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    APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS
    1.
    发明申请
    APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
    在半导体处理系统中用于感测氟物种的装置和方法

    公开(公告)号：WO2004036175A3

    公开(公告)日：2004-06-17

    申请号：PCT/US0332521

    申请日：2003-10-15

    Applicant: ADVANCED TECH MATERIALS

    Inventor： DIMEO FRANK ,  CHEN PHILIP S H ,  NEUNER JEFFREY W ,  WELCH JAMES ,  STAWASZ MICHELE ,  BAUM THOMAS H ,  KING MACKENZIE E ,  CHEN ING-SHIN ,  ROEDER JEFFREY F

    IPC: G01N33/00 ,  G01N9/00

    CPC classification number: G01N27/128 ,  H01J37/3244 ,  H01J37/32935 ,  H01J37/32981 ,  Y10T29/49007 ,  Y10T436/17 ,  Y10T436/19

    Abstract: A gas detector (54) and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element (8) that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package (6) so that the package becomes a platform of the detector.

    Abstract translation: 气体检测器（54）和用于检测含有气体的气体中的含氟物质的方法，例如用HF，NF3等进行蚀刻清洗的半导体加工工具的流出物。优选结构布置中的检测器采用微机电 系统（MEMS）的装置结构和/或自立式金属元件（8），其在需要高温感测时用作感测部件并且可选地作为热源。 独立金属元件可以直接制造在标准芯片载体/器件封装（6）上，使得封装成为检测器的平台。

    APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS
    3.
    发明申请
    APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
    在半导体处理系统中感测荧光物种的装置和方法

    公开(公告)号：WO2004036175B1

    公开(公告)日：2004-07-22

    申请号：PCT/US0332521

    申请日：2003-10-15

    Applicant: ADVANCED TECH MATERIALS

    Inventor： DIMEO FRANK ,  CHEN PHILIP S H ,  NEUNER JEFFREY W ,  WELCH JAMES ,  STAWASZ MICHELE ,  BAUM THOMAS H ,  KING MACKENZIE E ,  CHEN ING-SHIN ,  ROEDER JEFFREY F

    IPC: G01N33/00 ,  G01N9/00

    CPC classification number: G01N27/128 ,  H01J37/3244 ,  H01J37/32935 ,  H01J37/32981 ,  Y10T29/49007 ,  Y10T436/17 ,  Y10T436/19

    Abstract: A gas detector (54) and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element (8) that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package (6) so that the package becomes a platform of the detector.

    Abstract translation: 一种气体检测器（54）和用于检测含有它的气体中的含氟物质的方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电 基于系统（MEMS）的器件结构和/或独立的金属元件（8），当需要高温感测时，其用作感测部件并且可选地作为热源。 独立的金属元件可以直接制造在标准芯片载体/器件封装（6）上，使得封装成为检测器的平台。

    SAMPLING MANAGEMENT FOR A PROCESS ANALYSIS TOOL TO MINIMIZE SAMPLE USAGE AND DECREASE SAMPLING TIME
    4.
    发明申请
    SAMPLING MANAGEMENT FOR A PROCESS ANALYSIS TOOL TO MINIMIZE SAMPLE USAGE AND DECREASE SAMPLING TIME 审中-公开
    过程分析工具的采样管理，以最小化样品使用和减少采样时间

    公开(公告)号：WO2005026688A3

    公开(公告)日：2005-11-17

    申请号：PCT/US2004028876

    申请日：2004-09-07

    Applicant: ADVANCED TECH MATERIALS ,  KING MACKENZIE E ,  CHATTERTON THOMAS ,  BHELLA RICHARD

    Inventor： KING MACKENZIE E ,  CHATTERTON THOMAS ,  BHELLA RICHARD

    IPC: C25D21/12 ,  G01N20060101 ,  G01N1/20 ,  G01N33/00 ,  G01N35/00

    CPC classification number: G01N35/1097 ,  C25D21/12 ,  G01N2001/205 ,  Y10T436/118339

    Abstract: A method and system for analysis of additives in electrolysis plating solutions, using a flow management system that minimizes loss of plating solutions and decreases sampling time. The system includes at least one analysis chamber, a sampling duct connected to processing tool, a four-way valve positioned between the processing tool and the sampling duct, at least one carrier fluid duct connected to the analysis chamber, at least one actuatable multi-port valve that provides a transference platform between the sampling duct and the at least one carrier fluid duct, and a flow sensor connected to the sampling duct and positioned downstream from the at least one actuatable multi-port valve.

    Abstract translation: 一种用于分析电解电镀溶液中添加剂的方法和系统，使用最小化电镀溶液损失并减少采样时间的流量管理系统。 该系统包括至少一个分析室，连接到处理工具的采样管道，位于处理工具和采样管道之间的四通阀，连接到分析室的至少一个载体流体管道，至少一个可致动的多通道， 在所述采样管道和所述至少一个载体流体管道之间提供转移平台的端口阀，以及连接到所述采样管道并位于所述至少一个可致动多通阀的下游的流量传感器。

    Optical hydrogen detector
    9.
    发明专利
    Optical hydrogen detector 未知

    公开(公告)号：AU1614101A

    公开(公告)日：2001-05-30

    申请号：AU1614101

    申请日：2000-11-15

    Applicant: ADVANCED TECH MATERIALS

    Inventor： DIMEO FRANK JR ,  KING MACKENZIE E

    IPC: G01N31/00 ,  G01N21/59 ,  G01N21/77 ,  G01N31/22 ,  G01N33/00 ,  G01N21/00 ,  G01N7/00 ,  G01N30/96

    Abstract: A hydrogen gas detector for detection of hydrogen gas in a gaseous environment. The detector comprises a light/heat source, an optical detector, and an optical barrier between the source and detector. The optical barrier responds to the presence of hydrogen by responsively changing from a first optical state to a different second optical state, whereby transmission of light from the light/heat source through the optical barrier is altered by the presence of hydrogen and the altered transmission is sensed by the optical detector to provide an indication of the presence of hydrogen gas in the gaseous environment.

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