公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027