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1.发明公开포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权阳离子敏感性树脂组合物，使用其制备的感光树脂层和包含感光树脂层的半导体器件
公开(公告)号：KR1020120078325A
公开(公告)日：2012-07-10
申请号：KR1020100140594
申请日：2010-12-31
Applicant: 제일모직주식회사
IPC: G03F7/039 , G03F7/016 , H01L21/027
CPC classification number: H01L23/296 , G03F7/0226 , G03F7/0233 , G03F7/0751 , H01L2924/0002 , G03F7/0395 , G03F7/0163 , H01L21/0274 , H01L2924/00
Abstract: PURPOSE: A positive type photosensitive resin composition, a photosensitive resin film using the same, and a semiconductor device including the film are provided to improve residual film rate by adjusting the dissolution speed of an exposing part and a non-exposing part. CONSTITUTION: A positive type photosensitive resin composition includes a polybenzoxazole precursor, a dissolution adjusting agent, a photosensitive diazoquinone compound, a silane compound, and a solvent. The dissolution adjusting agent includes a compound represented by chemical formula 6. The polybenzoxazole precursor is selected from a group including a first polybenzoxazole precursor, a second polybenzoxazole precursor, and the combination of the same. The first polybenzoxazole precursor includes a repeating unit represented by chemical formula 1, a repeating unit represented by chemical formula 2, or the combination of the same. A thermal polymerizable functional group is arranged at one or more end parts of the first polybenzoxazole precursor. The second polybenzoxazole precursor includes a repeating unit represented by chemical formula 4, a repeating unit represented by chemical formula 5, or the combination of the same. In chemical formula 6, Z1 and Z2 are identical or different and are respectively single bonds, O, CO, CONH, S, or SO_2-substituted or non-substituted C1 to C10 alkyleneoxy groups(OR203) or -substituted or non-substituted C6 to C15 aryleneoxy groups(OR204); in the alkyleneoxy groups, R203 is a substituted or non-substituted alkylene group; in the aryleneoxy group, R204 is a substituted or non-substituted arylene group; and G1 is a hydrogen element, a substituted or non-substituted C1 to C30 aliphatic organic group, a substituted or non-substituted C3 to C30 alicyclic organic group, a substituted or non-substituted C6 to C30 aromatic organic group, a substituted or non-substituted C2 to C30 heterocyclic group, or -Ti-R300.
Abstract translation: 目的：提供正型感光性树脂组合物，使用其的感光性树脂膜和包含该膜的半导体装置，通过调整曝光部和非曝光部的溶解速度来提高残膜率。 构成：正型感光性树脂组合物包括聚苯并恶唑前体，溶解调节剂，感光性重氮醌化合物，硅烷化合物和溶剂。 溶解调节剂包括由化学式6表示的化合物。聚苯并恶唑前体选自包括第一聚苯并恶唑前体，第二聚苯并恶唑前体及其组合的组。 第一聚苯并恶唑前体包括由化学式1表示的重复单元，由化学式2表示的重复单元或其组合。 第一聚苯并恶唑前体的一个或多个端部设置有热聚合性官能团。 第二聚苯并恶唑前体包括由化学式4表示的重复单元，由化学式5表示的重复单元或其组合。 在化学式6中，Z 1和Z 2相同或不同，分别为O，CO，CONH，S或SO 2 - 取代或未取代的C1至C10亚烷基氧基（OR203）或取代或未取代的C6 C15亚芳氧基（OR204）; 在亚烷氧基中，R 2 O 3是取代或未取代的亚烷基; 在芳氧基中，R204是取代或未取代的亚芳基; 取代或未取代的C 3至C 30脂族有机基团，取代或未取代的C 6至C 30芳族有机基团，取代或未取代的C 1至C 30脂族有机基团，取代或未取代的C 3至C 30脂族有机基团， 取代的C2至C30杂环基或-Ti-R300。
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2.发明公开포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权阳离子敏感性树脂组合物，使用其制备的感光树脂层和包含感光树脂层的半导体器件
公开(公告)号：KR1020120078324A
公开(公告)日：2012-07-10
申请号：KR1020100140593
申请日：2010-12-31
Applicant: 제일모직주식회사
IPC: G03F7/039 , G03F7/016 , H01L21/027
CPC classification number: G03F7/0233 , G03F7/0236 , G03F7/0751 , H01L23/293 , H01L2924/0002 , G03F7/0395 , G03F7/0163 , H01L21/0274 , H01L2924/00
Abstract: PURPOSE: A positive type photosensitive resin composition, a photosensitive resin film using the composition, and a semiconductor device including the film are provided to adjust the dissolution speed of an exposing part and a non-exposing part. CONSTITUTION: A positive type photosensitive rein composition includes a polybenzoxazole precursor, a novolak resin, a photosensitive diazoquinone compound, a silane compound, and a solvent. The novolak resin includes a compound with a repeating unit represented by chemical formula 6. The polybenzoxazole precursor is selected from a group including a first polybenzoxazole precursor, a second polybenzoxazole precursor, and the combination of the same. The first polybenzoxazole precursor includes a repeating unit represented by chemical formula 1, a repeating unit represented by chemical formula 2, or the combination of the same. A thermal polymerizable functional group is arranged at one end part of the first polybenzoxazole precursor. The second polybenzoxazole precursor includes a repeating unit represented by chemical formula 4, a repeating unit represented by chemical formula 5, or the combination of the same. In chemical formula 6, R7 is identical or different in each repeating unit and is a C1 to C20 aliphatic organic group.
Abstract translation: 目的：提供正型感光性树脂组合物，使用该组合物的感光性树脂膜和包含该膜的半导体装置，以调节曝光部和非曝光部的溶解速度。 构成：正型感光性组合物包括聚苯并恶唑前体，酚醛清漆树脂，感光性重氮醌化合物，硅烷化合物和溶剂。 酚醛清漆树脂包括具有由化学式6表示的重复单元的化合物。聚苯并恶唑前体选自包括第一聚苯并恶唑前体，第二聚苯并恶唑前体及其组合的组。 第一聚苯并恶唑前体包括由化学式1表示的重复单元，由化学式2表示的重复单元或其组合。 第一聚苯并恶唑前体的一个端部设置有热聚合性官能团。 第二聚苯并恶唑前体包括由化学式4表示的重复单元，由化学式5表示的重复单元或其组合。 在化学式6中，R7在每个重复单元中相同或不同，为C1至C20脂族有机基团。
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公开(公告)号：KR1020100068081A
公开(公告)日：2010-06-22
申请号：KR1020080126777
申请日：2008-12-12
Applicant: 제일모직주식회사
IPC: C09K19/56
Abstract: PURPOSE: A liquid crystal photo-alignment agent is provided to obtain excellent printability and liquid crystal photo-alignment and to prevent the degradation of vertical alignment power due to the dropped liquid crystal through a one drop filling mode. CONSTITUTION: A liquid crystal photo-alignment comprises: a first polymer which is selected from a group comprising polyamic acid of a chemical formula 1 or a polyimide polymer of a chemical formula 2; a polymer including a second polymer of a polyimide photopolymer which is marked as a chemical formula 3; and a functional silane compound which is marked as a chemical formula 4. The functional silane compound is included with an amount of 0.01-10 parts by weight.
Abstract translation: 目的：提供液晶光取向剂以获得优异的可印刷性和液晶光取向性，并且防止由于通过一滴填充模式而滴落的液晶导致的垂直取向功率的劣化。 构成：液晶光取向包括：选自化学式1的聚酰胺酸或化学式2的聚酰亚胺聚合物的第一聚合物; 包含标记为化学式3的聚酰亚胺光聚合物的第二聚合物的聚合物; 和标记为化学式4的官能化硅烷化合物。官能硅烷化合物的含量为0.01-10重量份。
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公开(公告)号：KR101400192B1
公开(公告)日：2014-05-27
申请号：KR1020100140594
申请日：2010-12-31
Applicant: 제일모직주식회사
IPC: G03F7/039 , G03F7/016 , H01L21/027
CPC classification number: H01L23/296 , G03F7/0226 , G03F7/0233 , G03F7/0751 , H01L2924/0002 , H01L2924/00
Abstract: (A) 화학식 1로 표시되는 반복단위, 화학식 2로 표시되는 반복단위, 또는 이들의 조합을 포함하고, 적어도 한 쪽의 말단 부분에 열중합성 관능기를 갖는 제1 폴리벤조옥사졸 전구체(polybenzoxazole precursor), 화학식 4로 표시되는 반복단위, 화학식 5로 표시되는 반복단위, 또는 이들의 조합을 포함하는 제2 폴리벤조옥사졸 전구체, 및 이들의 조합으로 이루어진 군에서 선택되는 폴리벤조옥사졸 전구체; (B) 용해 조절제; (C) 감광성 디아조퀴논 화합물; (D) 실란 화합물; 및 (E) 용매를 포함하고, 상기 용해 조절제는 화학식 6으로 표시되는 화합물을 포함하는 것인 포지티브형 감광성 수지 조성물 및 이를 사용하여 제조된 감광성 수지막을 제공한다.
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公开(公告)号：KR101288570B1
公开(公告)日：2013-07-22
申请号：KR1020090125516
申请日：2009-12-16
Applicant: 제일모직주식회사
IPC: C08L79/08 , C08G73/10 , C09K19/56 , G02F1/1337
Abstract: 하기 화학식 1로 표시되는 제1 광디아민으로부터 유도된 제1 구조 단위, 하기 화학식 2로 표시되는 제2 광디아민으로부터 유도된 제2 구조 단위 및 하기 화학식 3으로 표시되는 디아민으로부터 유도된 제3 구조 단위를 포함하는 폴리아믹산, 폴리이미드 중합체 또는 이들의 조합인 고분자 화합물 및 용매를 포함하는 액정 광배향제를 제공한다.
[화학식 1]
[화학식 2]
[화학식 3]
상기 화학식 1 내지 3에서, 각 치환기의 정의는 명세서에 정의된 바와 같다.
수직 배향력, 액정광배향제, 액정광배향막Abstract translation: 到所述第一光来源于二胺，从由所述第二结构单元表示的二胺衍生的第3结构单元的第一结构单元的，和式（3）由式表示的第二光二胺衍生的（2）由通式（1）表示 聚酰亚胺聚合物或其组合，以及溶剂。
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Patent Agency Ranking
公开(公告)号：KR101212667B1
公开(公告)日：2012-12-14
申请号：KR1020080121478
申请日：2008-12-02
Applicant: 제일모직주식회사
IPC: C09K19/56
CPC classification number: C09K19/3809 , C08K5/1515 , C09K19/56 , Y10T428/10 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023
Abstract: 본발명의액정배향제는선경사각의조절이용이하고, 우수한액정배향성, 및 LCD 패널제조공정에사용되는세정용제에대한우수한내화학성을가짐으로써, 세정후에도액정의배향성이저하되지않는장점이있다.
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7.发明公开포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权阳离子敏感性树脂组合物，使用其制备的感光树脂层和包含感光树脂层的半导体器件
公开(公告)号：KR1020120077484A
公开(公告)日：2012-07-10
申请号：KR1020100139447
申请日：2010-12-30
Applicant: 제일모직주식회사
IPC: G03F7/039 , G03F7/016 , H01L21/027
CPC classification number: G03F7/0233 , G03F7/0751 , G03F7/40 , G03F7/0395 , G03F7/0163 , H01L21/0274
Abstract: PURPOSE: A positive type photosensitive resin composition, a photosensitive resin film manufactured using the same, and a semiconductor device including the photosensitive resin film are provided to suppress dissolution to an alkali developing solution and to improve the residue eliminating characteristic of the film. CONSTITUTION: A positive type photosensitive resin composition includes a polybenzoxazole precursor, photosensitive diazoquinone, a silane compound, a phenol compound, and a solvent. The polybenzoxazole precursor includes a first polybenzoxazole precursor with a thermal polymerizable functional group at least one end part. The first polybenzoxazole precursor includes a repeating unit represented by chemical formula 1 and a repeating unit represented by chemical formula 2. In chemical formulas 1 and 2, X1 is identical or different in each repeating unit and is respectively a substituted or non-substituted C6 to C30 aromatic organic group, a substituted or non-substituted tetravalent to hexavalent C1 to C30 aliphatic organic group, or a substituted or non-substituted tetravalent to hexavalent C3 to C30 aliphatic organic group; X2 is identical or different in each repeating unit and is respectively a functional group represented by chemical formula 3; and Y1 and Y2 are identical or different and are respectively substituted or non-substituted C6 to C30 aromatic organic groups, substituted or non-substituted divalent to hexavalent C1 to C30 aliphatic organic groups, or substituted or non-substituted divalent to hexavalent C3 to C30 alicyclic organic groups.
Abstract translation: 目的：提供正型感光性树脂组合物，使用其制造的感光性树脂膜和包含感光性树脂膜的半导体装置，以抑制对碱性显影液的溶解，提高膜的残留消除特性。 构成：正型感光性树脂组合物包括聚苯并恶唑前体，感光性重氮醌，硅烷化合物，酚化合物和溶剂。 聚苯并恶唑前体包括具有至少一个末端部分的具有热聚合官能团的第一聚苯并恶唑前体。 第一聚苯并恶唑前体包括由化学式1表示的重复单元和由化学式2表示的重复单元。在化学式1和2中，X 1在每个重复单元中相同或不同，分别为取代或未取代的C6至 C30芳族有机基团，取代或未取代的四价至六价C 1至C 30脂族有机基团，或取代或未取代的四价至六价C 3至C 30脂族有机基团; X2在每个重复单元中相同或不同，分别为化学式3表示的官能团; 和Y1和Y2相同或不同，分别为取代或未取代的C6至C30芳族有机基团，取代或未取代的二价至六价C 1至C 30脂族有机基团，或取代或未取代的二价至六价C 3至C 30 脂环族有机基团。
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8.发明公开포지티브형 감광성 수지 조성물, 이를 포함하는 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权阳离子型感光性树脂组合物，使用阳离子型感光树脂组合物的感光树脂层，以及包含感光树脂层的半导体器件
公开(公告)号：KR1020120074810A
公开(公告)日：2012-07-06
申请号：KR1020100136757
申请日：2010-12-28
Applicant: 제일모직주식회사
IPC: G03F7/039 , G03F7/016 , H01L21/027
CPC classification number: G03F7/0395 , G03F7/0163 , G03F7/0166 , G03F7/0397 , H01L21/0273 , H01L21/0274
Abstract: PURPOSE: A positive type photo-sensitive resin composition, a photo-sensitive resin film using the same, and a semiconductor device including the photo-sensitive resin film are provided to improve sensitivity and resolution. CONSTITUTION: A positive type photo-sensitive resin composition includes a polybenzoxazole precursor with a repeating unit in the form of random copolymer, a photo-sensitive diazoquinone compound, a silane compound, a phenol compound, and a solvent. The repeating unit is represented by chemical formula 1. In chemical formula 1, X1 is derived from a diamine compound represented by chemical formula 30; X2 is an aromatic organic group or a tetravalent to hexavalent aliphatic organic group; Y1 and Y2 are respectively aromatic organic groups or divalent to hexavalent aliphatic organic groups; m and n are molar ratios, the sum of m and n is 100 mol%; m is 1 to 99mol%; and n is 1 to 99mol%.
Abstract translation: 目的：提供正型感光树脂组合物，使用其的感光树脂膜和包含感光树脂膜的半导体器件，以提高灵敏度和分辨率。 构成：正型感光树脂组合物包括具有无规共聚物形式的重复单元的聚苯并恶唑前体，光敏重氮醌化合物，硅烷化合物，酚化合物和溶剂。 重复单元由化学式1表示。在化学式1中，X1衍生自化学式30表示的二胺化合物; X2是芳族有机基团或四价至六价脂族有机基团; Y1和Y2分别是芳族有机基团或二价至六价脂族有机基团; m和n是摩尔比，m和n的总和是100mol％; m为1〜99mol％; n为1〜99摩尔％。
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9.发明公开
公开(公告)号：KR1020110072173A
公开(公告)日：2011-06-29
申请号：KR1020090129005
申请日：2009-12-22
Applicant: 제일모직주식회사
IPC: C08L79/08 , C08G73/10 , C09K19/56 , G02F1/1337
Abstract: PURPOSE: A liquid crystal photo-alignment agent is provided to improve printability, vertical alignment property, and liquid crystal phtoalignment property. CONSTITUTION: A liquid crystal photo-alignment agent includes a polyamic acid including a repeating unit represented by chemical formula 1, polyimide including a repeating unit represented by chemical formula 2, or combination thereof. In chemical formulas 1 and 2, X1 and X2 are the same or different and represent tetravalent organic group induced from cycloaliphatic acid dianhydride or aromatic acid dianhydride; Y1 and Y2 are the same or different and represent a divalent organic group induced from diamine represented by chemical formula 3 and a divalent and a divalent organic group induced from diamine represented by chemical formula 4.
Abstract translation: 目的：提供液晶光取向剂以提高印刷性，垂直取向性和液晶取向性。 构成：液晶光取向剂包括含有由化学式1表示的重复单元的聚酰胺酸，包含由化学式2表示的重复单元的聚酰亚胺，或其组合。 在化学式1和2中，X1和X2相同或不同，表示从脂环族二酸酐或芳族酸二酐引发的四价有机基团; Y1和Y2相同或不同，表示由化学式3表示的二胺引发的二价有机基团和由化学式4表示的二胺引发的二价和二价有机基团。
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公开(公告)号：KR1020100062718A
公开(公告)日：2010-06-10
申请号：KR1020080121478
申请日：2008-12-02
Applicant: 제일모직주식회사
IPC: C09K19/56
CPC classification number: C09K19/3809 , C08K5/1515 , C09K19/56 , Y10T428/10 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023
Abstract: PURPOSE: A liquid crystal alignment agent is provided to ensure chemical resistance and to prevent orientation reduction of the liquid crystal. CONSTITUTION: A liquid crystal alignment agent contains a polymer selected from the group consisting of polyamic acid, polyimide, and mixture thereof; and epoxy compound of chemical formula 1. In chemical formula 1, X is linear, branched, or cyclic alkyl group of 1-20 carbon atoms in which one or more halogen atom is substituted or non-substituted.
Abstract translation: 目的：提供液晶取向剂以确保耐化学性和防止液晶的取向降低。 构成：液晶取向剂含有选自聚酰胺酸，聚酰亚胺及其混合物的聚合物; 和化学式1的环氧化合物。在化学式1中，X是1-20个碳原子的直链，支链或环状烷基，其中一个或多个卤素原子是取代或未取代的。
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