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    Three dimensional microstructures and method of making
    71.
    发明授权
    Three dimensional microstructures and method of making 失效
    三维微结构及其制作方法

    公开(公告)号：US06861205B2

    公开(公告)日：2005-03-01

    申请号：US10072360

    申请日：2002-02-06

    Applicant: Lawrence E. Bowman ,  Glen C. Dunham

    Inventor： Lawrence E. Bowman ,  Glen C. Dunham

    IPC: B81C1/00 ,  G03F7/00

    CPC classification number: B81C99/0095 ,  B33Y10/00 ,  B33Y70/00 ,  B81C2201/0109 ,  B81C2201/0159

    Abstract: A method of forming complex three-dimensional microstructures wherein an external stimulus is applied to a first layer of a photosensitive material, thereby creating voids in the first layer, and any material present in those voids is removed. A sacrificial material is then provided within at least a portion of the voids. This sacrificial layer fills the voids, either in whole or in part, and enables a second layer of photosensitive material to be stacked upon the first, while still preserving the pattern formed in the first layer. Once the sacrificial layer has been applied, a second layer of photosensitive material may then be stacked onto the first. Successive layers of photosensitive material and sacrificial material may be added until a final, complex three-dimensional structure is created. The sacrificial material may then be removed with a solvent such as carbon dioxide.

    Abstract translation: 形成复合三维微结构的方法，其中将外部刺激施加到感光材料的第一层，从而在第一层中产生空隙，并且去除存在于那些空隙中的任何材料。 然后在空隙的至少一部分内提供牺牲材料。 该牺牲层全部或部分地填充空隙，并且使第二层感光材料首先堆叠在一起，同时仍然保留形成在第一层中的图案。 一旦施加了牺牲层，则可以将第二层感光材料层叠在第一层上。 可以加入感光材料和牺牲材料的连续层，直到产生最终的复杂三维结构。 然后可以用诸如二氧化碳的溶剂除去牺牲材料。

    Method for forming a structure
    73.
    发明授权
    Method for forming a structure 失效
    形成结构的方法

    公开(公告)号：US5926716A

    公开(公告)日：1999-07-20

    申请号：US829255

    申请日：1997-03-31

    Applicant: Dirk Tobben ,  Peter Weigand

    Inventor： Dirk Tobben ,  Peter Weigand

    IPC: H01L27/04 ,  B81B3/00 ,  H01L21/02 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/108 ,  H01L21/20

    CPC classification number: B81C1/00111 ,  H01L27/10852 ,  H01L28/87 ,  H01L28/91 ,  B81C2201/0109 ,  B81C2201/0159 ,  H01L28/88 ,  H01L28/92

    Abstract: A method for forming a microstructure includes photolithographically forming a vertically extending post on a portion of a surface of a substrate to provide a first structure. A flowable, sacrificial material is deposited over a surface of the first structure. The flowable, sacrificial materially flows off the top surface and sidewall portions of the post onto adjacent portions of the surface of the substrate to provide a second structure. A non-sacrificial material is deposited over a surface of the second structure. The non-sacrificial material is deposited to conform to the surface of the second structure. The non-sacrificial is deposited over the sacrificial material, over the sidewall portions and over the top surface of the post. The deposited sacrificial material is selectively removed while the non-sacrificial material remains to form a third structure with a horizontal member provided by the non-sacrificial material. The horizontal member is supported a predetermined distance above the surface of the substrate by a lower portion of the post. The flowable material is a flowable oxide, for example, hydrogensilsesquioxane glass, and the post has a width less than 20 .mu.m. The resulting structure, formed with a single photolithographic step, is used for supporting a capacitor deposited over it. The capacitor is formed as a sequence of deposition steps; i.e., depositing a first conductive layer over a surface of the support structure; depositing a dielectric layer over the conductive layer; and depositing a second conductive layer over the dielectric layer.

    Abstract translation: 一种用于形成微结构的方法包括光刻地形成垂直延伸的柱体，以在衬底表面的一部分上提供第一结构。 可流动的牺牲材料沉积在第一结构的表面上。 可流动的牺牲物质地从柱的顶表面和侧壁部分流出到衬底的表面的相邻部分上以提供第二结构。 非牺牲材料沉积在第二结构的表面上。 沉积非牺牲材料以符合第二结构的表面。 非牺牲材料沉积在牺牲材料上，在侧壁部分上方并在柱的顶表面上方。 选择性地去除沉积的牺牲材料，同时非牺牲材料保留以形成具有由非牺牲材料提供的水平构件的第三结构。 水平构件通过柱的下部支撑在基板的表面上方预定距离。 可流动材料是可流动的氧化物，例如氢倍半硅氧烷玻璃，柱的宽度小于20μm。 用单个光刻步骤形成的所得结构用于支撑沉积在其上的电容器。 电容器形成为一系列沉积步骤; 即在支撑结构的表面上沉积第一导电层; 在导电层上沉积介电层; 以及在所述电介质层上沉积第二导电层。

    Method for making patterns on the surface of a substrate using block copolymers
    78.
    发明授权
    Method for making patterns on the surface of a substrate using block copolymers 有权
    使用嵌段共聚物在基材表面上形成图案的方法

    公开(公告)号：US09566610B2

    公开(公告)日：2017-02-14

    申请号：US14122576

    申请日：2012-05-18

    Applicant: Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

    Inventor： Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

    IPC: B05D5/00 ,  B81C1/00 ,  H01L21/027 ,  H01L21/033

    CPC classification number: B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0159 ,  H01L21/0273 ,  H01L21/0337

    Abstract: A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.

    Abstract translation: 一种用于通过石刻电泳法在衬底表面上制作图案的方法，包括在衬底的表面上沉积一层树脂; 在基板表面上的树脂中形成图案; 通过在树脂中的图案的表面上产生无定形碳层来固化树脂中的图案; 在固化树脂中的图案之后沉积一层统计共聚物; 通过退火将统计共聚物层接枝到树脂上的图案上; 以及在固化图案和统计共聚物层的接枝之后，将一层嵌段共聚物沉积在由树脂中的图案限定的空间中。

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