公开(公告)号：JPH0296606A

公开(公告)日：1990-04-09

申请号：JP24749288

申请日：1988-10-03

Applicant: CANON KK

Inventor： KORENAGA NOBUSHIGE ,  UZAWA SHUNICHI ,  GOTO SUSUMU ,  KARIYA TAKUO

IPC: G01B15/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: PURPOSE:To obtain a measuring apparatus wherein the measuring errors of minute sizes due to temperature change in an environment and mechanical vibration by detecting the position of an electron beam in a plane perpendicular to an optical axis, and moving the electron beam from said position to a specified position. CONSTITUTION:An electron beam mirror tube has a reference point and has electron-beam position detectors 10a and 10b which detect the position of the electron beam and electron- beam-position correcting deflection coils 6a, 7a, 6b and 7b. A length measuring device having beam splitters 19Xa and 19Xb is optically connected to the reference points of the electron- beam-position detectors 10a and 10b and the reference point of a specimen stage 17. The relative positions of the electron-beam position detectors 10a and 10b and the specimen stage 17 are determined. A central processing unit 37 is connected to the electron-beam position detectors 10a and 10b and the electron-beam-position correcting deflection coils 6a, 7a, 6b and 7b. The amount of deviation required for moving the electron beam to a specified position in a plane that is perpendicular to the optical axis of the electron beam is determined based on the detected signals of the electron-beam position detectors 10a and 10b. Deflecting signals for moving the electron beam to the specified position are imparted to the electron-beam position correcting deflection coils 6a, 7a, 6b and 7b.

公开(公告)号：JPH0294541A

公开(公告)日：1990-04-05

申请号：JP24626388

申请日：1988-09-30

Applicant: CANON KK

Inventor： MATSUI SHIN ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI

IPC: H01L21/677 ,  B65H5/14 ,  H01L21/68

Abstract: PURPOSE:To eliminate the drop or the like of a substrate, and to effectively transfer the substrate with high reliability by providing a gimbal supporting mechanism for a supporting substrate holding means to a transfer hand, and disposing the supporting shaft of the supporting mechanism on the substrate mounting face of substrate mounting means when the substrate is delivered. CONSTITUTION:The suction area of a chuck 2 is set to a minimum allowable area, a protrusion 21 so protrudes from the suction face of the chuck 2 that a Wy rotating central shaft 16 is not removed of the suction face of the chuck 2 and the shaft 16 is engaged on the protrusion 21. The shaft 16 is engaged on the suction face 22 of the chuck 2 by the protrusion 21, and when the wafer 1 is pressed to the chuck 2, the wafer 1 is corrected in its attitude to simulate the suction face of the suck 2. The suction face of an operating hand 3 is provided to have larger suction area than that of the chuck 2. The hand 3 is pressed to the chuck 2, and the rear face of the wafer 1 is brought into contact with the suction face of the chuck 2 to start suction. When the suction of the hand 3 is then disengaged, the delivering of the wafer 1 is completed.

公开(公告)号：JPH0259696A

公开(公告)日：1990-02-28

申请号：JP21081488

申请日：1988-08-26

Applicant: CANON KK

Inventor： OKAWA SHINKICHI ,  KARIYA TAKUO

IPC: G12B5/00 ,  G03F7/20 ,  H01L21/68

Abstract: PURPOSE:To compensate the unbalance of tension and to prevent the influence exerted on the positioning accuracy and the attitude accuracy of a moving body by bringing a connecting part of a stage being the moving body and a dead weight compensating mechanism to one-point suspension, and also, forming i by a rotation free structure. CONSTITUTION:Two pieces of steel belts 3 for suspending and supporting steel are connected to a base 2 through a rotating means 50, and the base 2 is connected to a Y stage 1 through a rotating means 40. In this case, the stage is rotatable in the vertical surface against a balancer, and suspended and supported at one point substantially through the rotating means 40. In such a way, even if a difference is generated in tension of the steel belt 3 and the base 2 is inclined, the base 2 rotates against the Y stage 1 by the rotating means 40, therefore, the difference of tension is absorbed and it is not transmitted to the Y stage 1. Also, even if a difference of tension is generated in two pieces of steel belts 3 by the rotating mans, the base 2 can always hold the same attitude.

公开(公告)号：JPS63140115A

公开(公告)日：1988-06-11

申请号：JP28707086

申请日：1986-12-02

Applicant: CANON KK

Inventor： FURUKAWA KANAME ,  KUSUNOKI HARUYUKI ,  YAMAURA TOSHIHIKO ,  HIGOMURA MAKOTO ,  KARIYA TAKUO ,  YAMAMOTO SEKINORI

IPC: F16C32/06 ,  B23Q1/00 ,  B23Q1/26 ,  B65G51/03 ,  G03F7/20

Abstract: PURPOSE:To supply a fluid to a moving body and discharge a fluid from the moving body keeping vacuum atmosphere by providing a turning portion on a part of fluid circulation means connected to a fluid bearing to be freely deformed, and forming the fluid circulation means by a plurality of pipes. CONSTITUTION:Pipeline arms 8a, 8b are fixed in such a manner as to fit to end connections 12a-d, 17a-d. Either the first member 101 or the second member 102 is fixed to a frame or a stage. In this arrangement, as the first member 101 and the second member 102 can be rotated through ball bearings 23a, 23b, the pipeline arms 8a, 8b can be turned centering around the joint. Since air leaking from vises 26a, 26b is sealed by a cover 27 with an O-ring, even if the above turning movement is conducted, the leakage of air can be prevented. Thus a fluid can be supplied to a moving body and the fluid can be discharged from the moving body.

公开(公告)号：JPS6239148A

公开(公告)日：1987-02-20

申请号：JP17570885

申请日：1985-08-12

Applicant: CANON KK

Inventor： KARIYA TAKUO

IPC: H01L21/30 ,  B23Q1/34 ,  B23Q5/22 ,  B23Q5/56 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68

Abstract: PURPOSE:To improve set resolution to a degree below a specified value, by providing displacement measuring means and fine movement means engaging with an arm at a position apart from a plate to be machined mounted on the arm with respect to a turning fulcrum of the arm. CONSTITUTION:When an input voltage corresponding to a required amount of displacement is applied to a set input terminal 9 of an error amplifier 7, the error amplifier 7 produces an output corresponding to a difference between an output from a displacement measuring device 6 and a set input. A drive power source 8 produces a drive voltage corresponding to the output so that a fine movement actuator 5 expands and contacts in accordance with the voltage for enabling an arm 4 to turn around an elastic hinge 2 as a fulcrum in a fine degree. The fine turning causes a pressure plate 3 to turn for making a fine movement stage move in a fine degree. Since a displacement amount of the pressure plate 3 is reduced in accordance with a distance from the turning fulcrum as compared with an amount of expansion and contraction of the actuator 5 by the principles of the lever and fulcrum and a displacement of the pressure plate 3 is transmitted to the measuring device 6 through the arm 5 and its amount of displacement is increased in the same manner, a highly accurate fine displacement less that 0.01mum can be set.

公开(公告)号：JPS6117100A

公开(公告)日：1986-01-25

申请号：JP3873284

申请日：1984-03-02

Applicant: Canon Kk

Inventor： KAWAI YASUO ,  KARIYA TAKUO

IPC: G21K1/00 ,  G03F7/20 ,  G21K1/02 ,  H01L21/027

CPC classification number: G03F7/70058

公开(公告)号：JPS60183598A

公开(公告)日：1985-09-19

申请号：JP3873084

申请日：1984-03-02

Applicant: CANON KK

Inventor： KAWAI YASUO ,  KARIYA TAKUO

IPC: G21K1/00 ,  G03F7/20 ,  G21K1/02 ,  H01L21/027

公开(公告)号：JPH07146442A

公开(公告)日：1995-06-06

申请号：JP18341394

申请日：1994-08-04

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  MINAMI SETSUO ,  OGURA SHIGETARO ,  FUKUDA YOSHIAKI ,  WATANABE YUTAKA ,  KAWAI YASUO ,  KARIYA TAKUO

IPC: G21K5/02 ,  G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/32

Abstract: PURPOSE:To provide an excellent catoptric system by which various kinds of aberration can be removed by a small number of reflecting surfaces. CONSTITUTION:A catoptric system has three reflecting surfaces of a concave reflecting surface M1, a convex reflecting surface M2 and a concave reflecting surface M3 along the optical axis, and at least one among the three reflecting surfaces is formed as an aspheric surface shape, and when a paraxial radius of curvature of the concave reflecting surface M1 is denoted by (r1) and a paraxial radius of curvature of the convex reflecting surface M2 is denoted by (r2) and a parxial radius of curvature of the concave reflecting surface M3 is denoted by (r3), an expression of (0.9

公开(公告)号：JPH0758010A

公开(公告)日：1995-03-03

申请号：JP15850494

申请日：1994-07-11

Applicant: CANON KK

Inventor： YAMAMOTO SEKINORI ,  OKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  HIGOMURA MAKOTO ,  KARIYA TAKUO

IPC: G01B21/00 ,  G03F7/20 ,  G03F9/00 ,  G12B5/00 ,  H01L21/027 ,  H01L21/68

Abstract: PURPOSE:To provide a vertical aligner which can accurately position by an effective and stable operating mechanism. CONSTITUTION:The aligner comprises a frame MF in which its interior is held hermetically sealed, a wafer conveying section MW0 provided in the frame MF, a first stage Y2S movable between the wafer conveying section and a wafer exposure unit, a second stage XS, Y1S placed in the first stage and movable in a plane including a vertical component, and means Y1M, XM for relatively moving the second stage to exposure luminous flux EX to be introduced substantially from a horizontal direction.

公开(公告)号：JPH0758006A

公开(公告)日：1995-03-03

申请号：JP15850094

申请日：1994-07-11

Applicant: CANON KK

Inventor： YAMAMOTO SEKINORI ,  OKAWA SHINKICHI ,  MATSUSHITA KOICHI ,  KAWAI YASUO ,  HIGOMURA MAKOTO ,  KARIYA TAKUO

IPC: G01B21/00 ,  G03F7/20 ,  G03F9/00 ,  G12B5/00 ,  H01L21/027

Abstract: PURPOSE:To provide a vertical scanning type X-ray aligner which can accurately position by an effective and stable operating mechanism. CONSTITUTION:The aligner comprises stages XS, Y1S, Y2S movable in a direction including a vertical component, and means for relatively scanning the stages to an X-ray EX of parallel luminous fluxes to be substantially introduced from a horizontal direction, and exposes a wafer by scanning exposure. In this case, the wafer and a mask are held substantially integrally, and the mask and the wafer are fed at a constant speed to the fluxes thereby to expose to transfer a mask pattern to the wafer.