公开(公告)号：NL2003252A

公开(公告)日：2010-03-16

申请号：NL2003252

申请日：2009-07-21

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREY ,  BANINE VADIM ,  IVANOV VLADIMIR ,  LOOPSTRA ERIK ,  KRIVTSUN VLADIMIR

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.

公开(公告)号：NL2003306A1

公开(公告)日：2010-02-16

申请号：NL2003306

申请日：2009-07-29

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREY ,  BANINE VADIM ,  MOORS ROEL ,  SJMAENOK LEONID

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：NL2003158A1

公开(公告)日：2010-01-12

申请号：NL2003158

申请日：2009-07-09

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  HERPEN MAARTEN VAN ,  BANINE VADIM ,  YAKUNIN ANDREY ,  JAK MARTIN

IPC: G03F7/20 ,  G02B5/20

公开(公告)号：NL2002908A1

公开(公告)日：2009-12-07

申请号：NL2002908

申请日：2009-05-20

Applicant: ASML NETHERLANDS BV

Inventor： GLUSHKOV DENIS ,  BANINE VADIM ,  MOORS ROEL ,  SJMAENOK LEONID ,  SALASCHENKO NIKOLAI

IPC: G03F7/20 ,  G01B5/08