公开(公告)号：KR100311077B1

公开(公告)日：2001-11-02

申请号：KR1019990046227

申请日：1999-10-23

Applicant: 삼성전자주식회사

Inventor： 조대식 ,  채희선 ,  김석현 ,  동승훈 ,  윤태양 ,  곽도순 ,  강희세 ,  박일석 ,  오재석

IPC: H01L21/66

CPC classification number: G05B19/41875 ,  G05B2219/32077 ,  G05B2219/32198 ,  G05B2219/32263 ,  G05B2219/45031 ,  Y02P90/12 ,  Y02P90/20 ,  Y02P90/22

Abstract: 반도체제조에있어서, 후행공정이선행공정의결과에영향을받는경우, 각로트에대한선행공정의결과에따라, 최적의후행공정장비및/또는후행공정조건을가변적으로적용하는로트디스패칭방법및 이를위한시스템이개시된다. 로트들에대한선행공정의공정결과와복수개의후행공정장비들의성능및/또는특성간의상관성의시스템적인분석결과에기초하여, 선행공정에서가공된각 로트를그의품질개선에최적인후행공정장비로디스패칭한다. 또한, 후행공정의공정조건은선행공정의각 품질등급에대등시켜다수개마련된다. 각공정조건은대응되는품질등급과목표품질간의오차를최소화할수 있는특성을갖는다. 디스패칭대기중인로트의품질을시스템적으로분석하여그 품질개선에최적인공정조건을적용하여후행공정을수행한다. 제품규격을만족하지만제품규격보다엄격한관리기준을만족하지않은로트들은전자의방법에따라처리하고, 관리기준을만족하는로트들은후자의방법에따라처리한다. 최적의공정장비와공정조건을적용하여후행공정이수행되므로선행공정에서발생한공정오차가후행공정에서더욱개선되어공정능력과수율향상을가져다준다.

公开(公告)号：KR1019990012325A

公开(公告)日：1999-02-25

申请号：KR1019970035674

申请日：1997-07-29

Applicant: 삼성전자주식회사

Inventor： 김성근 ,  민병롱 ,  박일석 ,  전희식

IPC: H01L21/00

Abstract: 본 발명은 반도체 제조공정 제어방법에 관한 것으로, 본 발명에서는 설비 콘트롤러에 소정 제품에 대한 제품 선별 기준을 미리 설정하고, 이를 통해, 전체 제품들 중 일부의 제품에서만 당해 공정이 진행되도록 함으로써, 제품 전반에 걸친 공정진행에 따른 공정 효율 저하를 미연에 방지할 수 있다.

公开(公告)号：KR1020170032602A

公开(公告)日：2017-03-23

申请号：KR1020150130129

申请日：2015-09-15

Applicant: 삼성전자주식회사

Inventor： 박일석 ,  조형석

IPC: G01N23/225 ,  G06T7/00 ,  H01L21/66

CPC classification number: H01L22/12 ,  G01N21/9501

Abstract: 결함촬상장치및 결함검사방법이개시된다. 촬상장치는위치보정용기준결함(reference defect)과공정결함이정렬된기판을고정하는챔버, 검사좌표계를갖는검사장치에서수득된기준결함및 공정결함의위치인검사위치를촬상좌표계에의한변환위치로변환하고, 자동으로탐색된기준결함의중심위치인자동탐색위치와기준결함에대한변환위치사이의편차인설비오차만큼공정결함의변환위치를자동으로보정하여보정위치를생성하는결함위치제어기, 보정위치로전자빔을주사하고전자빔에대응하여기판으로부터발생된대전입자(charged particles)를검출하여보정위치에대응하는공정결함에대한이미지신호를검출하는이미지신호처리기, 및이미지신호를수득하여공정결함에대한영상이미지를생성하는촬상기를포함한다. 기준결함을이용하여자동으로설비오차를검출하여기판검사공정시간과비용을줄일수 있다.

Abstract translation: 公开了缺陷成像装置和缺陷检查方法。 图像拾取装置将参考缺陷和从测试装置具有腔室产生过程中的缺陷的测试位置的位置，检查坐标定影基于缺陷（参考缺陷）的位置校正和yijeongryeol由摄像基板到转换位置坐标系处理缺陷， 和缺陷的工艺缺陷，作为自动检测位置，以在基于自动故障搜索参考缺陷的重心所转换的位置之间的设备误差的偏差的转换后的位置自动地校正，以产生校正后的位置的位置控制器，校准位置 通过扫描电子束以及相应的电子束检测从所述衬底中产生的，以获得图像信号处理器的带电粒子（带电粒子），并且图像信号，以检测为对应于所述工艺缺陷的正确位置的过程中缺陷的图像信号 和用于生成视频图像的图像拾取装置。 使用参考缺陷可以由设备的错误通过自动减少板检查过程的时间和成本来检测。

公开(公告)号：KR1020010054660A

公开(公告)日：2001-07-02

申请号：KR1019990055557

申请日：1999-12-07

Applicant: 삼성전자주식회사

Inventor： 최승국 ,  박일석 ,  김석현 ,  김제덕

IPC: G06F9/22

Abstract: PURPOSE: A system and a method for yielding process time of CMP(Chemical Mechanical Polishing) process are provided to calculate time consumed in process progress through computation by the system without calculating the process time by an operator. CONSTITUTION: A CMP process equipment(20) performs a polishing process of a wafer, receives condition data of process to be progressed and transmits present process progress state on occasion during wafer process and process completion report data after completion of the process. A front measuring equipment(10) and a rear measuring equipment(40) each arranged in front of and behind the CMP process equipment(20) measure on wafer after the process and before the process and transmit measured data respectively. A control server(30) has connection to the front measuring equipment(10) and the rear measuring equipment(40) via a network unilaterally, receives the measured data from the measuring equipments(10,40), has connection to the CMP process equipment(20) via a network bilaterally, transmits the condition data and receives data related to the process progress from the CMP process equipment(20) to set process progress condition and time of the CMP process equipment(20).

Abstract translation: 目的：提供一种制造CMP（化学机械抛光）工艺过程时间的系统和方法，以通过系统的计算来计算过程进程中消耗的时间，而不需要操作人员计算处理时间。 构成：CMP处理设备（20）执行晶片的抛光处理，接收处理过程的条件数据，并且在晶片处理和处理完成报告数据完成之后偶尔发送当前处理进度状态。 每个布置在CMP处理设备（20）的前面和后面的前测量设备（10）和后测量设备（40）在处理之后和处理之前在晶片上测量并分别发送测量数据。 控制服务器（30）经由网络单方面连接到前测量设备（10）和后测量设备（40），从测量设备（10,40）接收测量数据，具有连接到CMP处理设备 （20）经由网络双向传输条件数据并从CMP处理设备（20）接收与处理过程相关的数据，以设置CMP处理设备（20）的处理进度条件和时间。

公开(公告)号：KR1020160076310A

公开(公告)日：2016-06-30

申请号：KR1020140186370

申请日：2014-12-22

Applicant: 삼성전자주식회사

Inventor： 박일석 ,  안정호 ,  조형석

IPC: H01L21/66

CPC classification number: G06K9/481 ,  G06K9/6201 ,  G06K2009/6213 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01L21/00 ,  H01L22/10 ,  H01L22/12

Abstract: 자동결함분류방법은적어도하나이상의단위공정이수행된기판으로부터결함부들을검출하는결함검출단계및 결함부들각각의결함종류를분류하는결함분류단계를포함하고, 결함분류단계는결함부들각각의 SEM 이미지들을획득하는이미지획득단계와, SEM 이미지들각각에대응되는 GDS 이미지들에기판의정보를등록하는기판정보등록단계와, 결함부들의결함을유형화한복수의 DOI 들을정의하는 DOI 정의단계와, 결함부들각각의결함이 DOI 들중 어떤 DOI에해당하는지를판단하는기준인 DOI 룰을정의하는 DOI 룰정의단계와, DOI 룰에따라결함부들각각의결함이 DOI 들중 어떤 DOI에해당하는지를분류하는이미지분석단계를포함한다.

Abstract translation: 本发明涉及一种用于自动分类缺陷的方法，其可能在高度集成的基板上发生，具有高可靠性。 所述自动缺陷分类方法包括：缺陷检测步骤，从执行至少一个单元处理的基板检测有缺陷的部分; 以及对每个缺陷部分的缺陷类型进行分类的缺陷分类步骤。 缺陷分类步骤包括：图像获取步骤，获得每个缺陷部分的扫描电子显微镜（SEM）图像; 衬底信息登记步骤，用于在与每个SEM图像相对应的图形数据系统（GDS）图像中登记关于衬底的信息; DOI定义步骤，定义分类各个缺陷部分的缺陷的多个感兴趣缺陷（DOI）; DOI规则定义了定义DOI规则的步骤，DOI规则是用于确定DOI的哪个DOI对应于各个缺陷部分的缺陷的标准; 以及图像分析步骤，根据DOI规则，将各个缺陷部分的缺陷分别对应于DOI中的DOI。

公开(公告)号：KR100639672B1

公开(公告)日：2006-10-31

申请号：KR1020000000438

申请日：2000-01-06

Applicant: 삼성전자주식회사

Inventor： 김석현 ,  박일석

IPC: H01L21/027

Abstract: 본 발명은 포토 레지스트 공급 시스템 및 그 제어방법에 관한 것으로서, 더욱 상세하게는 반도체 제조라인내의 포토 레지스트 공급장치에서 포토 레지스트를 수용하는 보틀을 교환할때 발생되는 에러를 방지하기 위한 포토 레지스트 공급 시스템 및 그 제어방법에 관한 것이다.
본 발명에 의하면, 새 보틀로의 교환이후에 새 보틀의 바코드를 읽지 않는 바코드 리드 에러가 발생하면 보틀의 교환을 감지한 보틀 감지 센서에 의해 에러경보가 발생되고, 사용된 보틀이 새 보틀로 오인되어 로딩되면 호스트에 예약된 바코드와의 비교에 의해 에러가 발생된다.
또한, 2개의 보틀을 수용하는 보틀 캐비넷에 설치된 보틀 감지 센서에 의해 교환될 보틀이 정확하게 교환되는지를 감지하여 보틀이 오투입되는 것을 방지한다.
포토 레지스트 공급 시스템

公开(公告)号：KR1020010038300A

公开(公告)日：2001-05-15

申请号：KR1019990046227

申请日：1999-10-23

Applicant: 삼성전자주식회사

Inventor： 조대식 ,  채희선 ,  김석현 ,  동승훈 ,  윤태양 ,  곽도순 ,  강희세 ,  박일석 ,  오재석

IPC: H01L21/66

CPC classification number: G05B19/41875 ,  G05B2219/32077 ,  G05B2219/32198 ,  G05B2219/32263 ,  G05B2219/45031 ,  Y02P90/12 ,  Y02P90/20 ,  Y02P90/22

Abstract: PURPOSE: A method for dispatching a lot which variably adopts optimum subsequent processing equipment and/or subsequent process condition according to a result of a prior process is provided to dispatch respective lots processed in a preceding process with a subsequent process equipment optimum for improving the quality of the lot based upon a process result of the preceding process regarding the lots, capability of a plurality of subsequent process equipment and/or a systematic analysis result of relativity between characteristics. CONSTITUTION: Measured data of an inspection item regarding the respective second lots processed by the first process equipment before the first lot is accumulated in a computer system(100c). And, measured data of an inspection item regarding the respective second lots processed by one of a plurality of the second process equipment is consecutively accumulated in the computer system. The first process equipment generates a variation with reference to a target value of the inspection item regarding the first lot based upon the accumulated measurement data. The second process equipment compensates for the variation toward the target value of the inspection item. Process capability of the respective second process equipment is estimated. A dispatching priority regarding the plurality of second process equipment of the first lot is determined according to the process capability. The first lot is dispatched by one of the plurality of the second process equipment based upon the dispatching priority.

Abstract translation: 目的：提供一种根据先前方法的结果，可变地采用最佳后续处理设备和/或后续处理条件的批量方法，以便在以前的处理过程中处理的各批次与后续处理设备相匹配，以提高质量 基于上述处理的处理结果，关于批次，多个后续处理设备的能力和/或特征之间的相对性的系统分析结果。 构成：在计算机系统（100c）中积累了在第一批次之前由第一处理设备处理的关于第二批次的检查项目的测量数据。 并且，由计算机系统中连续累积关于由多个第二处理设备之一处理的相应第二批次的检查项目的测量数据。 第一处理设备基于累积的测量数据生成关于第一批次的检查项的目标值的变化。 第二工艺设备补偿对检验项目目标值的变化。 估计各个第二处理设备的处理能力。 根据处理能力确定关于第一批次的多个第二处理设备的调度优先级。 基于调度优先级，第一批次由多个第二处理设备之一调度。

公开(公告)号：KR100375559B1

公开(公告)日：2003-03-10

申请号：KR1020010039371

申请日：2001-07-03

Applicant: 삼성전자주식회사

Inventor： 전경식 ,  박찬훈 ,  박일석 ,  조봉수 ,  강현태 ,  제영호

IPC: H01L21/027

CPC classification number: G05B13/027

Abstract: The method involves searching previous processing data having a history identical to that of the subject loaded into the processing device. A current bias correction value is predicted from several of the most recent previous correction values out of the searched previous processing data having the identical history. A current random correction value is predicted by a neural network on the basis of several most recent random correction values. The predicted current bias and random correction values are summed as a current correction value of the processing device. The neural network is made to learn for tracking a variation of the random correction value by using the error value. An independent claim is included for a method of controlling a photolithographic device.

Abstract translation: 该方法涉及搜索具有与加载到处理设备中的主体的历史相同的历史的先前处理数据。 从具有相同历史的搜索的先前处理数据中的几个最近的先前校正值预测当前偏差校正值。 当前的随机校正值由神经网络基于几个最近的随机校正值来预测。 预测的电流偏差和随机校正值被相加为处理装置的当前校正值。 通过使用误差值使神经网络学习用于跟踪随机校正值的变化。 包括用于控制光刻设备的方法的独立权利要求。

公开(公告)号：KR1020030003803A

公开(公告)日：2003-01-14

申请号：KR1020010039371

申请日：2001-07-03

Applicant: 삼성전자주식회사

Inventor： 전경식 ,  박찬훈 ,  박일석 ,  조봉수 ,  강현태 ,  제영호

IPC: H01L21/027

CPC classification number: G05B13/027

Abstract: PURPOSE: A method for controlling in process apparatus is provided to remarkably decrease the number of sampling processes by using an adaptive least mean square neural network(ALMS-NN) algorithm which is effectively applied in a process highly depending upon the sampling process without depending upon history data. CONSTITUTION: Previous process data having the same history as a process target material loaded into the process apparatus is searched. A present bias correction value is presumed from a plurality of recent correction values among the previous process data having the same history. A present land correction value is presumed by a neural network based upon a plurality of previous land correction values among the previous process data. The bias correction value and the land correction value are added together by using the present correction value of the process apparatus. The neural network learns to tract a change of the land correction value by using an error value between an input value of the process apparatus and a measurement value of the process apparatus.

Abstract translation: 目的：提供一种在处理装置中进行控制的方法，通过使用自适应最小均方神经网络（ALMS-NN）算法显着减少采样过程的数量，该算法在高度取决于采样过程的情况下有效地应用，而不依赖于 历史数据 构成：搜索与加载到处理装置中的过程目标材料相同历史的先前过程数据。 从具有相同历史的先前处理数据中的多个最近的校正值推定出当前偏置校正值。 基于先前处理数据中的多个先前的土地修正值，由神经网络推定现有的土地修正值。 通过使用处理装置的当前校正值将偏置校正值和面校正值相加在一起。 神经网络通过使用处理装置的输入值与处理装置的测量值之间的误差值来学习改变土地修正值。

公开(公告)号：KR1020010075952A

公开(公告)日：2001-08-11

申请号：KR1020000002907

申请日：2000-01-21

Applicant: 삼성전자주식회사

Inventor： 박일석 ,  김석현

IPC: H01L21/306

Abstract: PURPOSE: A method for selecting an optimal lot for performing etching process is provided to make critical dimensions of a circuit uniform to increase overall yield of manufacturing step. CONSTITUTION: The method for selecting the optimal lot for performing etching process includes following steps. At first, a plurality of AIDICD data are transmitted through a network of lots on which a photo operation is performed and are stored with lot ID, photo apparatus ID, and photo step ID temporarily(S10). Then, a plurality of ACICD data are transmitted through the network and are stored with lot ID on which an etching operation is performed by a host server, etching apparatus ID, etching step ID temporarily(S20). At third, the first and second data are combined to calculate skew values(S30). Then, etching variation is calculated by the skew value from the skew values stored at the third step(S50). At fifth, a plurality of etcher values are calculated from the skew values(S60). At sixth, a plurality of etcher values, a plurality of AIDICD and ACICD target values are applied to a predetermined equation to find optimal lot(S80). At last, the lot is inserted to the etcher.

Abstract translation: 目的：提供一种用于选择执行蚀刻工艺的最佳批次的方法，以使电路的关键尺寸均匀以提高制造步骤的总产量。 构成：选择执行蚀刻处理的最佳批次的方法包括以下步骤。 首先，通过执行照相操作的批次网络传送多个AIDICD数据，并且临时存储有批号，照片装置ID和照片步骤ID（S10）。 然后，通过网络发送多个ACICD数据，并且通过主机服务器，蚀刻装置ID，蚀刻步骤ID临时存储其上进行了蚀刻操作的批号ID（S20）。 第三，组合第一和第二数据以计算偏斜值（S30）。 然后，根据在第三步骤存储的偏斜值的偏斜值计算蚀刻变化（S50）。 第五，根据偏斜值计算出多个蚀刻剂值（S60）。 第六，将多个蚀刻剂值，多个AIDICD和ACICD目标值应用于预定方程式以找到最佳批次（S80）。 最后，批次被插入蚀刻器。