Abstract:
본 발명은 RF 소자를 제공한다. 이 소자는 나도 튜브 고유 진동수(f0)를 가지고 진동하는 탄소나노튜브, 탄소나노튜브의 일단에 고정 결합된 음극, 탄소나노튜브의 타단에 대향하여 배치되고 가변의 공진 주파수로 진동하는 튜닝 전극, 및 튜닝 전극의 일단에 전기적으로 연결된 양극를 포함하되, 튜닝 전극의 타단은 상기 탄소 나노튜브의 타단과 인접하여 배치되고, 탄소나노튜브는 케리어 주파수를 가지는 외부 전자기파에 따라 케리어 주파수로 진동하고, 가변 공진 주파수 특성을 갖는 튜닝 전극은 상기 탄소나노튜브의 타단과 튜닝 전극의 타단의 거리 변화를 증폭시켜 전계 방출에 따른 전자 방출 감도를 증가시킬 수 있다. 탄소나노튜브(Carbon nanotube(CNT)), 라디오 주파수 소자(radio frequency(RF) device), 안테나(antenna), 복조(demodulation), 증폭기(amplifier)
Abstract:
PURPOSE: A radio frequency device is provided to form a micro type and a low power structure based on a nano material using an electronic and structural property of a CNT. CONSTITUTION: A carbon nano-tube(110) generates a vibration according to a nano-tube natural frequency. A cathode(120) is fixed to one end of the carbon nano-tube. A tuning electrode(130) is arranged on the other end of the carbon nano-tube. An anode(140) is electrically connected to the one end of the tuning electrode. The other end of the tuning electrode is arranged with the other end of the carbon nano-tube with contiguous. The carbon nano-tube vibrates to the carrier frequency according to an external electromagnetic wave having a carrier frequency. The tuning electrode increases an electronic emission sensitivity by amplifying a distance variation of the other end of the other end of the carbon nano-tube and the tuning electrode.
Abstract:
A formation method of ZnO nanowire network pattern is provided to form ZnO nanowire network pattern and device of a desired shape and size at a low temperature with a stable yield by using a lithographic process and a sol-gel method. A formation method of ZnO nanowire network pattern comprises steps of: forming a photoresist pattern exposing a part of a substrate on the substrate; molding the ZnO nanowire network on a photoresist pattern and an exposed part of the substrate by a sol-gel method; and removing the photoresist pattern and forming the ZnO nanowire network pattern on the substrate. The step for forming the photoresist pattern comprises steps of: coating a photoresist on the substrate; exposing the photoresist; and developing the exposed photoresist.
Abstract:
유연성 있는 전극을 사용하는 염료감응 태양전지를 개시한다. 본 발명에 따른 염료감응 태양전지는 서로 대향하고 있는 제1 전극, 제2 전극 및 상기 제1 전극과 상기 제2 전극 사이에 개재되어 있는 전해질층을 포함하되, 상기 제1 전극은 전도성 섬유의 구조물, 상기 전도성 섬유의 구조물의 표면에 형성되어 있는 나노입자 반도체 산화물층 및 상기 나노입자 반도체 산화물층에 흡착되어 있는 염료분자를 포함한다. 염료감응 태양전지, 전도성 섬유, 나노입자 반도체 산화물, 염료분자
Abstract:
A dye-sensitized solar cell and a manufacturing method thereof are provided to maximize photoelectric energy conversion efficiency by minimizing a moving path of an electron in an electrode structure. An electrode structure of a dye-sensitized solar cell includes a conductor layer(120), an oxide semiconductor layer(122), and a dye layer(124). The conductor layer includes regularly arranged holes. The oxide semiconductor layer is formed on a surface of the conductor layer by using one method selected among a deep coating method, an electrophoretic method, and an electroplating method. The oxide semiconductor layer includes a titanium oxide. The dye layer is formed on a surface of the oxide semiconductor layer.
Abstract:
A die-sensitized solar cells and method for manufacturing the same is provided to prevent electronic loss by interaction with the electronics from dyes and oxidation/deoxidation electrolyte on the surface of the surface of the metal oxide layer or the conductive substrate. In a die-sensitized solar cells and method for manufacturing the same, the dye-sensitized solar cell comprises a semiconductor electrode(10), an opposing electrode, and electrolyte solution. The semiconductor electrode includes a first conductive substrate and an electron transport layer(13) on the first conductive substrate. The electron transport layer comprises the dye molecule layer(16) absorbed to the surface of the metal oxide layer and the metal oxide layer(14) formed on the first conductive substrate. The insulating protection layer(18) is formed on a part of surface on the metal oxide layer not covering with the dye molecule layer or a part of the surface of the conductive substrate not contacting with the metal oxide layer.
Abstract:
A method for manufacturing an electronic device using a nanowire is provided to reduce a manufacturing cost and a manufacturing time for the electronic device by reducing a process using an E-beam. An electrode is formed on a substrate(S11). Plural nanowires are applied on the substrate on which the electrode is formed(S12). An image with respect to the substrate on which the nanowire and the electrode are formed is captured(S13). A virtual connection line connecting the nanowire to the electrode is drawn on the image by using an electrode pattern simulated through a computer program(S14). A photoresist for an E-beam is applied onto the substrate(S15). The photoresist formed on a position corresponding to the virtual connection line and the electrode pattern is removed by an E-beam lithography process(S16). A metal layer is deposited on the substrate(S17). The photoresist remaining on the substrate is removed by a lift-off process(S18).
Abstract:
A method for fabricating a nano wire array device is provided to embody a large-scale nano wire array device even when a nano wire is not parallel with an electrode line by selectively etching a nano wore on a substrate and by patterning an electrode line in a manner that the electrode becomes vertical to the electrode line to improve a probability that the electrode is connected to the nano wire. A nano wire solution including a nano wire(50) is deposited on a substrate. A first etch region of a stripe type is formed on the substrate to pattern the nano wire. A drain electrode line(100) and a source electrode line(200) are formed at both sides of the patterned nano wire, parallel with each other. One end of a plurality of drain electrodes(110) is connected to the drain electrode line wherein the drain electrode comes in contact with at least one nano wire. One end of a plurality of source electrodes(210) is connected to the source electrode line wherein the source electrode comes in contact with the nano wire in contact with the drain electrode. A second etch region is formed between the pair of drain electrodes and source electrodes so that the pair of drain electrodes and source electrodes don't contact each other electrically. An insulation layer(800) is formed on the substrate. A gate electrode(300) is formed on the insulation layer, disposed between the source and drain electrodes in contact with the nano wire.
Abstract:
A molecular electronic device including an organic dielectric thin film and a method for fabricating the same are provided to block a penetrated electrode material from reaching a bottom electrode by increasing a distance from a molecular active layer to the bottom electrode. A molecular electronic device includes a substrate, an organic dielectric thin film(150) formed on the substrate, a molecular active layer(160) formed on the organic dielectric thin film and having a charge trap site, and an electrode(110) formed on the molecular active layer. The organic dielectric thin film comprises a molecular structure represented by M-R-T, wherein M is a sulfur-containing group or a silicon-containing group, R is a saturated or unsaturated C1 to C20 hydrocarbon group which is saturated or unsaturated with fluorine, and T is -SH, -NH2, or -COOH.
Abstract:
본 발명은 기판 상에 비촉매 금속 아일랜드를 형성하고, 상기 비촉매 금속 아일랜드 주위를 둘러싸게 촉매 금속 도넛을 형성하고, 상기 촉매 금속 도넛 상에 실리콘 나노튜브를 성장시켜 실리콘 나노튜브를 제조한다. 본 발명은 촉매 금속 도넛을 이용하여 실리콘 나노튜브를 효과적으로 성장시킬 수 있다.