公开(公告)号：JPH04324658A

公开(公告)日：1992-11-13

申请号：JP9437791

申请日：1991-04-24

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  EBINUMA RYUICHI ,  HARA SHINICHI ,  MARUMO KOJI

IPC: H01L21/683 ,  H01L21/68

Abstract: PURPOSE:To obtain an equipment wherein contact thermal resistance between a wafer and a wafer sucking surface is reduced, and improve pattern transfer precision, by dispersedly arranging elastic members on a wafer suction surface which members are composed of materials having an elastic modulus smaller than the wafer and main structure member. CONSTITUTION:Elastic members 3 composed of material having an elastic modulus smaller than that of a wafer and a main structure member 1 are dispersely arranged on a wafer suction surface. For example, on the periphery of the main structure member 1 constituted of stainless steel or the like, an outer peripheral wall 1a is formed in a body unified with the member 11, and a plurality of pin-shaped protruding parts 2 having the same heights are highly symmetrically arranged on the surface of the member 1 which surface faces a wafer, so as to be integrated in a body with the member 1. Elastic members 3 composed of silicone rubber or the like are formed on each of the protruding parts 2 so as to surround them, which elastic members slightly protrude from the protruding parts 2 when a wafer is not sucked. The main structure member 1 is equipped with a vacuum suction hole 4 connecting the center part of the surface facing the wafer with a vacuum source.

公开(公告)号：JPH0363485A

公开(公告)日：1991-03-19

申请号：JP19695289

申请日：1989-07-31

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  SAKAMOTO EIJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: F25D9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable an item of which temperature is controlled to be monitored in a high accuracy by a method wherein a pressure loss in a flow passage ranging from an isothermal water supplying means to a plurality of heat exchanging devices of which temperature is controlled is adjusted by an adjusting valve at the supplying part and another adjusting valve at a recovery side. CONSTITUTION:Liquid medium recoverying passages 12, 13 and 14 have adjusting valves 25, 24 and 23 of which flow passage resistance can be adjusted. A pressure loss is divided by arranging the adjusting valves 19 to 21 at the supplying side, a pressure and a flow rate at the heat exchanging segments 6, 7 and 8 are separately set and the pressures at each of the heat exchanging segments 6, 7 and 8 become substantially the same. With such an arrangement, a temperature increase caused by a pressure loss energy becomes the same degree and temperatures of liquid medium at each of the heat exchanging segments becomes equal to each other. An external part of a room where a temperature controlled item is mounted is provided with a heating part of an isothermal liquid medium supplying means to reduce a temperature variation caused by an external influence on the temperature controlled item.

公开(公告)号：JPH02100311A

公开(公告)日：1990-04-12

申请号：JP25299188

申请日：1988-10-06

Applicant: CANON KK

Inventor： UZAWA SHUNICHI ,  KARIYA TAKUO ,  HIGOMURA MAKOTO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  AMAMIYA MITSUAKI ,  SAKAMOTO EIJI ,  ABE NAOTO ,  SAITO KENJI

IPC: G21K1/06 ,  G03F7/20 ,  G03F9/00 ,  G21K5/02 ,  G21K5/04 ,  G21K5/10 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To reduce influence of a particle and contamination by adopting a vertical-type transfer mechanism and a vertical-type exposure stage corresponding to an SOR-X-ray light source and by adopting the transfer of a mask and a wafer within a complete sealed environment. CONSTITUTION:A stage device 1301 maintains a wafer vertically for light axis of SOR(Synchrotron Orbital Radiation) light, has a positioning resolution which is equal to or less than 0.01mum, and moves the wafer three-dimensionally. In this case, an exposure unit is covered with a main chamber which is filled with a highly pure helium with a purity of approximately 99.99% or more inside. Then, the stage device 1301 for retaining the mask 2 and the wafer 3, a wafer supply/collection device 1303 for supplying or collecting the wafer, a mask transfer device 1311 for transferring the mask between a mask cassette 1310 and the mask stage are housed within that environment. It secures a high accuracy and neither generate garbage nor generate waste time.

公开(公告)号：JPH0267745A

公开(公告)日：1990-03-07

申请号：JP21852188

申请日：1988-09-02

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  HARA SHINICHI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683

Abstract: PURPOSE:To decrease resistance to convected heat of a wafer for preventing thermal deformation thereof by providing, for the purpose of securing the wafer, means for holding the wafer by electrostatic attraction as well as means for holding the wafer by suction. CONSTITUTION:An apparatus body 2 consists of ceramics such as Al2O3 or SiC, or a metal such as SUS or Al. An insulating layer 3 consists of a material having high dielectric constant such as Al2O3 or the like. A wafer 1 is mounted on the insulating layer 3 whereby a contact face is defined between the wafer and the insulating layer. The contact face is provided with suction grooves 4 which are connected to a vacuum source through a vacuum pipe 14 and a vacuum sunction port 5. An electrode 8 is provided under the insulating layer 3. When a high voltage is applied to the electrode 8, electrostatic attracting force is generated between the electrode 8 and the wafer 1, whereby the wafer 1 is attracted to the insulating layer 3 while it is also held by suction. In this manner, the wafer can be held securely.

公开(公告)号：JPS62198898A

公开(公告)日：1987-09-02

申请号：JP4127386

申请日：1986-02-26

Applicant: CANON KK

Inventor： INOUE YUJI ,  SAKAMOTO EIJI ,  OSADA YOSHIYUKI

IPC: G02F1/136 ,  G02F1/133 ,  G02F1/1368 ,  G09G3/36

公开(公告)号：JPS62108206A

公开(公告)日：1987-05-19

申请号：JP24699985

申请日：1985-11-06

Applicant: CANON KK

Inventor： MURATA TATSUO ,  KAMIO MASARU ,  TAKAO HIDEAKI ,  MOTOI YASUKO ,  SAKAMOTO EIJI ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G03F7/00 ,  G03F9/00 ,  H01L27/14

Abstract: PURPOSE:To reduce the defect in appearance and a production cost of the titled filter by forming simultaneously a coloring matter layer and an alignment mark having the same coloring matter to that of said coloring matter layer through a pattern photoresist layer, and then by repeating a step of forming a next coloring matter layer through said mark. CONSTITUTION:The photoresist pattern 2 is formed by coating a substrate 1 with the photoresist, and then exposing it through a mask 7 comprising a transmitting part 10, a transmitting part 11 for forming a mask and a shade part 9 followed by dissolving only an exposed part with a developer to remove said resist part. And then, the 1st coloring matter layer is laminated on the photoresist pattern 2, and then said resist pattern is removed, thereby forming the pattern 4 of the 1st coloring matter and the alignment mark 12 having the same coloring matter to that of the 1st coloring matter layer. The 2nd coloring matter layer is formed by repeating a prescribed step after positioning of the mark 7 through the mark 12. Similarly, the plural coloring matter layers are laminated with each other by repeating the prescribed step.

公开(公告)号：JPS62108204A

公开(公告)日：1987-05-19

申请号：JP24699785

申请日：1985-11-06

Applicant: CANON KK

Inventor： MOTOI YASUKO ,  TAKAO HIDEAKI ,  KAMIO MASARU ,  SAKAMOTO EIJI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G02B5/22 ,  H01L27/14 ,  H04N9/04

Abstract: PURPOSE:To obtain the titled filter having a deposited red coloring layer which has excellent properties of spectral characteristics, thermal resistance, and solvent resistance by patternwisely forming the layer contg. a red coloring matter deposited a specific magenta and yellow coloring matters on a substrate. CONSTITUTION:The resist pattern 2 is formed on the substrate 1 to form a mask. The coloring matter layer 3 is formed by depositing the magenta coloring matter of quinacridone type and the yellow coloring matter of isoindolinone type or the magenta coloring matter of quinacridone type and the yellow coloring matter of an anthraquinone type using said mask. The layer 4 contg. the red coloring matter of the stripe pattern type is formed by removing the resist pattern 2 and the layer 3 thereon, by dipping said substrate in a solvent which does not dissolve the coloring matter to obtain the titled filter. The titled filter may be provided with a protective layer.

公开(公告)号：JPS6283701A

公开(公告)日：1987-04-17

申请号：JP22349585

申请日：1985-10-09

Applicant: CANON KK

Inventor： SEKIMURA NOBUYUKI ,  TAKAO HIDEAKI ,  KAMIO MASARU ,  MOTOI YASUKO ,  SAKAMOTO EIJI ,  MURATA TATSUO

IPC: G02B5/20 ,  G02F1/133 ,  G02F1/1335 ,  H01L27/14 ,  H04N9/04

Abstract: PURPOSE:To avert the adverse influence on the display grade of an effective picture element part and sensor by simultaneously forming a dye layer pattern within the effective picture element part which is the required part as a color filter and the outside contiguous to the effective picture element part. CONSTITUTION:The photoresist 2 is laminated on a substrate 1 and not only the photoresist 2 in the effective picture element part 7 but also the photoresist 2 on the outside thereof are subjected to pattern exposure through a mask 8. The photoresist 2 is dissolved away by a dissolving liquid and the unnecessary dye layer 3 is simultaneously removed to form the 1st dye layer pattern 4 to the prescribed point in the effective picture element part 7 and the outside thereof. Since the photoresist is patterned even to the outside of the effective picture element part 7, the pattern of the photoresist in the outermost shell part of the effective picture element part 7 is not said to be larger in area than the pattern of the other parts and therefore, the remaining of the intrinsically unnecessary residue of the dye layer in the effective picture element part 7 is obviated. The brightness, color purity and S/N ratio are thereby improved without the adverse influence on the sensor, etc.

公开(公告)号：JPS61172102A

公开(公告)日：1986-08-02

申请号：JP18652884

申请日：1984-09-07

Applicant: CANON KK

Inventor： KAMIO MASARU ,  MOTOI YASUKO ,  SAKAMOTO EIJI ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  H01L27/14 ,  H01L27/146 ,  H04N9/04

Abstract: PURPOSE:To provide simplified stages, reduced number of stages, reduced cost of production and improved yield of production by executing simultaneously the formation of a resist pattern for forming a colored pattern and the lifting-off of the unnecessary part of the previously formed colored layer. CONSTITUTION:The dye of the 1st color is deposited by evaporation on a substrate 1 formed with the resist pattern 2' by subjecting the resist to pattern exposure through an exposing mask 3 and dissolving away selectively the resist from above the substrate 1 by using a developing soln., by which the colored layer 4 is formed. A resist film 5 is formed on the layer 4 by using a similar material and thereafter the resist film 5 is patterned by using an exposing mask 6; at the same time the unnecessary part of the layer 4 is partly removed from the substrate 1. The colored layer 4 is laminated by using the dye of the 2nd color over the entire surface. A resist film 8 is laminated on the layer 7. A resist pattern 8' is similarly formed thereon. The unnecessary parts of the layer 4 of the 1st color and the layer 7 of the 2nd color are also partly and selectively removed from the substrate at the same time in this stage. The dye is deposited by evaporation over the entire surface of the substrate 1 and the colored layer 10 is laminated thereon. The resist patterns 8', 5' on the substrate 1 are selectively removed from the substrate surface.

公开(公告)号：JPS6052571A

公开(公告)日：1985-03-25

申请号：JP15905383

申请日：1983-09-01

Applicant: CANON KK

Inventor： OOYAMA YASUKO ,  SAKAMOTO EIJI ,  YOKONO KOUJIROU

IPC: C23C14/04 ,  H01L21/203 ,  H01L21/285 ,  H01L21/31

Abstract: PURPOSE:To form a pattern having high quality on a substrate on which a rugged pattern is formed by disposing said substrate obliquely with the plane perpendicular to a vapor deposition source and subjecting the substrate to vapor deposition then removing the rugged pattern. CONSTITUTION:An evaporating material 5 is loaded in a boat 6 having a resistance heating means in a bell-jar 4. On the other hand, a substrate 7 on which a rugged pattern 2 is formed by using an under-mask is disposed with inclination by about >=5 deg., more preferably 10-40 deg. angle of inclination with the plane 8 perpendicular to an evaporating source. The inside of the bell-jar 4 is evacuated in this state to evaporate the material 5 by heating, thereby forming the layer deposited by evaporation on the substrate 7. The layer which is deposited by evaporation and is obtd. by the above-mentioned method does not continuously cover the one side face in the stepped part of the under-mask 2 and the layer above the mask 2 is simultaneously removed in the stage of dissolving and removing the mask, by which the pattern having a desired shape is formed on the substrate 7.