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1.发明申请SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开源收集器件，光刻设备和器件制造方法
公开(公告)号：WO2013107686A2
公开(公告)日：2013-07-25
申请号：PCT/EP2013050406
申请日：2013-01-10
Applicant: ASML NETHERLANDS BV
Inventor： YAKUNIN ANDREI , BANINE VADIM , MOORS ROEL , VAN SCHOOT JAN , VERHAGEN MARTINUS , FRIJNS OLAV , KRIVTSUN VLADIMIR , SWINKELS GERARDUS , RIEPEN MICHEL , SCHIMMEL HENDRIKUS , MEDVEDEV VIACHESLAV
IPC: G03F7/20
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G21K1/067 , G21K2201/064 , H05G2/008
Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma- forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.
Abstract translation: 源极集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。
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2.发明申请OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH OPTICAL ELEMENT AND METHOD FOR MAKING THE OPTICAL ELEMENT 审中-公开用于光刻设备的光学元件，包括这种光学元件的光刻设备和用于制造光学元件的方法
公开(公告)号：WO2010015508A3
公开(公告)日：2010-04-01
申请号：PCT/EP2009059398
申请日：2009-07-22
Applicant: ASML NETHERLANDS BV , SJMAENOK LEONID , BANINE VADIM , MOORS ROEL , GLUSHKOV DENIS , YAKUNIN ANDREI MIKHAILOVICH
Inventor： SJMAENOK LEONID , BANINE VADIM , MOORS ROEL , GLUSHKOV DENIS , YAKUNIN ANDREI MIKHAILOVICH
IPC: G03F7/20
CPC classification number: G03F7/70958 , G03F7/70191 , G03F7/702 , G03F7/70308 , G03F7/70575 , G03F7/70916
Abstract: A lithographic apparatus include an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation. The oriented carbon nanotube sheet may be used per se as optical element, and may be designed to reduce debris and/or improve the ratio of EUV/non-desired radiation. The sheet, due to its strength, does not necessarily need a support. The optical element of the invention may be unsupported.
Abstract translation: 光刻设备包括包含定向碳纳米管片的光学元件。 光学元件的元件厚度在约20-500nm的范围内，并且在EUV辐射的垂直照射下具有用于具有在约1-20nm范围内的波长的至少约20％的EUV辐射的透射率。 取向的碳纳米管片本身可以用作光学元件，并且可以设计成减少碎片和/或改善EUV /非期望辐射的比率。 由于其强度，该片材不一定需要支撑。 本发明的光学元件可以不被支撑。
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3.发明申请ILLUMINATION SYSTEM FOR A WAVELENGTH = 193 NM, COMPRISING SENSORS FOR DETERMINING THE ILLUMINATION 审中-公开照明系统用于波长<= 193 nm的传感器，用于确定所述照明
公开(公告)号：WO2004031854A2
公开(公告)日：2004-04-15
申请号：PCT/EP0310605
申请日：2003-09-24
Applicant: ZEISS CARL SMT AG , ASML NETHERLANDS BV , SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
Inventor： SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
CPC classification number: G03F7/7085 , G03F7/70141 , G03F7/70558
Abstract: The invention relates to an illumination system for wavelengths
Abstract translation: 本发明涉及一种用于波长的照明系统<= 193纳米，其中所述照明系统包括一个光源，其提供可用的预定照明在一个平面和a）用第一光栅元件，其特征在于，所述第一光栅元件被布置在支撑元件上和第一光学部件 所述第一光学部件被布置在或在其上提供照明的平面附近。 本发明的特征在于：i）中设置在第一光学元件的至少一个传感器，用于在承载元件上的检测入射光的支撑元件上。 ⅱ）的照明系统的反射镜由传感器信号，使得Beleuctung的位置和强度被保持恒定的评价提供。
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公开(公告)号：NL2006604A
公开(公告)日：2011-06-09
申请号：NL2006604
申请日：2011-04-14
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , BOEIJ WILHELMUS , DIJSSELDONK ANTONIUS , LOOPSTRA ERIK , MOORS ROEL , SCHOOT JAN , SWINKELS GERARDUS , YAKUNIN ANDREI
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5.发明专利
公开(公告)号：AU2003277893A8
公开(公告)日：2004-04-23
申请号：AU2003277893
申请日：2003-09-24
Applicant: ASML NETHERLANDS BV , ZEISS CARL SMT AG
Inventor： SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
IPC: G03F7/20
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Patent Agency Ranking
公开(公告)号：NL2003310A1
公开(公告)日：2010-02-16
申请号：NL2003310
申请日：2009-07-30
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , LOOPSTRA ERIK , MOORS ROEL
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公开(公告)号：NL2010108A
公开(公告)日：2013-07-22
申请号：NL2010108
申请日：2013-01-10
Applicant: ASML NETHERLANDS BV
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公开(公告)号：NL2003256A1
公开(公告)日：2010-02-09
申请号：NL2003256
申请日：2009-07-22
Applicant: ASML NETHERLANDS BV
Inventor： SJMAENOK LEONID , BANINE VADIM , MOORS ROEL , GLUSHKOV DENIS , YAKUNIN ANDREY
IPC: G03F7/20
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公开(公告)号：NL2003306A1
公开(公告)日：2010-02-16
申请号：NL2003306
申请日：2009-07-29
Applicant: ASML NETHERLANDS BV
Inventor： YAKUNIN ANDREY , BANINE VADIM , MOORS ROEL , SJMAENOK LEONID
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公开(公告)号：NL2002908A1
公开(公告)日：2009-12-07
申请号：NL2002908
申请日：2009-05-20
Applicant: ASML NETHERLANDS BV
Inventor： GLUSHKOV DENIS , BANINE VADIM , MOORS ROEL , SJMAENOK LEONID , SALASCHENKO NIKOLAI
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