公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011151397A

公开(公告)日：2011-08-04

申请号：JP2011009381

申请日：2011-01-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  LAURENT THIBAULT SIMON MATHIEU ,  MIRANDA MARCIO ALEXANDRE CANO ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES ,  FENG PENG ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或最小化由一个或多个热源引起的过程误差的光刻工艺。 解决方案：提供浸没式光刻设备。 浸没式光刻设备具有衬底台，该衬底台包括漏液，其被构造成接收浸没液体泄漏到衬底台上的衬底的边缘与设置衬底的凹部的边缘之间的间隙中。 通过将液体的一个或多个射流引导到支撑衬底的部分的后侧，至少支撑衬底的凹部的一部分被热调节，从而在浸没式光刻设备中提供热调节系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010074159A

公开(公告)日：2010-04-02

申请号：JP2009208753

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011018883A

公开(公告)日：2011-01-27

申请号：JP2010099338

申请日：2010-04-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： THOMAS IVO ADAM JOHANNES ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the effect of an interface between a last optical element and droplets and/or a gas and a liquid, on the last optical element.SOLUTION: A lithographic apparatus includes: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or a substrate table. Here, a measure is taken to reduce the effect of droplets and/or a liquid film on the last optical element of the projection system.

Abstract translation: 要解决的问题：提供一种用于减少最后光学元件与液滴和/或气体和液体之间的界面对最后光学元件的影响的系统。解决方案：光刻设备包括：投影系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 这里，采取措施来减少液滴和/或液膜对投影系统的最后一个光学元件的影响。

公开(公告)号：JP2014039069A

公开(公告)日：2014-02-27

申请号：JP2013243543

申请日：2013-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or a boundary surface between gas/liquid and a final element on the final element, or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure, and a substrate and/or a substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种系统，以减少液体和/或气体/液体与最终元件上的最终元件之间的边界表面的影响，或基本上避免这种液滴形成。解决方案：光刻设备包括：投影 系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如减少液滴对投影系统的最终元件的影响或基本上避免这种液滴形成。

公开(公告)号：JP2013016865A

公开(公告)日：2013-01-24

申请号：JP2012227010

申请日：2012-10-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets lying on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种降低液滴和/或气体/液体与最终元件上的最终元件之间的界面的作用的系统，或基本避免这种液滴的形成。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如降低位于投影系统的最终元件上的液滴的作用或基本上避免这种液滴形成。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010074160A

公开(公告)日：2010-04-02

申请号：JP2009208754

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet to a final element and/or an influence of gas and liquid to the interface of the final element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. In the lithography device, for example, the influence of the droplet on the final element of the projection system PS is reduced, or the formation of such a droplet is avoided substantially. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终元素的影响和/或气体和液体对最终元件的界面的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在光刻装置中，例如，液滴对投影系统PS的最终元件的影响减小，或者基本上避免了形成这样的液滴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012138631A

公开(公告)日：2012-07-19

申请号：JP2012088182

申请日：2012-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets on a last optical element or substantially to avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. A humid gas space is defined between the projection system, the liquid confinement structure and the immersion liquid in the immersion space, the humid gas space being configured to confine humid gas.

Abstract translation: 要解决的问题：提供一种降低液滴对最后一个光学元件的影响或基本上避免这种液滴形成的系统。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在投影系统，液体限制结构和浸没空间中的浸没液体之间限定湿气空间，湿气空间被配置为限制湿气。 版权所有（C）2012，JPO＆INPIT