公开(公告)号：WO2016139055A2

公开(公告)日：2016-09-09

申请号：PCT/EP2016/053216

申请日：2016-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： NIENHUYS, Han-Kwang ,  BOGAART, Erik, Willem ,  DONKER, Rilpho, Ludovicus ,  KRUIZINGA, Borgert ,  LOOPSTRA, Erik, Roelof ,  BOTMA, Hako ,  DE VRIES, Gosse, Charles ,  FRIJNS, Olav, Waldemar, Vladimir ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

Abstract translation: 包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统， 修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束 通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束 改变装置是从分束装置输出的分支辐射束。

公开(公告)号：WO2014060170A1

公开(公告)日：2014-04-24

申请号：PCT/EP2013/069301

申请日：2013-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SCHOOT, Jan ,  HOL, Sven ,  BUIS, Edwin ,  REKKERS, Erik ,  DE VRIES, Gosse ,  BOTMA, Hako ,  VAN DAM, Marinus ,  VAN GORKOM, Ramon

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

CPC classification number: G03F7/70091 ,  G01C9/06 ,  G01C2009/066 ,  G02B7/1821 ,  G03F7/70116 ,  H01F7/0231 ,  H01F7/206 ,  H01H2051/2218 ,  H02K41/00

Abstract: An actuator (300) to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370, 372, 376, 378). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces (380, 382) lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor (390) may direct a beam of radiation (398) at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract translation: 用于移位例如反射镜的致动器（300）通过改变两个电磁体（370,372,376,378）中的电流来提供具有至少两个自由度的运动。 移动部件包括永磁体（362），其具有被限制在基本垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面（380,382），每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器（390）可以通过电磁体之间的中心空间来引导移动磁体处的辐射束（398）。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。

公开(公告)号：WO2015074816A1

公开(公告)日：2015-05-28

申请号：PCT/EP2014/072507

申请日：2014-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： BOTMA, Hako

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70133 ,  G03F7/7085

Abstract: An apparatus comprising a sensing module can be used to detect radiation received, from a source collector apparatus, at a patterning device of an illumination system. The radiation received provides information of a pupil of the radiation at an illumination field on the patterning device. The pupil information detected can be processed by the sensing module to determine information in relation to the source collector apparatus. In particular, information provided can indicate the alignment of the plasma and/or collector of a source collector apparatus. From this, the alignment of the source collector apparatus can be altered to optimize the radiation received at the illumination field. This information is available for each individual light pulse from the source.

Abstract translation: 包括感测模块的装置可用于检测从源极收集器装置在照明系统的图案形成装置处接收到的辐射。 接收到的辐射在图案形成装置上的照明场提供辐射光瞳的信息。 检测到的瞳孔信息可由感测模块处理，以确定与收集器装置有关的信息。 特别地，提供的信息可以指示源极收集器装置的等离子体和/或集电极的对准。 由此可以改变源极收集器装置的对准以优化在照明场处接收的辐射。 该信息可用于来自源的每个单独的光脉冲。

公开(公告)号：EP2906994A1

公开(公告)日：2015-08-19

申请号：EP13770854.1

申请日：2013-09-17

Applicant: ASML Netherlands B.V.

Inventor： VAN SCHOOT, Jan ,  HOL, Sven ,  BUIS, Edwin ,  REKKERS, Erik ,  DE VRIES, Gosse ,  BOTMA, Hako ,  VAN DAM, Marinus ,  VAN GORKOM, Ramon

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract translation: 的致动器以替换，对于实施例的反射镜，通过在两个电磁体不同的电流提供具有至少两个自由度的运动。 移动部分包括具有约束移动超过在第一基本上位于同一平面的工作区域的磁面的永久磁铁在垂直于磁体的磁化方向。 电磁铁具有极面在第二平面中基本上位于密切平行于所述第一平面中，每个极面基本上填充通过移动磁铁的面横穿的区域的一个象限。 光学位置传感器可以通过电磁体之间的中央空间直接在移动磁体的辐射束。 在光瞳反射镜装置刻面的尺寸可以在中央区域制成在外围区域中较小，但较大的，从而缓和聚焦的要求。

公开(公告)号：EP2906994B1

公开(公告)日：2020-03-25

申请号：EP13770854.1

申请日：2013-09-17

Applicant: ASML Netherlands B.V.

Inventor： VAN SCHOOT, Jan ,  HOL, Sven ,  BUIS, Edwin ,  REKKERS, Erik ,  DE VRIES, Gosse ,  BOTMA, Hako ,  VAN DAM, Marinus ,  VAN GORKOM, Ramon

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08