Abstract:
Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage. Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
Abstract:
The invention relates to a method for performing charged particle beam proximity effect correction, comprising the steps of: receiving a digital layout pattern to be patterned onto a target using one or more charged particle beams; selecting a base proximity function comprising a sum of an alpha and a beta proximity function, wherein said alpha proximity function models a short range proximity effect and said beta proximity function models a long range proximity effect, wherein a constant &eegr; is defined as a ratio between the beta proximity function and the alpha proximity function in said sum, with 0
Abstract:
Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage. Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
Abstract:
A multi-element electrostatic chicane energy filter (300) , with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements (302, 304, 306, 308). A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture (310) reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.
Abstract:
Various embodiments of the present invention relate to a plasma electron source apparatus. The apparatus comprises a cathode discharge chamber in which a plasma is generated, an exit hole provided in said cathode discharge chamber from which electrons from the plasma are extracted by an accelerating field provided between said cathode discharge chamber and an anode, at least one plasma confinement device, and a switching mechanism for switching the at least one plasma confinement device between a first value allowing for electron extraction from the plasma and a second value prohibiting electron extraction from the plasma. Associated methods are also provided.
Abstract:
The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.
Abstract:
A scanning particle beam instrument (10) is provided, the instrument including a scanner (30,32), a radiation detector (34) and a DC amplifier (36), the DC amplifier being operable to amplify a signal generated by the radiation detector (34) to produce a video signal, the instrument further including a controller (38) operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.
Abstract:
A scanning particle beam instrument (10) is provided, the instrument including a scanner (30,32), a radiation detector (34) and a DC amplifier (36), the DC amplifier being operable to amplify a signal generated by the radiation detector (34) to produce a video signal, the instrument further including a controller (38) operable to so direct the beam relative to a specimen, or to determine when the beam is so directed relative to a specimen, that an actual video signal produced by the DC amplifier may be compared with a desired video signal, to compare actual and desired video signals and to adjust a DC offset of the DC amplifier so as to reduce a difference between the signals. Also provided is a method of producing a video signal using such an instrument.