ,  G11B7/261 ,  H01J2237/0245 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1503 ,  H01J2237/2817 ,  H01J2237/3175

Abstract: Provided is motioning equipment which provides relative motion between electron column emitting electron beam and a sample on which the electron beam is irradiated. The motioning equipment includes multi-microcolumn for emitting electron beams on the sample, supports for supporting the multi-microcolumns, and driving means for driving the supports to move the multi-microcolumns.