公开(公告)号：SG11201609284TA

公开(公告)日：2016-12-29

申请号：SG11201609284T

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BERENDSEN CHRISTIANUS WILHELMUS JOHANNES ,  BECKERS MARCEL ,  CASTELIJNS HENRICUS JOZEF ,  GERAETS HUBERTUS ANTONIUS ,  KOEVOETS ADRIANUS HENDRIK ,  LEVASIER LEON MARTIN ,  SCHAAP PETER ,  STREEFKERK BOB ,  TROMP SIEGFRIED ALEXANDER

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.