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    EXPOSURE APPARATUS AND EXPOSURE METHOD
    82.
    发明公开
    EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
    曝光装置和曝光方法

    公开(公告)号：EP3096344A3

    公开(公告)日：2017-02-01

    申请号：EP16157112.0

    申请日：2016-02-24

    Applicant: ADVANTEST CORPORATION

    Inventor： YAMADA, Akio ,  SEYAMA, Masahiro ,  NASUNO, Hideki

    IPC: H01J37/317

    CPC classification number: H01J37/3045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/15 ,  H01J2237/2025 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/31766 ,  H01J2237/31774

    Abstract: Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage.
    Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.

    Abstract translation: 目标：通过减少舞台的移动误差，使用带电粒子束形成复杂而精细的图案。 用于实现该目的的手段：一种曝光装置，包括：束生成部，生成带电粒子束; 台部（110），其具有安装在其上的样品（10）并相对于所述束产生部移动所述样品; 检测部（114），其检测台部的位置; 预测部（1000），基于检测出的所述载物台部的位置，生成通过预测所述载物台部的驱动量而得到的预测驱动量; 以及照射控制部（170），基于预测的驱动量，进行用于照射带电粒子束的试样的照射控制。 还提供了一种曝光方法。

    PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM
    83.
    发明公开
    PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM 审中-公开
    带电粒子光刻系统中的邻近效应修正

    公开(公告)号：EP3108495A1

    公开(公告)日：2016-12-28

    申请号：EP15708900.4

    申请日：2015-02-19

    Applicant: Mapper Lithography IP B.V.

    Inventor： WIELAND, Marco Jan-Jaco

    IPC: H01J37/317

    CPC classification number: H01J37/3174 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/31769

    Abstract: The invention relates to a method for performing charged particle beam proximity effect correction, comprising the steps of: receiving a digital layout pattern to be patterned onto a target using one or more charged particle beams; selecting a base proximity function comprising a sum of an alpha and a beta proximity function, wherein said alpha proximity function models a short range proximity effect and said beta proximity function models a long range proximity effect, wherein a constant &eegr; is defined as a ratio between the beta proximity function and the alpha proximity function in said sum, with 0

    Abstract translation: 本发明涉及一种用于执行带电粒子束邻近效应校正的方法，包括以下步骤：使用一个或多个带电粒子束接收要被图案化到目标上的数字布局图案; 选择包括α和β接近函数之和的基本接近函数，其中所述α接近函数模拟短距离邻近效应并且所述β接近函数模拟长距离邻近效应，其中常数η被定义为 所述总和中的β接近度函数和α接近度函数，其中0 <η<1; 确定对应于所述基本邻近效应函数的修改的接近函数，其中所述α接近函数已经被狄拉克德尔塔函数代替，并且使用电子处理器，执行所述数字布局图案与所述修改的接近函数的解卷积以产生校正的 布局模式。

    EXPOSURE APPARATUS AND EXPOSURE METHOD
    84.
    发明公开
    EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
    BELICHTUNGSVORRICHTUNG UND BELICHTUNGSVERFAHREN

    公开(公告)号：EP3096344A2

    公开(公告)日：2016-11-23

    申请号：EP16157112.0

    申请日：2016-02-24

    Applicant: ADVANTEST CORPORATION

    Inventor： YAMADA, Akio ,  SEYAMA, Masahiro ,  NASUNO, Hideki

    IPC: H01J37/317

    CPC classification number: H01J37/3045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/15 ,  H01J2237/2025 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/31766 ,  H01J2237/31774

    Abstract: Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage.
    Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.

    Abstract translation: 目的：通过减少一个阶段的运动误差，使用带电粒子束形成复杂和精细的图案。 实现目的的手段：一种曝光装置，包括产生带电粒子束的光束产生部分; 具有安装在其上的样品（10）的台阶段（110），并使样本相对于束生成部分移动; 检测部，其检测所述台部的位置; 预测部（1000），其基于所述舞台部的检测位置生成预测所述舞台部的驱动量而获得的预测驱动量; 以及照射控制部（170），其根据预测的驱动量，对带电粒子束照射样品进行照射控制。 还提供了曝光方法。

    Charged particle energy filter
    86.
    发明公开
    Charged particle energy filter 有权
    对于带电粒子束的能量过滤器

    公开(公告)号：EP2592642A3

    公开(公告)日：2015-08-26

    申请号：EP12191522.7

    申请日：2012-11-07

    Applicant: FEI COMPANY

    Inventor： Parker, William ,  Hughes, Wesley

    IPC: H01J37/305 ,  H01J37/05

    CPC classification number: H01J37/05 ,  H01J37/3056 ,  H01J2237/043 ,  H01J2237/057 ,  H01J2237/1534

    Abstract: A multi-element electrostatic chicane energy filter (300) , with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements (302, 304, 306, 308). A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture (310) reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.

    METHOD AND APPARATUS FOR GENERATING ELECTRON BEAMS
    87.
    发明公开
    METHOD AND APPARATUS FOR GENERATING ELECTRON BEAMS 有权
    Verwendung einer Plasma-Elektronenquellefür添加剂Fertigung

    公开(公告)号：EP2847782A2

    公开(公告)日：2015-03-18

    申请号：EP13718588.0

    申请日：2013-04-25

    Applicant: ARCAM AB

    Inventor： SVENSSON, Mattias ,  LJUNGBLAD, Ulric

    IPC: H01J37/077 ,  B29C67/00

    CPC classification number: H01J29/52 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  H01J37/077 ,  H01J37/305 ,  H01J37/3178 ,  H01J2237/043 ,  H01J2237/3128 ,  H01J2237/31732

    Abstract: Various embodiments of the present invention relate to a plasma electron source apparatus. The apparatus comprises a cathode discharge chamber in which a plasma is generated, an exit hole provided in said cathode discharge chamber from which electrons from the plasma are extracted by an accelerating field provided between said cathode discharge chamber and an anode, at least one plasma confinement device, and a switching mechanism for switching the at least one plasma confinement device between a first value allowing for electron extraction from the plasma and a second value prohibiting electron extraction from the plasma. Associated methods are also provided.

    Abstract translation: 本发明的各种实施方式涉及等离子体电子源装置。 该装置包括：阴极放电室，其中产生等离子体;设置在所述阴极放电室中的出射孔，来自等离子体的电子由所述阴极放电室和阳极之间的加速场提取，至少一个等离子体限制 装置和切换机构，用于在允许从等离子体提取电子的第一值和禁止从等离子体中提取电子的第二值之间切换至少一个等离子体约束装置。 还提供了相关方法。

    Scanning particle beam instrument
    89.
    发明公开
    Scanning particle beam instrument 有权
    粒子束扫描仪

    公开(公告)号：EP1632980A3

    公开(公告)日：2008-07-23

    申请号：EP05018964.6

    申请日：2005-08-31

    Applicant: Carl Zeiss SMT Limited

    Inventor： Armit, Andrew Philip

    IPC: H01J37/244 ,  H01J37/28 ,  H01J37/26 ,  H04N5/57

    CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/1501 ,  H01J2237/2487 ,  H01J2237/2826

    Abstract: A scanning particle beam instrument (10) is provided, the instrument including a scanner (30,32), a radiation detector (34) and a DC amplifier (36), the DC amplifier being operable to amplify a signal generated by the radiation detector (34) to produce a video signal, the instrument further including a controller (38) operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.

    Scanning particle beam instrument
    90.
    发明公开
    Scanning particle beam instrument 有权
    Teilchenstrahl-光栅仪

    公开(公告)号：EP1632980A2

    公开(公告)日：2006-03-08

    申请号：EP05018964.6

    申请日：2005-08-31

    Applicant: Carl Zeiss SMT Limited

    Inventor： Armit, Andrew Philip

    IPC: H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/1501 ,  H01J2237/2487 ,  H01J2237/2826

    Abstract: A scanning particle beam instrument (10) is provided, the instrument including a scanner (30,32), a radiation detector (34) and a DC amplifier (36), the DC amplifier being operable to amplify a signal generated by the radiation detector (34) to produce a video signal, the instrument further including a controller (38) operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.

    Abstract translation: 提供了一种扫描粒子束仪器（10），该仪器包括扫描器（30,32），辐射探测器（34）和DC放大器（36），该DC放大器可操作以放大由辐射探测器 （34）产生视频信号，所述仪器还包括控制器（38），所述控制器可操作以使所述光束相对于样本引导，或者确定所述光束何时相对于样本如此定向，所述实际视频信号由 可以将DC放大器与期望的视频信号进行比较，以比较实际和期望的视频信号并调整DC放大器的DC偏移，从而减小信号之间的差异。 还提供了使用这种仪器产生视频信号的方法。

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