-
公开(公告)号:KR101568469B1
公开(公告)日:2015-11-11
申请号:KR1020130082873
申请日:2013-07-15
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: H01L21/02101 , B08B7/0021 , H01L21/02041 , H01L21/02057 , H01L21/67017 , H01L21/67051 , H01L21/67109
Abstract: 본발명은, 기판을처리용기에반입할때까지의건조방지용불소함유유기용제의휘발및 처리용기내에있어서의불소함유유기용제의분해를억제할수 있는기판처리방법등을제공하는것을목적으로한다. 표면이제1 불소함유유기용제에의해덮인기판(W)을처리용기(31) 내에반입하고, 이처리용기(31)에, 비점이제1 불소함유유기용제보다낮은제2 불소함유유기용제를원료로하는고압유체를공급한다. 그리고처리용기(31) 내에상기제1 불소함유유기용제와제2 불소함유유기용제의혼합물의고압유체분위기를형성하여, 기판의표면을덮는제1 불소함유유기용제를제거하고, 처리용기(31) 내의유체를고압유체또는기체의상태로배출하여건조시킨기판(W)을얻는다.
-
公开(公告)号:KR1020140011269A
公开(公告)日:2014-01-28
申请号:KR1020130082873
申请日:2013-07-15
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: H01L21/02101 , B08B7/0021 , H01L21/02041 , H01L21/02057 , H01L21/67017 , H01L21/67051 , H01L21/67109
Abstract: The purpose of the present invention is to provide a substrate processing method etc. capable of suppressing the volatilization of a fluorine-containing organic solvent for dry prevention until a substrate is carried into a processing container, and the decomposition of the fluorine-containing organic solvent within the processing container. A substrate (W) in which the surface is covered by a first fluorine-containing organic solvent is carried into a processing container (31). A high pressure fluid made of a second fluorine-containing organic solvent in which the boiling point is lower than the first fluorine-containing organic solvent is provided to the processing container (31). A high pressure fluid condition of a compound of the first and second fluorine-containing organic solvents is formed within the processing container (31). The first fluorine-containing organic solvent which covers the surface of the substrate is removed. A dried substrate (W) is obtained by discharging the fluid within the processing container (31) as the state of the high pressure fluid or gas. [Reference numerals] (321) Feeding unit; (5) Control unit
Abstract translation: 本发明的目的是提供一种能够抑制用于干燥的含氟有机溶剂的挥发直到基材被运送到处理容器中的基板处理方法等,并且含氟有机溶剂的分解 在处理容器内。 表面被第一含氟有机溶剂覆盖的基板(W)被携带到处理容器(31)中。 将由沸点低于第一含氟有机溶剂的第二含氟有机溶剂制成的高压流体提供给处理容器(31)。 第一和第二含氟有机溶剂的化合物的高压流体状态形成在处理容器(31)内。 除去覆盖基材表面的第一含氟有机溶剂。 通过将处理容器(31)内的流体作为高压流体或气体的状态排出来获得干燥的基材(W)。 (附图标记)(321)进给单元; (5)控制单元
-