公开(公告)号：SG114733A1

公开(公告)日：2005-09-28

申请号：SG200500893

申请日：2005-02-16

Applicant: ASML NETHERLANDS BV

Inventor： GUI CHENG-QUN ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN

IPC: G03F7/20 ,  H01L21/027

Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements (21-26) to modulate the intensity of radiation received at each focusing element (31;32) of an array of focusing elements (12) to control the intensity of the radiation in the areas (33;34) on the substrate (13) onto which the focusing elements direct the radiation.

公开(公告)号：DE69904881T2

公开(公告)日：2003-10-30

申请号：DE69904881

申请日：1999-06-18

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN

IPC: H01L21/027 ,  B82B1/00 ,  G03F1/00 ,  G03F1/14 ,  G03F7/20 ,  H01J37/073 ,  H01J37/153 ,  H01J37/305 ,  H01J37/317

公开(公告)号：DE602005023946D1

公开(公告)日：2010-11-18

申请号：DE602005023946

申请日：2005-08-11

Applicant: ASML NETHERLANDS BV

Inventor： DEN BOEF ARIE JEFFREY ,  BLEEKER ARNO JAN ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  LUEHRMANN PAUL FRANK ,  PELLEMANS HENRICUS PETRUS MARIA ,  VAN DER SOHAAR MAURITS ,  GROUWSTRA CEDRIC DESIRE ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：DE602005014179D1

公开(公告)日：2009-06-10

申请号：DE602005014179

申请日：2005-08-05

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  TROOST KARS ZEGER

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/08

Abstract: An array of individually controllable elements, comprising a plurality of control areas (20) consisting of a plurality of rows (31,32,33,34) of reflectors. Alternate rows (31,33) of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.

公开(公告)号：DE60320202T2

公开(公告)日：2009-05-14

申请号：DE60320202

申请日：2003-11-26

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  BENSCHOP JOZEF PETRUS HENRICUS

IPC: G03F7/20 ,  H01L21/027

Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

公开(公告)号：DE60319635T2

公开(公告)日：2009-04-02

申请号：DE60319635

申请日：2003-07-07

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  BANINE VADIM YEVGENYEVICH

IPC: G03F7/20 ,  H01L21/027

Abstract: A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D 1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

公开(公告)号：DE602004017400D1

公开(公告)日：2008-12-11

申请号：DE602004017400

申请日：2004-11-03

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN

IPC: G03F7/20 ,  G02F1/03 ,  G02F1/21 ,  H01L21/027

Abstract: An array of individually controllable elements includes elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

公开(公告)号：DE69938885D1

公开(公告)日：2008-07-24

申请号：DE69938885

申请日：1999-06-08

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN

IPC: G03F7/20 ,  H01L21/027 ,  H01J37/317

Abstract: A lithographic apparatus, e.g. using an electron beam, to expose a radiation sensitive layer on a substrate to the pattern on a mask comprising pattern areas and opaque supports. The apparatus uses a variable shaped beam at the edges of the pattern areas to provide a uniform exposure, while avoiding illumination of the opaque supports.

公开(公告)号：SG133538A1

公开(公告)日：2007-07-30

申请号：SG2006087373

申请日：2006-12-15

Applicant: ASML NETHERLANDS BV

Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

Abstract: A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

公开(公告)号：SG115697A1

公开(公告)日：2005-10-28

申请号：SG200402817

申请日：2004-05-20

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER MAST KAREL DIEDERICK ,  BLEEKER ARNO JAN ,  GUI CHENG-QUN ,  HOEFNAGELS JOHAN CHRISTIAAN GE

IPC: G02B3/00 ,  G03F7/20 ,  H01L21/027