中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.035 seconds)

    RADIATION SYSTEM
    2.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A2

    公开(公告)日：2016-09-09

    申请号：PCT/EP2016/053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  BOGAART, Erik, Willem ,  DONKER, Rilpho, Ludovicus ,  KRUIZINGA, Borgert ,  LOOPSTRA, Erik, Roelof ,  BOTMA, Hako ,  DE VRIES, Gosse, Charles ,  FRIJNS, Olav, Waldemar, Vladimir ,  BASELMANS, Johannes, Jacobus, Matheus

    IPC: G03F7/20

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统， 修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束 通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束 改变装置是从分束装置输出的分支辐射束。

    RADIATION BEAM APPARATUS
    3.
    发明申请
    RADIATION BEAM APPARATUS 审中-公开
    辐射波束装置

    公开(公告)号：WO2016134892A2

    公开(公告)日：2016-09-01

    申请号：PCT/EP2016/051174

    申请日：2016-01-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DE VRIES, Gosse, Charles ,  DONKER, Rilpho, Ludovicus ,  NIENHUYS, Han-Kwang ,  VAN OOSTEN, Anton, Bernhard ,  KRUIZINGA, Borgert

    IPC: G03F7/20 ,  G02B5/18

    CPC classification number: G03F7/70158 ,  G02B5/1861 ,  G02B27/4222 ,  G02B27/4255 ,  G03F7/702 ,  G03F7/70558 ,  G03F7/70991

    Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.

    Abstract translation: 一种用于在光束接收位置接收输入辐射光束并从光束接收位置输出一个或多个输出辐射光束的设备。 该设备包括：光学元件; 和一个运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，从而选择性地将多个部分中的每一个定位在光束接收位置处。 当多个部分中的一个部分布置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束以形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由其他部分中的每一个形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个特性不同于其他部分的特性，使得由多个部分中的每个部分形成的一个或多个输出辐射束中的至少一个的功率不同于对应输出 辐射束由至少一个其他部分形成。

    MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    5.
    发明申请
    MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    测量系统，光刻设备和器件制造方法

    公开(公告)号：WO2017153085A1

    公开(公告)日：2017-09-14

    申请号：PCT/EP2017/051603

    申请日：2017-01-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  NAKIBOGLU, Günes ,  PETIT, Rita, Marguerite, Albin, Lambertine ,  PEN, Hermen, Folken ,  VAN DE MOESDIJK, Remco, Yuri ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  KRUIZINGA, Borgert

    IPC: G03F7/20 ,  G03F1/84

    Abstract: A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system comprising a light source and a detector system; the light source being configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively; the detector system being configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor; the processor being configured to: ∙ receive the signals; ∙ determine, based on the signals as received, a characteristic of the object; and ∙ determine a deformation of the pattern based on the characteristic.

    Abstract translation: 描述了一种用于确定具有前表面和后表面并且设置有图案的物体的变形的测量系统，所述测量系统包括：处理器和干涉仪系统，所述干涉仪系统包括 光源和检测器系统; 所述光源被配置为向所述物体上的多个位置中的每一个发射测量光束，以便在所述相应的多个位置中的每一个处分别产生从所述物体的前表面和后表面离开的反射测量光束; 所述检测器系统被配置为接收相应的反射测量光束并将代表所接收的反射测量光束的信号输出到所述处理器; 该处理器被配置为：·接收信号; ∙根据收到的信号确定物体的特性; 并根据特性确定图案的变形。

Patent Agency Ranking