公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008147652A

公开(公告)日：2008-06-26

申请号：JP2007309567

申请日：2007-11-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for hooking a liquid meniscus at a predetermined position in a space between the final element and the substrate of a projection system. SOLUTION: Disclosed is a liquid immersion system used for a liquid immersion lithography in which a liquid meniscus between the liquid immersion system and its substrate is substantially hooked at a predetermined position by meniscus hook formation. The meniscus hook formation has a plurality of discrete outlets arranged in polygonal shape. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液体供应系统，用于在投影系统的最终元件和基板之间的空间中的预定位置处钩住液体弯液面。 解决方案：公开了一种用于液浸光刻的液浸系统，其中液浸系统及其基板之间的液体弯液面通过弯液面钩形成在预定位置基本上钩挂。 弯液面钩形结构具有以多边形排列的多个分立出口。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011097107A

公开(公告)日：2011-05-12

申请号：JP2011026014

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confinement system and a substrate is substantially nailed in a prescribed position by a meniscus nailing form is disclosed. The meniscus nailing form has a plurality of discrete outlets arranged in a polygon. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在投影系统的最终元件和基板之间的空间中的指定位置处用于钉液面弯液面的液体供应系统。 解决方案：公开了一种用于浸没式光刻的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉形式基本上钉在规定的位置。 半月板钉形式具有以多边形排列的多个分立出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2009231838A

公开(公告)日：2009-10-08

申请号：JP2009065329

申请日：2009-03-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  KEMPER NICOLAAS R ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DANNY MARIA HUBERTUS PHILIPS ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  MARCUS JOHANNES VAN DER ZANDEN ,  PIETER MULDER

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide: an apparatus which can remove droplets and/or a thin film from the surface of a substrate more effectively, and a gas knife device improved in performance. SOLUTION: In an immersion lithographic apparatus, for instance, a droplet removing device uses an inclined gas flow from a gas knife during exposure to remove droplets from the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：提供：能够更有效地从基板的表面除去液滴和/或薄膜的装置，以及提高性能的气刀装置。 解决方案：在浸没式光刻设备中，例如，液滴去除装置在曝光期间使用来自气刀的倾斜气流从基板去除液滴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL1036631A1

公开(公告)日：2009-09-25

申请号：NL1036631

申请日：2009-02-25

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JO ,  PHILIPS DANNY MARIA HUBERTUS ,  BRANDS GERT-JAN GERARDUS JOHANNES ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  ZANDEN MARCUS JOHANNES VAN DER ,  MULDER PIETER

IPC: G03F7/20