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1.发明申请APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开在半导体处理系统中用于感测氟物种的装置和方法
公开(公告)号：WO2004036175A3
公开(公告)日：2004-06-17
申请号：PCT/US0332521
申请日：2003-10-15
Applicant: ADVANCED TECH MATERIALS
Inventor： DIMEO FRANK , CHEN PHILIP S H , NEUNER JEFFREY W , WELCH JAMES , STAWASZ MICHELE , BAUM THOMAS H , KING MACKENZIE E , CHEN ING-SHIN , ROEDER JEFFREY F
CPC classification number: G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
Abstract: A gas detector (54) and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element (8) that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package (6) so that the package becomes a platform of the detector.
Abstract translation: 气体检测器（54）和用于检测含有气体的气体中的含氟物质的方法，例如用HF，NF3等进行蚀刻清洗的半导体加工工具的流出物。优选结构布置中的检测器采用微机电 系统（MEMS）的装置结构和/或自立式金属元件（8），其在需要高温感测时用作感测部件并且可选地作为热源。 独立金属元件可以直接制造在标准芯片载体/器件封装（6）上，使得封装成为检测器的平台。
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公开(公告)号：WO2005033655A3
公开(公告)日：2009-04-09
申请号：PCT/US2004029705
申请日：2004-09-10
Applicant: ADVANCED TECH MATERIALS , KING MACKENZIE E , WANG WEIHUA , HAN JIANWEN , ROEDER JEFFREY F , LURCOTT STEVEN M , STAWASZ MICHELE
Inventor： KING MACKENZIE E , WANG WEIHUA , HAN JIANWEN , ROEDER JEFFREY F , LURCOTT STEVEN M , STAWASZ MICHELE
IPC: G01N27/403 , C25D21/12 , G01N20060101 , G01N27/26
CPC classification number: C25D21/12
Abstract: The present invention relates to an electrode assembly useful for analyzing metal electroplating solutions. Such electrode assembly comprises a measuring electrode, preferably a rotating disc electrode or a microelectrode, and at least one of an in situ cleaning mechanism, a nucleation and metal growth optimization mechanism, and a voltage limiting mechanism. The present invention also relates to usage of such electrode assembly for in situ cleaning of the measuring electrode, nucleation and metal growth optimization, or voltage limitation.
Abstract translation: 本发明涉及一种用于分析金属电镀溶液的电极组件。 这种电极组件包括测量电极，优选旋转圆盘电极或微电极，以及原位清洁机构，成核和金属生长优化机构中的至少一个以及电压限制机构。 本发明还涉及这种电极组件用于测量电极的原位清洗，成核和金属生长优化或电压限制的用途。
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Patent Agency Ranking3.发明申请APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开在半导体处理系统中感测荧光物种的装置和方法
公开(公告)号：WO2004036175B1
公开(公告)日：2004-07-22
申请号：PCT/US0332521
申请日：2003-10-15
Applicant: ADVANCED TECH MATERIALS
Inventor： DIMEO FRANK , CHEN PHILIP S H , NEUNER JEFFREY W , WELCH JAMES , STAWASZ MICHELE , BAUM THOMAS H , KING MACKENZIE E , CHEN ING-SHIN , ROEDER JEFFREY F
CPC classification number: G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
Abstract: A gas detector (54) and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element (8) that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package (6) so that the package becomes a platform of the detector.
Abstract translation: 一种气体检测器（54）和用于检测含有它的气体中的含氟物质的方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电 基于系统（MEMS）的器件结构和/或独立的金属元件（8），当需要高温感测时，其用作感测部件并且可选地作为热源。 独立的金属元件可以直接制造在标准芯片载体/器件封装（6）上，使得封装成为检测器的平台。
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4.发明申请INTEGRATED CHEMICAL MECHANICAL POLISHING COMPOSITION AND PROCESS FOR SINGLE PLATEN PROCESSING 审中-公开综合化学机械抛光组合物及单板加工工艺
公开(公告)号：WO2006133249A3
公开(公告)日：2009-04-16
申请号：PCT/US2006022037
申请日：2006-06-06
Applicant: ADVANCED TECH MATERIALS , DARSILLO MICHAEL , WRSCHKA PETER , WELCH JAMES , GILES JEFFREY , STAWASZ MICHELE , BOGGS KARL
Inventor： DARSILLO MICHAEL , WRSCHKA PETER , WELCH JAMES , GILES JEFFREY , STAWASZ MICHELE , BOGGS KARL
IPC: B44C1/22 , C23F1/00 , C23F1/10 , H01L21/302
CPC classification number: C09K3/1463 , C09G1/02 , C09K3/1472 , H01L21/3212
Abstract: Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a Step I slurry formulation, which is used to selectively remove and planarize copper, into a Step II slurry formulation, which is used to selectively remove barrier layer material, on a single CMP platen pad.
Abstract translation: 化学机械抛光（CMP）组合物和用于从其上具有其的微电子器件衬底去除铜和阻挡层材料的单CMP压板工艺。 该方法包括将用于选择性地将铜去除和平面化的步骤I浆料制剂原位转化成用于在单个CMP压板垫上选择性除去阻挡层材料的步骤II浆料制剂。
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公开(公告)号：AU2003301333A8
公开(公告)日：2004-05-04
申请号：AU2003301333
申请日：2003-10-15
Applicant: ADVANCED TECH MATERIALS
Inventor： STAWASZ MICHELE , CHEN SHIN ING , NEUNER JEFFREY W , KING MACKENZIE E , ROEDER JEFFREY F , WELCH JAMES , DIMEO FRANK , BAUM THOMAS H , CHEN PHILIP S H
Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
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公开(公告)号：AU2003301333A1
公开(公告)日：2004-05-04
申请号：AU2003301333
申请日：2003-10-15
Applicant: ADVANCED TECH MATERIALS
Inventor： BAUM THOMAS H , KING MACKENZIE E , CHEN SHIN ING , ROEDER JEFFREY F , DIMEO FRANK , CHEN PHILIP S H , NEUNER JEFFREY W , WELCH JAMES , STAWASZ MICHELE
IPC: G01N33/00
Abstract: A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
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7.发明公开APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开设备和工艺半导体加工系统中检测FLUOROSPEZIES
公开(公告)号：EP1554561A4
公开(公告)日：2009-11-11
申请号：EP03809006
申请日：2003-10-15
Applicant: ADVANCED TECH MATERIALS
Inventor： DIMEO FRANK , CHEN PHILIP S H , NEUNER JEFFREY W , WELCH JAMES , STAWASZ MICHELE , BAUM THOMAS H , KING MACKENZIE E , CHEN ING-SHIN , ROEDER JEFFREY F
CPC classification number: G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
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