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265 records (took 0.023 seconds)

    81.
    发明专利
    未知

    公开(公告)号：DE68923576T2

    公开(公告)日：1996-01-25

    申请号：DE68923576

    申请日：1989-05-11

    Applicant: CANON KK

    Inventor： HARA SHINICHI ,  UZAWA SHUNICHI

    IPC: G12B5/00 ,  F16F15/02 ,  G03F7/20 ,  G05D19/02 ,  G12B9/08 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/687 ,  H01L41/04

    Abstract: A workpiece supporting mechanism suitably usable in an exposure apparatus, is disclosed. The mechanism includes a workpiece (1) supporting member (2) which is provided with a displacement sensor such as a speed sensor or an acceleration sensor (6). A vibrator (7) such as a piezoelectric device is added to the supporting member or a stage which supports the supporting member. Any vibration of the workpiece or the supporting member is detected by the displacement sensor (6) and, in accordance with the detection, the vibrator (7) is energized to cancel the vibration of the workpiece and the workpiece supporting member.

    83.
    发明专利
    未知

    公开(公告)号：DE68923638T2

    公开(公告)日：1996-01-18

    申请号：DE68923638

    申请日：1989-03-28

    Applicant: CANON KK

    Inventor： AMEMIYA MITSUAKI ,  UZAWA SHUNICHI

    IPC: G03F1/00

    Abstract: A method and apparatus for inspecting and repairing a mask usable in manufacture of semiconductor microcircuits, by using an electron beam is disclosed. The inspection and repair of a mask pattern are made in a single apparatus, by using a controlled current of electron beam. For inspection, the surface of a mask (4) having a mask pattern (3) and a radiation-sensitive layer (5), covering it, is scanned with an electron beam (6) and, by detecting (7) secondary electrons or reflected electrons caused at that time, the state of the pattern is inspected. If any defect is detected (12-15), the portion of the radiation-sensitive layer on the detected defect is irradiated with an electron beam of greater magnitude than that for the inspection and, thereafter, the exposed portion of the radiation-sensitive layer is removed. Then, etching or plating is made to the thus uncovered portion, whereby repair of the mask pattern is made.

    84.
    发明专利
    未知

    公开(公告)号：DE69110698T2

    公开(公告)日：1995-12-21

    申请号：DE69110698

    申请日：1991-02-08

    Applicant: CANON KK

    Inventor： TANAKA YUTAKA ,  OZAWA KUNITAKA ,  KARIYA TAKAO ,  UZAWA SHUNICHI

    IPC: F16K3/18 ,  H01L21/027

    Abstract: A gate valve device including a partition wall (41) having an opening (13); a valve member (14) movable along the partition wall to openably close the opening; a driving system means for moving the valve member (14); and a pressing mechanism (26) for pressing the valve member toward the partition wall, the pressing mechanism having a pressing member (33) projectable toward and retractable from the valve member, wherein the pressing mechanism presses the valve member against the partition wall when the valve member is in a position closing the opening.

    85.
    发明专利
    未知

    公开(公告)号：DE69023186D1

    公开(公告)日：1995-11-30

    申请号：DE69023186

    申请日：1990-08-06

    Applicant: CANON KK

    Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  MIZUSAWA NOBUTOSHI ,  SUDA SHIEGEYUKI ,  NOSE NORIYUKI ,  KARIYA TAKAO

    IPC: G03F7/20 ,  G03F9/00

    Abstract: An exposure apparatus for printing a pattern of a mask (2) onto a wafer (3) includes a mask moving mechanism (4) for moving the mask; a wafer moving mechanism (10,11) for moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

    86.
    发明专利
    未知

    公开(公告)号：DE69018556T2

    公开(公告)日：1995-09-07

    申请号：DE69018556

    申请日：1990-09-19

    Applicant: CANON KK

    Inventor： NOSE NORIYUKI ,  EBINUMA RYUICHI ,  OZAWA KUNITAKA ,  KARIYA TAKAO ,  UZAWA SHUNICHI

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An exposure apparatus includes a light source for exposing a wafer (2) through a mask (1); a light blocking device (4) being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system (6) for detecting positional deviation between the mask and the wafer; and a drive control system (31,61) for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

    89.
    发明专利
    未知

    公开(公告)号：DE68915239T2

    公开(公告)日：1994-09-08

    申请号：DE68915239

    申请日：1989-10-04

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An X-ray exposure system, for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask (1) and the wafer (46) are held on a main frame (4) so that their surfaces extend substantially in parallel to a vertical axis. The main frame suspends from a supporting frame (10) through a plurality of air mounts (7) each being displaceable vertically. The supporting frame is placed on the same reference surface as of a SOR ring (17) that produces synchrotron radiation (20). By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.

    IMAGE TRANSMISSION APPARATUS
    90.
    发明专利
    IMAGE TRANSMISSION APPARATUS 未知

    公开(公告)号：GB2108801B

    公开(公告)日：1985-12-04

    申请号：GB8228796

    申请日：1982-10-08

    Applicant: CANON KK

    Inventor： UZAWA SHUNICHI ,  MORI TETSUZO ,  KOUMURA NOBORU

    IPC: H04N1/32 ,  H04B9/00 ,  B41L19/00

    Abstract: An image transmission apparatus for light-signal image transmission is easy to install and relocate and ensures reliable transmission between a plurality of readers in remote locations and a central recorder. Each reader provides data signals and command signals for controlling the operation of the recorder from the quantized image data of an original. The amplified and frequency-modulated signals proceded by image or command header signals are transmitted to the recorder. A signal intensity from the reader may be discriminated to be above a minimum acceptable level before being recorded, with an indicator of a recorder provided to warn an operator of an unacceptable low level, thereby preventing low-quality recording; a recording state may be indicated to the operator by a lamp or a buzzer. The recorder may further have a transmission request register and a priority encoder for resolving a contention arising when two or more readers simultaneously request service, by generating and assigning priority codes to each reader. The priority codes may be either predetermined, for example, so as to give one reader emergency priority over all other readers, or may be arbitrarily set according to demand.

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