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    FREE ELECTRON LASER
    1.
    发明申请
    FREE ELECTRON LASER 审中-公开
    免费电子激光

    公开(公告)号：WO2015067467A1

    公开(公告)日：2015-05-14

    申请号：PCT/EP2014/072588

    申请日：2014-10-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

    IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

    CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

    Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

    Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

    METHOD AND SYSTEM FOR MONITORING THE INTEGRITY OF AN ARTICLE, AND EUV OPTICAL APPARATUS INCORPORATING THE SAME
    2.
    发明申请
    METHOD AND SYSTEM FOR MONITORING THE INTEGRITY OF AN ARTICLE, AND EUV OPTICAL APPARATUS INCORPORATING THE SAME 审中-公开
    用于监测物品的完整性的方法和系统，以及同时包含的EUV光学装置

    公开(公告)号：WO2012084363A1

    公开(公告)日：2012-06-28

    申请号：PCT/EP2011/070406

    申请日：2011-11-17

    Applicant: ASML Netherlands B.V. ,  CHERNYSHOV, Maksym ,  JANSSEN, Franciscus ,  DE VRIES, Gosse ,  VAN GESTEL, Maarten

    Inventor： CHERNYSHOV, Maksym ,  JANSSEN, Franciscus ,  DE VRIES, Gosse ,  VAN GESTEL, Maarten

    IPC: G03F7/20 ,  G03F1/86 ,  H01J37/30

    CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G03F7/708 ,  G21K1/10 ,  H01J2237/24592

    Abstract: A method and a system are described for monitoring integrity and/or a contamination particle of an article (120), which may be, for example, a spectral purity filter in an EUV lithographic apparatus. To monitor integrity of an article operating in a low pressure environment, a beam of electrons is directed toward the article within the environment. The article when intact is configured to stop at least a proportion of the electrons in the beam, and a signal is generated to indicate integrity status of the article by identifying when at least a part of the article is not stopping the expected proportion of electrons in the beam. The electrons can be detected in the article itself, or in a screen or other detection device behind the article. EUV optical apparatus incorporating the method and the system are also described.

    Abstract translation: 描述了用于监测制品（120）的完整性和/或污染颗粒的方法和系统，其可以是EUV光刻设备中的例如光谱纯度滤光片。 为了监测在低压环境中工作的物品的完整性，电子束指向环境内的物品。 当完整的制品被配置为停止梁中的至少一部分电子，并且产生信号以指示物品的完整性状态，通过识别物品的至少一部分何时不会阻止电子的预期比例 梁。 电子可以在物品本身中或在物品后面的屏幕或其他检测装置中检测。 还描述了结合该方法和系统的EUV光学装置。

    MOUNTINGS FOR ROTATION OF ARRAY OF REFLECTIVE ELEMENTS AND LITHOGRAPHIC APPARATUS INCORPORATING SAME
    4.
    发明申请
    MOUNTINGS FOR ROTATION OF ARRAY OF REFLECTIVE ELEMENTS AND LITHOGRAPHIC APPARATUS INCORPORATING SAME 审中-公开
    用于旋转反射元件阵列的安装方法及其映射设备

    公开(公告)号：WO2011000671A1

    公开(公告)日：2011-01-06

    申请号：PCT/EP2010/058021

    申请日：2010-06-08

    Applicant: ASML Netherlands B.V. ,  BUIS, Edwin ,  DE VRIES, Gosse

    Inventor： BUIS, Edwin ,  DE VRIES, Gosse

    IPC: G02B26/08 ,  G02B7/182 ,  G03F7/20

    CPC classification number: G03F7/702 ,  G02B26/12 ,  G03F7/70075 ,  G03F7/70091

    Abstract: An array of reflective elements is disclosed, at least one of the reflective elements being mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveable, the sleeve including a first resiliently flexible portion which is configured to bend in order to allow the movement of the second end of the rod to take place, wherein the reflective element is mounted at the first end of the sleeve such that bending of the sleeve causes rotation of the reflective element.

    Abstract translation: 公开了一组反射元件，所述反射元件中的至少一个安装在包括至少部分地位于套筒内的杆的安装件上。 杆的第一端固定到套筒的第一端并且杆的第二端是可移动的，套筒包括第一弹性柔性部分，其被配置为弯曲以允许第二端部的运动 杆，其中反射元件安装在套筒的第一端，使得套筒的弯曲导致反射元件的旋转。

    LITHOGRAPHIC APPARATUS AND METHOD
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    平面设备和方法

    公开(公告)号：WO2010145959A1

    公开(公告)日：2010-12-23

    申请号：PCT/EP2010/057916

    申请日：2010-06-07

    Applicant: ASML NETHERLANDS B.V. ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

    Inventor： VAN SCHOOT, Jan ,  DE VRIES, Gosse

    IPC: G03F7/20

    CPC classification number: G03F7/702 ,  G03F7/70075 ,  G03F7/70116

    Abstract: An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes, is described. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented such that they can direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.

    Abstract translation: 一种具有多个反射元件的照明系统，所述反射元件可在不同取向之间移动，所述方向将光束朝向光瞳平面中的不同位置引导，从而形成不同的照明模式。 每个反射元件可移动到第一方向，其中它将辐射引导到内部照明位置组中的位置，到第二方向，其中它将辐射引导到中间照明位置组中的位置，并且其中第三方向 它将辐射引导到外部照明位置组中的位置。 反射元件被配置为被定向成使得它们可以将等量的辐射引导到内部，中间和外部照明位置组，并且被配置为被定向成使得它们可以基本上不将辐射引导到外部照明位置组中并且直接 基本相等量的辐射朝向内部和中间照明位置组。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE
    6.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 审中-公开
    照明系统，光刻设备和形成照明模式的方法

    公开(公告)号：WO2010100078A1

    公开(公告)日：2010-09-10

    申请号：PCT/EP2010/052432

    申请日：2010-02-25

    Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  WAGNER, Christian ,  DE VRIES, Gosse

    Inventor： LOOPSTRA, Erik ,  VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  WAGNER, Christian ,  DE VRIES, Gosse

    IPC: G03F7/20 ,  G02B7/18 ,  H01L21/00

    CPC classification number: G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

    Abstract: Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.

    Abstract translation: 提供了一种光刻设备的照明系统，所述照明系统具有布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射引导到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动，反射元件的第一取向和第二取向由端部 停止。

    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES
    8.
    发明申请
    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
    执行机构，光学装置，光刻设备和制造装置的方法

    公开(公告)号：WO2014060170A1

    公开(公告)日：2014-04-24

    申请号：PCT/EP2013/069301

    申请日：2013-09-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN SCHOOT, Jan ,  HOL, Sven ,  BUIS, Edwin ,  REKKERS, Erik ,  DE VRIES, Gosse ,  BOTMA, Hako ,  VAN DAM, Marinus ,  VAN GORKOM, Ramon

    IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

    CPC classification number: G03F7/70091 ,  G01C9/06 ,  G01C2009/066 ,  G02B7/1821 ,  G03F7/70116 ,  H01F7/0231 ,  H01F7/206 ,  H01H2051/2218 ,  H02K41/00

    Abstract: An actuator (300) to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370, 372, 376, 378). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces (380, 382) lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor (390) may direct a beam of radiation (398) at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

    Abstract translation: 用于移位例如反射镜的致动器（300）通过改变两个电磁体（370,372,376,378）中的电流来提供具有至少两个自由度的运动。 移动部件包括永磁体（362），其具有被限制在基本垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面（380,382），每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器（390）可以通过电磁体之间的中心空间来引导移动磁体处的辐射束（398）。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2011076500A1

    公开(公告)日：2011-06-30

    申请号：PCT/EP2010/067834

    申请日：2010-11-19

    Applicant: ASML NETHERLANDS B.V. ,  VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

    Inventor： VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

    IPC: G03F7/20

    CPC classification number: G03F7/70116 ,  G03F7/70075

    Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.

    Abstract translation: 在光刻设备中，使用包括多个可移动小平面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。 为了调整成像参数，可移动小面的一部分被设定为不同的位置。 确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果相加。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE
    10.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE 审中-公开
    照明系统，平面设备和调节照明模式的方法

    公开(公告)号：WO2011023419A1

    公开(公告)日：2011-03-03

    申请号：PCT/EP2010/053539

    申请日：2010-03-18

    Applicant: ASML Netherlands B.V. ,  DE VRIES, Gosse ,  BUIS, Edwin ,  VAN DAM, Marinus ,  VAN SCHOOT, Jan ,  BOON, Fidelus ,  KREUWEL, Hermanus

    Inventor： DE VRIES, Gosse ,  BUIS, Edwin ,  VAN DAM, Marinus ,  VAN SCHOOT, Jan ,  BOON, Fidelus ,  KREUWEL, Hermanus

    IPC: G03F7/20

    CPC classification number: G03F7/70116 ,  G03F7/70075

    Abstract: An illumination system is disclosed that has a plurality of moveable reflective elements (22a, 22b, 22c) and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element (22a, 22b, 22c) between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element (22a, 22b, 22c) forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.

    Abstract translation: 公开了一种具有多个可移动反射元件（22a，22b，22c）和相关联的致动器的照明系统，其可以被配置为形成照明模式。 一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件（22a，22b，22c），第一和第二取向使得辐射 从可动反射元件（22a，22b，22c）反射形成照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。

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